JPS6246844B2 - - Google Patents
Info
- Publication number
- JPS6246844B2 JPS6246844B2 JP53031578A JP3157878A JPS6246844B2 JP S6246844 B2 JPS6246844 B2 JP S6246844B2 JP 53031578 A JP53031578 A JP 53031578A JP 3157878 A JP3157878 A JP 3157878A JP S6246844 B2 JPS6246844 B2 JP S6246844B2
- Authority
- JP
- Japan
- Prior art keywords
- shaped
- optical system
- arc
- spherical mirror
- rotational symmetry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 44
- 238000003384 imaging method Methods 0.000 claims description 21
- 238000005286 illumination Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 6
- 230000004907 flux Effects 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Lenses (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3157878A JPS54123876A (en) | 1978-03-18 | 1978-03-18 | Image forming optical system |
DE2910280A DE2910280C2 (de) | 1978-03-18 | 1979-03-15 | Optische Abbildungssysteme |
US06/116,752 US4294538A (en) | 1978-03-18 | 1980-01-30 | Image forming optical system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3157878A JPS54123876A (en) | 1978-03-18 | 1978-03-18 | Image forming optical system |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54123876A JPS54123876A (en) | 1979-09-26 |
JPS6246844B2 true JPS6246844B2 (ko) | 1987-10-05 |
Family
ID=12335057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3157878A Granted JPS54123876A (en) | 1978-03-18 | 1978-03-18 | Image forming optical system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54123876A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0367732U (ko) * | 1989-10-25 | 1991-07-02 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57200012A (en) * | 1981-06-03 | 1982-12-08 | Hitachi Ltd | Luminaire and luminaire for exposing device |
JPS61117554A (ja) * | 1984-11-13 | 1986-06-04 | Ushio Inc | 露光装置 |
US5640284A (en) * | 1992-09-11 | 1997-06-17 | Nikon Corporation | Optical reflector, illumination optical system, light source system and illumination optical apparatus |
-
1978
- 1978-03-18 JP JP3157878A patent/JPS54123876A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0367732U (ko) * | 1989-10-25 | 1991-07-02 |
Also Published As
Publication number | Publication date |
---|---|
JPS54123876A (en) | 1979-09-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4294538A (en) | Image forming optical system | |
KR100451339B1 (ko) | 높은개구수의링필드광학축소시스템 | |
JPH06214318A (ja) | 反射型ホモジナイザーおよび反射型照明光学装置 | |
US8149386B2 (en) | Illumination optical system, exposure apparatus using the same and device manufacturing method | |
US5971577A (en) | Light source device and illumination system | |
JP2000021712A (ja) | 照明光学系及びそれを有する露光装置 | |
TWI270120B (en) | Illumination optical system and exposure apparatus | |
US7064806B2 (en) | Illumination optical system and exposure apparatus | |
JPS6349367B2 (ko) | ||
KR20090093837A (ko) | 조명광학계, 노광장치 및 디바이스 제조방법 | |
JP2000114160A (ja) | 円弧照明光学系及びそれを用いた露光装置 | |
JP3814444B2 (ja) | 照明装置及びそれを用いた投影露光装置 | |
JPS6246844B2 (ko) | ||
JP4378140B2 (ja) | 照明光学系及び露光装置 | |
JPH0261131B2 (ko) | ||
TW201433826A (zh) | 照明光學系統、曝光裝置、以及裝置之製造方法 | |
JP2002075859A (ja) | 照明装置、露光装置及びデバイス製造方法 | |
JPS58215621A (ja) | 1「あ」1プロジエクシヨンアライナ | |
JP4640688B2 (ja) | 照明光学装置および該照明光学装置を備えた露光装置 | |
JP7340167B2 (ja) | 照明光学系、露光装置、およびデバイス製造方法 | |
JP2000133562A (ja) | 縮小投影露光装置 | |
JPH08148415A (ja) | 照明装置及び露光装置 | |
JPH04250455A (ja) | 円弧照明装置 | |
JPH0697047A (ja) | 照明光学系 | |
JP2942278B2 (ja) | 反射照明型投影装置 |