JPS626130Y2 - - Google Patents
Info
- Publication number
- JPS626130Y2 JPS626130Y2 JP17655382U JP17655382U JPS626130Y2 JP S626130 Y2 JPS626130 Y2 JP S626130Y2 JP 17655382 U JP17655382 U JP 17655382U JP 17655382 U JP17655382 U JP 17655382U JP S626130 Y2 JPS626130 Y2 JP S626130Y2
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- substrate holder
- vacuum container
- cylindrical substrate
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007740 vapor deposition Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 description 7
- 229910052573 porcelain Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17655382U JPS5980464U (ja) | 1982-11-24 | 1982-11-24 | 蒸着装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17655382U JPS5980464U (ja) | 1982-11-24 | 1982-11-24 | 蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5980464U JPS5980464U (ja) | 1984-05-31 |
JPS626130Y2 true JPS626130Y2 (no) | 1987-02-12 |
Family
ID=30383821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17655382U Granted JPS5980464U (ja) | 1982-11-24 | 1982-11-24 | 蒸着装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5980464U (no) |
-
1982
- 1982-11-24 JP JP17655382U patent/JPS5980464U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5980464U (ja) | 1984-05-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100279344B1 (ko) | 기재의 미세공을 충전하기 위한 박막형성장치 | |
DE3680016D1 (de) | Elektrisches geraet zum verdampfen von insektizidem wirkstoff. | |
JPS5710329A (en) | Sputter vapor depositing device | |
JPS626130Y2 (no) | ||
US2943957A (en) | Method for the spraying of electron emitting thermionic cathodes | |
SE8205395D0 (sv) | Method and apparatus for the vapor deposition of material upon a substrate | |
JP3221952B2 (ja) | Cvd用原料ガスの発生装置 | |
JPH0139712Y2 (no) | ||
JPS5739169A (en) | Preparation of thin film vapor deposited object | |
JPH01128399A (ja) | 粒子加速管の製造装置 | |
JPS6389963U (no) | ||
JPS6350289Y2 (no) | ||
JPS62101860U (no) | ||
JPH04191364A (ja) | イオンプレーティング方法および装置 | |
JPS63149961U (no) | ||
JPS62277147A (ja) | 薄膜の製法 | |
JPS6417847A (en) | Formation of extremely fine line | |
JPS62157968U (no) | ||
JPH03143504A (ja) | 超音波濃縮装置 | |
JPS592108Y2 (ja) | フラツシユガン | |
JPS5451370A (en) | Carrier for producing frozen sample of charged-particle beam device | |
CN109355626A (zh) | 一种Ca掺杂MgO形成的复合薄膜的制备方法 | |
JPS553143A (en) | Target for electron emission amplifier tube | |
JPS6450344A (en) | Ion beam generator | |
JPS6286155A (ja) | 溶融物質の蒸気噴出装置 |