JPS6259950A - 電離放射線感応ポジ型レジスト - Google Patents

電離放射線感応ポジ型レジスト

Info

Publication number
JPS6259950A
JPS6259950A JP19847885A JP19847885A JPS6259950A JP S6259950 A JPS6259950 A JP S6259950A JP 19847885 A JP19847885 A JP 19847885A JP 19847885 A JP19847885 A JP 19847885A JP S6259950 A JPS6259950 A JP S6259950A
Authority
JP
Japan
Prior art keywords
resist
copolymer
methacrylate
ionizing radiation
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19847885A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0381143B2 (enrdf_load_stackoverflow
Inventor
Kiyoshi Oguchi
小口　清
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Original Assignee
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan filed Critical Research Development Corp of Japan
Priority to JP19847885A priority Critical patent/JPS6259950A/ja
Publication of JPS6259950A publication Critical patent/JPS6259950A/ja
Publication of JPH0381143B2 publication Critical patent/JPH0381143B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
JP19847885A 1985-09-10 1985-09-10 電離放射線感応ポジ型レジスト Granted JPS6259950A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19847885A JPS6259950A (ja) 1985-09-10 1985-09-10 電離放射線感応ポジ型レジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19847885A JPS6259950A (ja) 1985-09-10 1985-09-10 電離放射線感応ポジ型レジスト

Publications (2)

Publication Number Publication Date
JPS6259950A true JPS6259950A (ja) 1987-03-16
JPH0381143B2 JPH0381143B2 (enrdf_load_stackoverflow) 1991-12-27

Family

ID=16391775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19847885A Granted JPS6259950A (ja) 1985-09-10 1985-09-10 電離放射線感応ポジ型レジスト

Country Status (1)

Country Link
JP (1) JPS6259950A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291052A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
JPH02262152A (ja) * 1989-03-31 1990-10-24 Terumo Corp 光レジスト材料
US5157091A (en) * 1987-10-07 1992-10-20 Murahara Masataka Ultraviolet-absorbing polymer material and photoetching process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291052A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
US5157091A (en) * 1987-10-07 1992-10-20 Murahara Masataka Ultraviolet-absorbing polymer material and photoetching process
JPH02262152A (ja) * 1989-03-31 1990-10-24 Terumo Corp 光レジスト材料

Also Published As

Publication number Publication date
JPH0381143B2 (enrdf_load_stackoverflow) 1991-12-27

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