JPS6245632A - Plasma treatment apparatus - Google Patents

Plasma treatment apparatus

Info

Publication number
JPS6245632A
JPS6245632A JP18609685A JP18609685A JPS6245632A JP S6245632 A JPS6245632 A JP S6245632A JP 18609685 A JP18609685 A JP 18609685A JP 18609685 A JP18609685 A JP 18609685A JP S6245632 A JPS6245632 A JP S6245632A
Authority
JP
Japan
Prior art keywords
plasma
storage chamber
support frame
bumper
hangers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18609685A
Other languages
Japanese (ja)
Other versions
JPH0262139B2 (en
Inventor
Yasuhiko Ogisu
康彦 荻巣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyoda Gosei Co Ltd
Original Assignee
Toyoda Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyoda Gosei Co Ltd filed Critical Toyoda Gosei Co Ltd
Priority to JP18609685A priority Critical patent/JPS6245632A/en
Publication of JPS6245632A publication Critical patent/JPS6245632A/en
Publication of JPH0262139B2 publication Critical patent/JPH0262139B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B29C59/142Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment of profiled articles, e.g. hollow or tubular articles

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Coating Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To effect the plasma treatment of a large molding such as a bumper uniformly within a short time, by making the reciprocating motion of a hunger possible. CONSTITUTION:Bumpers B are mounted on hungers 5 fixed on a supporting frame 6 in a holding chamber 1 and the pressure in the chamber 1 is decreased by adjusting a valve 7 in a vent 2. The frame 6 is reciprocated along rails 8 by actuating an electric motor 13. Simultaneously with the start of reciprocation of the frame 6, a plasma generator is operated and the plasma gas is injected into the chamber 1 through a supply pipe 4 and an injection port 17 of each of two plasma injection pipes 3a and 3b to effect the plasma treatment of bumpers B.

Description

【発明の詳細な説明】 発明の目的 (産業上の利用分野) 本発明は、収容室内の支持枠に取着された複数個のハン
ガーにバンパーその他の合成樹脂成形品を載置し、その
表面にプラズマ処理を施すことにより塗料などの密着性
を向上させるプラズマ処理装置に関するものである。
Detailed Description of the Invention Object of the Invention (Field of Industrial Application) The present invention is directed to placing a bumper or other synthetic resin molded product on a plurality of hangers attached to a support frame in a storage chamber, and This invention relates to a plasma treatment device that improves the adhesion of paint, etc. by subjecting it to plasma treatment.

(従来の技術) ポリエチレン(PE)、ポリプロピレン(PP)などの
ポリオレフィン系熱可塑性樹脂や各種熱硬化性樹脂は塗
料や接着剤に対する密着性に乏しく、これらを塗布して
も塗膜の剥離が生じやすいことが知られている。その対
策として各種の前処理法が採用されているが、近年、減
圧下における放電処理により合成樹脂基材表面を改質す
るプラズマ処理法が多用されるようになった。
(Conventional technology) Polyolefin thermoplastic resins such as polyethylene (PE) and polypropylene (PP) and various thermosetting resins have poor adhesion to paints and adhesives, and even when these are applied, the paint film may peel off. It is known to be easy. Various pretreatment methods have been adopted as countermeasures against this problem, and in recent years, plasma treatment methods have come into widespread use, in which the surface of synthetic resin substrates is modified by electric discharge treatment under reduced pressure.

上記プラズマ処理を行うための装置としては本願出願人
が先に出願した特願昭58−236546号に示す装置
を例示することができる。
An example of an apparatus for carrying out the above-mentioned plasma treatment is the apparatus shown in Japanese Patent Application No. 58-236546 previously filed by the applicant of the present application.

すなわち、第4図に示すプラズマ処理装置であって、塗
装が施されるバンパーBその他の合成樹脂成形品を収容
する気密可能な収容室51と、その内壁に配設され、同
成形品の被塗装面にプラズマガスを噴射する一本のプラ
ズマ噴射管52と、上記収容室51内を減圧するための
排気口55と、回転軸の周りで一体回転する一対の支持
円盤53a、53bと、前記一対の支持円盤53a、5
3b間に相対回動可能に取着され、被塗装品が載置され
る複数個のハンガー54とを備えた構成になっている。
That is, the plasma processing apparatus shown in FIG. 4 includes an airtight storage chamber 51 for accommodating the bumper B and other synthetic resin molded products to be painted, and a storage chamber 51 disposed on the inner wall of the storage chamber 51 for accommodating the bumper B and other synthetic resin molded products to be painted. A single plasma injection tube 52 for injecting plasma gas onto the painted surface, an exhaust port 55 for reducing the pressure inside the storage chamber 51, a pair of support disks 53a and 53b that rotate together around a rotation axis, A pair of support disks 53a, 5
3b and a plurality of hangers 54 on which objects to be coated are placed.

なお、上記プラズマ噴射管52は導入管56を介して図
示しないプラズマ発生装置に接続されており、同装置か
ら供給される酸素のプラズマガスが収容室51内に噴射
されるようになっている。
The plasma injection tube 52 is connected to a plasma generation device (not shown) via an introduction tube 56, and oxygen plasma gas supplied from the device is injected into the accommodation chamber 51.

(発明が解決しようとする問題点) 上記プラズマ処理装置においては、被塗装品が載置され
た複数個のハンガーを一対の支持円盤間に取着し、この
支持円盤とともに回転させながらプラズマガスを照射す
る、という構成が採用されている。
(Problems to be Solved by the Invention) In the above plasma processing apparatus, a plurality of hangers on which objects to be coated are mounted are attached between a pair of support disks, and plasma gas is supplied while rotating together with the support disks. A configuration is adopted in which irradiation is performed.

ところが、プラズマ照射管から相対的に離れた位置にあ
るハンガーには他のハンガーが妨げとなってプラズマガ
スが十分照射されないことになり、バンパーのような大
型成形品の被塗装面に均一で十分なプラズマ処理を施す
ためには長時間を要するという問題点がある。
However, hangers located relatively far away from the plasma irradiation tube are blocked by other hangers and are not irradiated with plasma gas sufficiently. There is a problem in that it takes a long time to perform a plasma treatment.

本発明は上記問題点に鑑みてなされたものであって、バ
ンパーなどの大型成形品に対し、短時間で均一なプラズ
マ処理を施し得る手段を提供するものである。
The present invention has been made in view of the above problems, and provides a means for uniformly plasma-treating large molded products such as bumpers in a short period of time.

発明の構成 (問題点を解決するための手段) すなわち、本発明は合成樹脂バンパー等の被塗装品を収
容する収容室と、同収容室内へプラズマガスを噴射する
プラズマ噴射管と、同収容室内を減圧する排気口と、被
塗装品が載置される複数個のハンガーとを備えたプラズ
マ処理装置において、前記複数個のハンガーを支持する
支持枠を往復動可能に設けたことを特徴とするプラズマ
処理装置を案出することにより、上記問題点の解決を図
ったものである。
Structure of the Invention (Means for Solving the Problems) That is, the present invention provides a storage chamber for accommodating objects to be painted such as synthetic resin bumpers, a plasma injection pipe for injecting plasma gas into the storage chamber, and a plasma injection tube for injecting plasma gas into the storage chamber. A plasma processing apparatus equipped with an exhaust port for reducing the pressure of the plasma and a plurality of hangers on which objects to be coated are placed, characterized in that a support frame for supporting the plurality of hangers is provided so as to be reciprocally movable. The above-mentioned problems have been solved by devising a plasma processing apparatus.

(作用) 被塗装品が載置された複数個のハンガーを支持枠に取着
し、この支持枠を収容室内で往復動させるとともに被塗
装品の処理面にプラズマガスを噴射すれば、各被塗装品
の処理面には均一なプラズマガスが連続的に照射される
ため、バンパーなどの大型成形品であっても、短時間で
均一なプラズマ処理を施すことが可能となる。
(Function) By attaching a plurality of hangers on which objects to be coated are mounted to a support frame, and moving the support frame back and forth within the storage chamber, plasma gas is injected onto the processing surface of the objects to be coated. Since the treated surface of the painted product is continuously irradiated with uniform plasma gas, even large molded products such as bumpers can be uniformly treated with plasma in a short time.

(実施例) 以下、本発明を車両用バンパーの表面にプラズマ処理を
施す装置に具体化した一実施例につき、第1〜31図に
従って説明する。
(Example) Hereinafter, an example in which the present invention is embodied in an apparatus for plasma-treating the surface of a vehicle bumper will be described with reference to FIGS. 1 to 31.

まず、第1〜2図に示すように本実施例の収容室1は中
空直方体状に形成され、その正面壁には図示しない扉が
設けられるとともに、その内部を気密状態にすることが
できるようになっている。
First, as shown in FIGS. 1 and 2, the storage chamber 1 of this embodiment is formed in the shape of a hollow rectangular parallelepiped, and a door (not shown) is provided on the front wall of the storage chamber 1, and the interior thereof is made airtight. It has become.

また、この収容室1の右側壁中央部には図示しない吸引
ポンプに接続された排気口2が設けられ、バルブ7の開
閉操作により収容室1内を所望の気圧に調節し得るよう
になっている。
Further, an exhaust port 2 connected to a suction pump (not shown) is provided in the center of the right side wall of the storage chamber 1, and the inside of the storage chamber 1 can be adjusted to a desired atmospheric pressure by opening and closing a valve 7. There is.

次に、収容室1の底部には一対のレール8が所定間隔を
おいて配設され、収容室1内の長手方向のほぼ全長にわ
たって延びており、支持枠6を移動可能に支持している
。すなわち、支持枠6の底部四箇所にはレール8に沿っ
て転勤する車輪9が回転可能に取付られており、支持枠
6を収容室1の長手方向に往復動させることができるよ
うになっている。また、この支持枠6はステンレス製の
フレーム10を直方体形状に組合わせて構成され、一対
の上部フレーム10間にはポリプロピレン、ポリウレタ
ンなどの合成樹脂バンパーBを載置するためのハンガー
5が所定の間隔をおいて複数台(本実施例では四台)取
着されている。なお、第3図に示すように、各ハンガー
5は金属板を折曲げ形成してなる一対の支持片13と、
それらの下面にあって平行に架設された一対の架設棒1
4a、14bと、これらの架設棒14a、14bを連結
する連結棒15と、バンパーBの端部を支えるためのネ
ット16とから構成されている。
Next, a pair of rails 8 are arranged at a predetermined interval at the bottom of the storage chamber 1, extend over almost the entire length of the storage chamber 1 in the longitudinal direction, and movably support the support frame 6. . That is, wheels 9 that move along rails 8 are rotatably attached to four locations on the bottom of the support frame 6, so that the support frame 6 can be reciprocated in the longitudinal direction of the storage chamber 1. There is. The support frame 6 is constructed by combining stainless steel frames 10 into a rectangular parallelepiped shape, and between the pair of upper frames 10 is a hanger 5 for placing a synthetic resin bumper B such as polypropylene or polyurethane. A plurality of units (four units in this embodiment) are attached at intervals. As shown in FIG. 3, each hanger 5 includes a pair of support pieces 13 formed by bending a metal plate;
A pair of construction rods 1 installed parallel to each other on their lower surfaces
4a, 14b, a connecting rod 15 that connects these erection rods 14a, 14b, and a net 16 for supporting the end of the bumper B.

次に、支持枠6左端部の側板11中央下部には、収容室
1外部の駆動装置に接続されたステンレス製のシャフト
12の一端が固着されており、可変速モーター13の回
転運動をホイール14および連接棒15とともに直線運
動に変換して支持枠6に伝達するようになっている。
Next, one end of a stainless steel shaft 12 connected to a drive device outside the storage chamber 1 is fixed to the lower center of the side plate 11 at the left end of the support frame 6, and the rotary movement of the variable speed motor 13 is transferred to the wheel 14. Together with the connecting rod 15, the linear motion is converted into linear motion and transmitted to the support frame 6.

次に、この収容室1の上部内壁には多数の噴射口17を
(Iえた二本のステンレス製プラズマ噴射管3a、3b
が平行に配設されている。また、これら二本のプラズマ
噴射管3a、3bはそれぞれ導入管4を介して図示しな
いプラズマ発生装置に接続されており、同装置から供給
される酸素のプラズマガスが収容室1内に噴射されるよ
うになっている。なお、これら二本のプラズマ噴射管3
a。
Next, a large number of injection ports 17 are provided on the upper inner wall of this storage chamber 1 (two stainless steel plasma injection tubes 3a, 3b).
are arranged in parallel. Furthermore, these two plasma injection tubes 3a and 3b are each connected to a plasma generation device (not shown) via an introduction tube 4, and oxygen plasma gas supplied from the device is injected into the storage chamber 1. It looks like this. In addition, these two plasma injection tubes 3
a.

3bの全長はいずれもバンパーBの全長よりも約−割づ
つ両端部において長くなるように構成されており、バン
パーBの両端部にも十分なプラズマガスが照射されるよ
うになっている。
The overall length of each bumper 3b is configured to be longer than the overall length of the bumper B by approximately -0.0% at both ends, so that both ends of the bumper B are also irradiated with sufficient plasma gas.

次に、上記構成からなるプラズマ処理装置を用いたポリ
プロピレン製バンパーBの処理工程を説明する。
Next, a process for processing the polypropylene bumper B using the plasma processing apparatus having the above configuration will be described.

まず、収容室1の扉を開き、支持枠6に取着された各ハ
ンガー5の所定位置にバンパーBを載置減圧する。次い
で、収容室1内が所定圧まで減圧されたらバルブ7を閉
じ、モーター13を作動させれば、その回転運動が直線
運動に変換されて支持枠6に伝達されるため、同支持枠
6はレール8上を左右方向に往復動じはじめる。(なお
、本実施例では支持枠6の往復動のストロークを、一つ
のハンガー5とこれに隣接するハンガーとの間隔と同一
になるように設定した。)一方、支持枠6が往復動を開
始すると同時にプラズマ発生装置が作動し、ここから供
給されるプラズマガスが導入管4を経て二本のプラズマ
噴射管3a、3bの各噴射口17から収容室1内に噴射
される。また、このとき排気口2に設けられたパルプ7
は若干開放され、プラズマガスの噴射による気圧上昇を
防いで収容室1内が所定圧に保持されるようになってい
る。
First, the door of the storage chamber 1 is opened, and the bumper B is placed at a predetermined position on each hanger 5 attached to the support frame 6 to reduce the pressure. Next, when the pressure inside the storage chamber 1 is reduced to a predetermined pressure, the valve 7 is closed and the motor 13 is activated.The rotational motion is converted into linear motion and transmitted to the support frame 6, so that the support frame 6 It begins to reciprocate left and right on the rail 8. (In this example, the stroke of the reciprocating movement of the support frame 6 was set to be the same as the distance between one hanger 5 and the adjacent hanger.) Meanwhile, the support frame 6 started reciprocating. At the same time, the plasma generator is activated, and the plasma gas supplied therefrom is injected into the storage chamber 1 from the injection ports 17 of the two plasma injection tubes 3a and 3b via the introduction pipe 4. Also, at this time, the pulp 7 provided at the exhaust port 2
is slightly opened to prevent the pressure from rising due to the injection of plasma gas and maintain the inside of the storage chamber 1 at a predetermined pressure.

このように、本実施例のプラズマ処理装置においては、
支持枠6に取着された各ハンガー5を収容室1の長手方
向に往復動させるという構成が採用されていることから
、二本のプラズマ噴射管3a、3bから噴射されたプラ
ズマガスは各ハンガー5にIHIされたバンパーBに均
一に照射され、しかも、従来の回転式プラズマ処理装置
のように、他のハンガーによってプラズマガスの照射が
妨げられることはない。従って、各ハンガー5上に載置
されたバンパーBの被処理面全体は短時間で連続的、か
つ、均一にプラズマ処理されることになり、処理効率は
著しく向上する。
In this way, in the plasma processing apparatus of this example,
Since a configuration is adopted in which each hanger 5 attached to the support frame 6 is reciprocated in the longitudinal direction of the storage chamber 1, the plasma gas injected from the two plasma injection tubes 3a and 3b is transferred to each hanger. The bumper B subjected to IHI at 5 is uniformly irradiated, and the irradiation of the plasma gas is not obstructed by other hangers as in conventional rotary plasma processing apparatuses. Therefore, the entire surface to be treated of the bumper B placed on each hanger 5 is plasma-treated continuously and uniformly in a short time, and the treatment efficiency is significantly improved.

なお、本発明は上記の実施例に限定されるものではなく
、例えば、 ■支持枠に取着するハンガーの台数や形状、プラズマ照
射管の数や配置、あるいは支持枠を往復動させる際のス
トロークなどを適宜変更すること。
Note that the present invention is not limited to the above-mentioned embodiments, and includes, for example, (1) the number and shape of hangers attached to the support frame, the number and arrangement of plasma irradiation tubes, or the stroke when reciprocating the support frame; etc., as appropriate.

■往復動の方向は左右方向に限定されるものではなく、
これを前後あるいは上下方向に往復動可能とすること ■駆動装置を複数設けて、左右方向のみならず、同時に
前後方向や上下方向にも往復動可能とすることなど、そ
の要旨を逸脱しない範囲で細部の仕様を自由に変更する
ことが可能である。
■The direction of reciprocating motion is not limited to the left and right direction,
To make it possible to reciprocate back and forth or up and down. ■To make it possible to reciprocate not only in the left and right directions but also in the front and back and up and down directions at the same time by providing multiple drive devices within the scope of the idea. Detailed specifications can be changed freely.

発明の効果 以上詳述したように、本発明のプラズマ処理装置は複数
個のハンガーを支持する支持枠を往復動可能に設けたこ
とにより、各被塗装品の処理面には連続的にプラズマガ
スが照射されるため、バンパーなどの大型成形品であっ
ても、短時間で均一なプラズマ処理を施すことが可能と
なる、という効果を発揮し、バンパーのみならず各種合
成樹脂成形品の処理に適用することのできる優れた発明
である。
Effects of the Invention As detailed above, the plasma processing apparatus of the present invention is provided with a support frame that supports a plurality of hangers so as to be movable back and forth, so that plasma gas is continuously applied to the treatment surface of each article to be coated. is irradiated, making it possible to perform uniform plasma treatment in a short time even on large molded items such as bumpers, making it possible to treat not only bumpers but also various synthetic resin molded items. This is an excellent invention that can be applied.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明を具体化したプラズマ処理装置の一実施
例を示す縦断面図、第2図は第1図の要部斜視図、第3
図はハンガーの端部を示す拡大斜、視図、第4図は従来
のプラズマ処理装置の回転装置部を示す斜視図である。 1・・収容室、3a、3b・・プラズマ噴射管、5・・
ハンガー、6・・支持枠、B・・合成樹脂バンパー。 特許出願人       豊田合成株式会社代理人  
   弁理士     恩田博宣第3図 図面その3 第4図 図面その4
FIG. 1 is a vertical sectional view showing an embodiment of a plasma processing apparatus embodying the present invention, FIG. 2 is a perspective view of the main part of FIG. 1, and FIG.
The figure is an enlarged perspective view showing the end of the hanger, and FIG. 4 is a perspective view showing the rotating device section of a conventional plasma processing apparatus. 1... Containment chamber, 3a, 3b... Plasma injection tube, 5...
Hanger, 6. Support frame, B. Synthetic resin bumper. Patent applicant Toyoda Gosei Co., Ltd. agent
Patent Attorney Hironobu Onda Figure 3 Drawing No. 3 Figure 4 Drawing No. 4

Claims (1)

【特許請求の範囲】[Claims] 1、合成樹脂バンパー(B)等の被塗装品を収容する収
容室(1)と、同収容室(1)内へプラズマガスを噴射
するプラズマ噴射管(3)と、同収容室(1)内を減圧
する排気口(2)と、被塗装品が載置される複数個のハ
ンガー(5)とを備えたプラズマ処理装置において、前
記複数個のハンガー(5)を支持する支持枠(6)を往
復動可能に設けたことを特徴とするプラズマ処理装置。
1. A storage chamber (1) that accommodates objects to be painted such as synthetic resin bumpers (B), a plasma injection pipe (3) that injects plasma gas into the storage chamber (1), and a storage chamber (1) In a plasma processing apparatus equipped with an exhaust port (2) for reducing the pressure inside, and a plurality of hangers (5) on which objects to be coated are placed, a support frame (6) that supports the plurality of hangers (5) is provided. ) is provided so as to be movable back and forth.
JP18609685A 1985-08-24 1985-08-24 Plasma treatment apparatus Granted JPS6245632A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18609685A JPS6245632A (en) 1985-08-24 1985-08-24 Plasma treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18609685A JPS6245632A (en) 1985-08-24 1985-08-24 Plasma treatment apparatus

Publications (2)

Publication Number Publication Date
JPS6245632A true JPS6245632A (en) 1987-02-27
JPH0262139B2 JPH0262139B2 (en) 1990-12-25

Family

ID=16182294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18609685A Granted JPS6245632A (en) 1985-08-24 1985-08-24 Plasma treatment apparatus

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JP (1) JPS6245632A (en)

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Publication number Publication date
JPH0262139B2 (en) 1990-12-25

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