JPS6248759B2 - - Google Patents

Info

Publication number
JPS6248759B2
JPS6248759B2 JP13454180A JP13454180A JPS6248759B2 JP S6248759 B2 JPS6248759 B2 JP S6248759B2 JP 13454180 A JP13454180 A JP 13454180A JP 13454180 A JP13454180 A JP 13454180A JP S6248759 B2 JPS6248759 B2 JP S6248759B2
Authority
JP
Japan
Prior art keywords
electrode
etching
potential
etched
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13454180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5760073A (en
Inventor
Minoru Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13454180A priority Critical patent/JPS5760073A/ja
Publication of JPS5760073A publication Critical patent/JPS5760073A/ja
Publication of JPS6248759B2 publication Critical patent/JPS6248759B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP13454180A 1980-09-27 1980-09-27 Plasma etching method Granted JPS5760073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13454180A JPS5760073A (en) 1980-09-27 1980-09-27 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13454180A JPS5760073A (en) 1980-09-27 1980-09-27 Plasma etching method

Publications (2)

Publication Number Publication Date
JPS5760073A JPS5760073A (en) 1982-04-10
JPS6248759B2 true JPS6248759B2 (en, 2012) 1987-10-15

Family

ID=15130722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13454180A Granted JPS5760073A (en) 1980-09-27 1980-09-27 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS5760073A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0447262U (en, 2012) * 1990-08-29 1992-04-22

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599173A (ja) * 1982-07-06 1984-01-18 ザ・パ−キン−エルマ−・コ−ポレイシヨン 材料を制御可能にエツチングする方法および装置
JPS6036999A (ja) * 1983-08-09 1985-02-26 株式会社荏原製作所 放射性ほう酸ナトリウム廃液の減容固化物、減容固化方法及びその装置
JPS61292916A (ja) * 1985-06-21 1986-12-23 Nippon Gakki Seizo Kk コンタクト孔形成法
JP3247491B2 (ja) * 1993-05-19 2002-01-15 東京エレクトロン株式会社 プラズマ処理装置
TWI554630B (zh) 2010-07-02 2016-10-21 應用材料股份有限公司 減少沉積不對稱性的沉積設備及方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0447262U (en, 2012) * 1990-08-29 1992-04-22

Also Published As

Publication number Publication date
JPS5760073A (en) 1982-04-10

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