JPS6260691B2 - - Google Patents

Info

Publication number
JPS6260691B2
JPS6260691B2 JP5972881A JP5972881A JPS6260691B2 JP S6260691 B2 JPS6260691 B2 JP S6260691B2 JP 5972881 A JP5972881 A JP 5972881A JP 5972881 A JP5972881 A JP 5972881A JP S6260691 B2 JPS6260691 B2 JP S6260691B2
Authority
JP
Japan
Prior art keywords
polymer
radiation
resist material
sensitivity
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5972881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57176034A (en
Inventor
Kimio Shibayama
Kingo Itaya
Teruo Fujimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Toyo Soda Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Soda Manufacturing Co Ltd filed Critical Toyo Soda Manufacturing Co Ltd
Priority to JP5972881A priority Critical patent/JPS57176034A/ja
Priority to US06/289,281 priority patent/US4367281A/en
Publication of JPS57176034A publication Critical patent/JPS57176034A/ja
Publication of JPS6260691B2 publication Critical patent/JPS6260691B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP5972881A 1981-01-12 1981-04-22 Method for microprocessing radiation sensitive resist Granted JPS57176034A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP5972881A JPS57176034A (en) 1981-04-22 1981-04-22 Method for microprocessing radiation sensitive resist
US06/289,281 US4367281A (en) 1981-01-12 1981-08-03 Fine fabrication process using radiation sensitive resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5972881A JPS57176034A (en) 1981-04-22 1981-04-22 Method for microprocessing radiation sensitive resist

Publications (2)

Publication Number Publication Date
JPS57176034A JPS57176034A (en) 1982-10-29
JPS6260691B2 true JPS6260691B2 (enExample) 1987-12-17

Family

ID=13121543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5972881A Granted JPS57176034A (en) 1981-01-12 1981-04-22 Method for microprocessing radiation sensitive resist

Country Status (1)

Country Link
JP (1) JPS57176034A (enExample)

Also Published As

Publication number Publication date
JPS57176034A (en) 1982-10-29

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