JPS6257069B2 - - Google Patents

Info

Publication number
JPS6257069B2
JPS6257069B2 JP57141087A JP14108782A JPS6257069B2 JP S6257069 B2 JPS6257069 B2 JP S6257069B2 JP 57141087 A JP57141087 A JP 57141087A JP 14108782 A JP14108782 A JP 14108782A JP S6257069 B2 JPS6257069 B2 JP S6257069B2
Authority
JP
Japan
Prior art keywords
radicals
plasma etching
orifice
plasma
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57141087A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5931550A (ja
Inventor
Toshio Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP57141087A priority Critical patent/JPS5931550A/ja
Publication of JPS5931550A publication Critical patent/JPS5931550A/ja
Publication of JPS6257069B2 publication Critical patent/JPS6257069B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
JP57141087A 1982-08-16 1982-08-16 プラズマエツチング中のラジカルおよび励起分子測定装置 Granted JPS5931550A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57141087A JPS5931550A (ja) 1982-08-16 1982-08-16 プラズマエツチング中のラジカルおよび励起分子測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57141087A JPS5931550A (ja) 1982-08-16 1982-08-16 プラズマエツチング中のラジカルおよび励起分子測定装置

Publications (2)

Publication Number Publication Date
JPS5931550A JPS5931550A (ja) 1984-02-20
JPS6257069B2 true JPS6257069B2 (enrdf_load_stackoverflow) 1987-11-28

Family

ID=15283896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57141087A Granted JPS5931550A (ja) 1982-08-16 1982-08-16 プラズマエツチング中のラジカルおよび励起分子測定装置

Country Status (1)

Country Link
JP (1) JPS5931550A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162447A (ja) * 1983-03-07 1984-09-13 Ulvac Corp 低温プラズマ中の中性生成物質の測定装置
JPS62151562A (ja) * 1985-12-26 1987-07-06 Mitsubishi Electric Corp 薄膜形成装置
KR100519543B1 (ko) * 1998-07-09 2005-12-08 삼성전자주식회사 반도체소자 제조용 플라즈마 식각장치
US11971386B2 (en) * 2020-12-23 2024-04-30 Mks Instruments, Inc. Monitoring radical particle concentration using mass spectrometry

Also Published As

Publication number Publication date
JPS5931550A (ja) 1984-02-20

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