JPS54123876A - Image forming optical system - Google Patents
Image forming optical systemInfo
- Publication number
- JPS54123876A JPS54123876A JP3157878A JP3157878A JPS54123876A JP S54123876 A JPS54123876 A JP S54123876A JP 3157878 A JP3157878 A JP 3157878A JP 3157878 A JP3157878 A JP 3157878A JP S54123876 A JPS54123876 A JP S54123876A
- Authority
- JP
- Japan
- Prior art keywords
- point
- axis
- meridional
- light flux
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Lenses (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3157878A JPS54123876A (en) | 1978-03-18 | 1978-03-18 | Image forming optical system |
DE2910280A DE2910280C2 (de) | 1978-03-18 | 1979-03-15 | Optische Abbildungssysteme |
US06/116,752 US4294538A (en) | 1978-03-18 | 1980-01-30 | Image forming optical system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3157878A JPS54123876A (en) | 1978-03-18 | 1978-03-18 | Image forming optical system |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54123876A true JPS54123876A (en) | 1979-09-26 |
JPS6246844B2 JPS6246844B2 (ja) | 1987-10-05 |
Family
ID=12335057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3157878A Granted JPS54123876A (en) | 1978-03-18 | 1978-03-18 | Image forming optical system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54123876A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57200012A (en) * | 1981-06-03 | 1982-12-08 | Hitachi Ltd | Luminaire and luminaire for exposing device |
JPS61117554A (ja) * | 1984-11-13 | 1986-06-04 | Ushio Inc | 露光装置 |
US5640284A (en) * | 1992-09-11 | 1997-06-17 | Nikon Corporation | Optical reflector, illumination optical system, light source system and illumination optical apparatus |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0367732U (ja) * | 1989-10-25 | 1991-07-02 |
-
1978
- 1978-03-18 JP JP3157878A patent/JPS54123876A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57200012A (en) * | 1981-06-03 | 1982-12-08 | Hitachi Ltd | Luminaire and luminaire for exposing device |
JPS6219723B2 (ja) * | 1981-06-03 | 1987-04-30 | Hitachi Ltd | |
JPS61117554A (ja) * | 1984-11-13 | 1986-06-04 | Ushio Inc | 露光装置 |
US5640284A (en) * | 1992-09-11 | 1997-06-17 | Nikon Corporation | Optical reflector, illumination optical system, light source system and illumination optical apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS6246844B2 (ja) | 1987-10-05 |
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