JPS6246844B2 - - Google Patents

Info

Publication number
JPS6246844B2
JPS6246844B2 JP53031578A JP3157878A JPS6246844B2 JP S6246844 B2 JPS6246844 B2 JP S6246844B2 JP 53031578 A JP53031578 A JP 53031578A JP 3157878 A JP3157878 A JP 3157878A JP S6246844 B2 JPS6246844 B2 JP S6246844B2
Authority
JP
Japan
Prior art keywords
shaped
optical system
arc
spherical mirror
rotational symmetry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53031578A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54123876A (en
Inventor
Minokichi Ban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP3157878A priority Critical patent/JPS54123876A/ja
Priority to DE2910280A priority patent/DE2910280C2/de
Publication of JPS54123876A publication Critical patent/JPS54123876A/ja
Priority to US06/116,752 priority patent/US4294538A/en
Publication of JPS6246844B2 publication Critical patent/JPS6246844B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/702Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3157878A 1978-03-18 1978-03-18 Image forming optical system Granted JPS54123876A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3157878A JPS54123876A (en) 1978-03-18 1978-03-18 Image forming optical system
DE2910280A DE2910280C2 (de) 1978-03-18 1979-03-15 Optische Abbildungssysteme
US06/116,752 US4294538A (en) 1978-03-18 1980-01-30 Image forming optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3157878A JPS54123876A (en) 1978-03-18 1978-03-18 Image forming optical system

Publications (2)

Publication Number Publication Date
JPS54123876A JPS54123876A (en) 1979-09-26
JPS6246844B2 true JPS6246844B2 (ko) 1987-10-05

Family

ID=12335057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3157878A Granted JPS54123876A (en) 1978-03-18 1978-03-18 Image forming optical system

Country Status (1)

Country Link
JP (1) JPS54123876A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0367732U (ko) * 1989-10-25 1991-07-02

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57200012A (en) * 1981-06-03 1982-12-08 Hitachi Ltd Luminaire and luminaire for exposing device
JPS61117554A (ja) * 1984-11-13 1986-06-04 Ushio Inc 露光装置
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0367732U (ko) * 1989-10-25 1991-07-02

Also Published As

Publication number Publication date
JPS54123876A (en) 1979-09-26

Similar Documents

Publication Publication Date Title
US4294538A (en) Image forming optical system
KR100451339B1 (ko) 높은개구수의링필드광학축소시스템
JPH06214318A (ja) 反射型ホモジナイザーおよび反射型照明光学装置
US8149386B2 (en) Illumination optical system, exposure apparatus using the same and device manufacturing method
US5971577A (en) Light source device and illumination system
JP2000021712A (ja) 照明光学系及びそれを有する露光装置
TWI270120B (en) Illumination optical system and exposure apparatus
US7064806B2 (en) Illumination optical system and exposure apparatus
JPS6349367B2 (ko)
KR20090093837A (ko) 조명광학계, 노광장치 및 디바이스 제조방법
JP2000114160A (ja) 円弧照明光学系及びそれを用いた露光装置
JP3814444B2 (ja) 照明装置及びそれを用いた投影露光装置
JPS6246844B2 (ko)
JP4378140B2 (ja) 照明光学系及び露光装置
JPH0261131B2 (ko)
TW201433826A (zh) 照明光學系統、曝光裝置、以及裝置之製造方法
JP2002075859A (ja) 照明装置、露光装置及びデバイス製造方法
JPS58215621A (ja) 1「あ」1プロジエクシヨンアライナ
JP4640688B2 (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP7340167B2 (ja) 照明光学系、露光装置、およびデバイス製造方法
JP2000133562A (ja) 縮小投影露光装置
JPH08148415A (ja) 照明装置及び露光装置
JPH04250455A (ja) 円弧照明装置
JPH0697047A (ja) 照明光学系
JP2942278B2 (ja) 反射照明型投影装置