JPS6245631A - Plasma treatment apparatus - Google Patents
Plasma treatment apparatusInfo
- Publication number
- JPS6245631A JPS6245631A JP18609585A JP18609585A JPS6245631A JP S6245631 A JPS6245631 A JP S6245631A JP 18609585 A JP18609585 A JP 18609585A JP 18609585 A JP18609585 A JP 18609585A JP S6245631 A JPS6245631 A JP S6245631A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- bumpers
- carbon steel
- storage chamber
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
- B29C59/142—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment of profiled articles, e.g. hollow or tubular articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
発明の目的
(産業上の利用分野)
本発明は、収容室内の複数個のハンガーにバンパーその
他の合成樹脂成形品を載置し、その表面にプラズマ処理
を施すことにより塗料などの密着性を向上させるプラズ
マ処理装置に係わり、詳しくはプラズマガスによる酸化
を防止するための被膜処理を施したプラズマ処理装置に
関するものである。[Detailed Description of the Invention] Purpose of the Invention (Industrial Field of Application) The present invention provides a method for placing bumpers and other synthetic resin molded products on a plurality of hangers in a storage chamber, and by subjecting the surfaces of the bumpers and other synthetic resin molded products to plasma treatment. The present invention relates to a plasma processing apparatus that improves the adhesion of paint and the like, and more specifically to a plasma processing apparatus that is coated to prevent oxidation caused by plasma gas.
(従来の技術)
ポリエチレン(PE)、ポリプロピレン(PP)などの
ポリオレフィン系熱可塑性樹脂や各種熱硬化性樹脂は塗
料や接着剤に対する密着性に乏しく、これらを塗布して
も塗膜の剥離が生じやすいために各種の前処理法が採用
されているが、近年、減圧下における放電処理により合
成樹脂基材表面を改質するプラズマ処理法が多用される
ようになった。(Conventional technology) Polyolefin thermoplastic resins such as polyethylene (PE) and polypropylene (PP) and various thermosetting resins have poor adhesion to paints and adhesives, and even when these are applied, the paint film may peel off. Various pretreatment methods have been adopted because of their ease of use, but in recent years, plasma treatment methods have come into widespread use in which the surface of synthetic resin substrates is modified by electric discharge treatment under reduced pressure.
上記プラズマ処理を行うための装置としては本願出願人
が先に出願した特願昭58−236546号に示す装置
を例示することができる。An example of an apparatus for carrying out the above-mentioned plasma treatment is the apparatus shown in Japanese Patent Application No. 58-236546 previously filed by the applicant of the present invention.
(発明が解決しようとする問題点)
ところが、上記装置においてはプラズマ噴射管から噴射
される酸素プラズマガスによって収容室内全体が極めて
活性化された雰囲気になるため、収容室内壁やプラズマ
噴射管、ハンガーなどを構成する基材には耐食性に優れ
たステンレス・スチールが採用されている。(Problem to be Solved by the Invention) However, in the above device, the entire containment chamber becomes an extremely activated atmosphere due to the oxygen plasma gas injected from the plasma injection tube. Stainless steel, which has excellent corrosion resistance, is used as the base material for the components.
シカシ、ステンレス・スチールは加工性に乏しく、しか
も高価であるため、バンパーなどの大型成形品を処理す
るプラズマ装置の製造コストは高価なものになってしま
うという問題点がある。Since steel and stainless steel have poor workability and are expensive, there is a problem in that the production cost of plasma equipment for processing large molded products such as bumpers is high.
本発明は上記問題点に鑑みてなされたものであって、安
価で加工性の良好な基材を用い、酸化防止機能に優れた
プラズマ処理装置を提供することにある。The present invention has been made in view of the above-mentioned problems, and it is an object of the present invention to provide a plasma processing apparatus that uses a base material that is inexpensive and has good workability, and has an excellent anti-oxidation function.
発明の構成
(問題点を解決するための手段)
すなわち、本発明は合成樹脂バンパー等の被塗装品を収
容する収容室と、同収容室内壁に配設され、同収容室内
へプラズマガスを噴射するプラズマ噴射管と、同収容室
内を減圧する排気口と、被塗装品がR置される複数個の
ハンガーとを備えたプラズマ処理装置において、少なく
ともハンガー基材の表面に塗装、湿式メッキあるいは乾
式メッキ(蒸着、スパッタリング、イオンブレーティン
グなど)による酸化防止被膜を形成したことを特徴とす
るプラズマ処理装置を採用することにより、上記問題点
の解決を図ったものである。Structure of the Invention (Means for Solving the Problems) That is, the present invention includes a storage chamber for accommodating objects to be painted such as synthetic resin bumpers, and a system that is installed on the wall of the storage chamber and injects plasma gas into the storage chamber. In a plasma processing apparatus equipped with a plasma injection tube that depressurizes the storage chamber, an exhaust port that reduces the pressure in the storage chamber, and a plurality of hangers on which objects to be coated are placed, at least the surface of the hanger base material is coated, wet-plated or dry-plated. The above-mentioned problems have been solved by employing a plasma processing apparatus characterized by forming an oxidation-preventing film by plating (vapor deposition, sputtering, ion blating, etc.).
(作用)
上記プラズマ処理装置を構成する収容室の内壁、プラズ
マ噴射管、ハンガーなどの各基材、とりわけプラズマ照
射量の多いハンガーの基材に安価で加工性の良好な材料
を使用し、その表面に塗装、湿式メッキあるいは乾式メ
ッキなどによる酸化防止被膜を形成することにより、耐
食性に優れ、かつ、安価な装置を得ることができる。(Function) Inexpensive and easily processable materials are used for each base material such as the inner wall of the storage chamber, the plasma injection tube, and the hanger that constitute the plasma processing apparatus, especially the base material of the hanger that receives a large amount of plasma irradiation. By forming an oxidation-preventing coating on the surface by painting, wet plating, or dry plating, it is possible to obtain an inexpensive device with excellent corrosion resistance.
(実施例)
以下、本発明を車両用バンパーの表面をプラズマ処理す
る装置に具体化した一実施例につき、第1〜7図に従っ
て説明する。(Example) Hereinafter, an example in which the present invention is embodied in an apparatus for plasma-treating the surface of a vehicle bumper will be described with reference to FIGS. 1 to 7.
まず、第1図に示すように、本実施例の収容室1は中空
円筒状に形成され、その正面壁には図示しない扉が設け
られるとともに、その内部を気密状態にすることができ
るようになっている。First, as shown in FIG. 1, the storage chamber 1 of this embodiment is formed into a hollow cylindrical shape, and a door (not shown) is provided on the front wall of the storage chamber 1. It has become.
収容室1の内壁材は炭素鋼をプレス加工した板材であっ
て、リン酸亜鉛被膜処理が施された後、熱硬化性アクリ
ル樹脂塗料からなる塗膜8aが形成すれて酸素プラズマ
ガスの照射による基材の腐食が防止されるようになって
いる。The inner wall material of the containment chamber 1 is a plate material made by pressing carbon steel, and after being subjected to a zinc phosphate coating treatment, a coating film 8a made of thermosetting acrylic resin paint is formed, and the coating film 8a is formed by irradiation with oxygen plasma gas. Corrosion of the base material is prevented.
また、この収容室1の右側壁中央部には同じく表面に熱
硬化性アクリル樹脂塗料からなる塗膜8aが形成された
排気口2が設けられ、バルブ2aの開閉操作により収容
室1内を所望の気圧に調節することができるようになっ
ている。さらに、この排気口2は図示しない吸引ポンプ
に接続され、収容室1内を所望する気圧に減圧できるよ
うになっている。Further, in the center of the right side wall of the storage chamber 1, there is provided an exhaust port 2 on which a coating film 8a made of thermosetting acrylic resin paint is formed. The air pressure can be adjusted to . Furthermore, this exhaust port 2 is connected to a suction pump (not shown), so that the inside of the storage chamber 1 can be reduced to a desired atmospheric pressure.
次に、この収容室1内壁の排気口2下部付近には、表面
にメッキ処理によるクロム被膜8bの施された炭素鋼材
製のプラズマ噴射管3が配設されている。また、このプ
ラズマ噴射管3は可人管4を介して図示しないプラズマ
発生装置に接続されており、同装置から供給される酸素
のプラズマガスを収容室1内に噴射するようになってい
る。Next, near the lower part of the exhaust port 2 on the inner wall of the storage chamber 1, a plasma injection tube 3 made of carbon steel and having a chrome coating 8b formed by plating on its surface is arranged. Further, the plasma injection tube 3 is connected to a plasma generation device (not shown) via a variable tube 4, and is configured to inject oxygen plasma gas supplied from the device into the storage chamber 1.
さらに、第3図に示すようにこのプラズマ噴射管3には
多数の噴射口5が形成されている。Furthermore, as shown in FIG. 3, a large number of injection ports 5 are formed in this plasma injection tube 3.
なお、これらの噴射口5はプラズマ噴射管3の中央部か
ら両端部に向かって配置間隔およびその内径が漸増し、
かつ、垂直面Sに対して前側へ所定角度θノ(本実施例
では30度)傾斜して開口するもの5aと後側へ所定角
度θ2(本実施例では30度)傾斜して開口するもの5
bとが交互に配列されている。In addition, the arrangement interval and the inner diameter of these injection ports 5 gradually increase from the center to both ends of the plasma injection tube 3.
In addition, the opening 5a is tilted forward at a predetermined angle θ (30 degrees in this embodiment) with respect to the vertical plane S, and the opening is tilted backward at a predetermined angle θ2 (30 degrees in this embodiment). 5
b are arranged alternately.
次に、第1〜2図に示すように収容室1内にはその底部
の基台10上に回転装置11が収納されている。この回
転装置llは四角枠状のフレーム12とその両側に互い
に対向された一対の支柱13a、13bとにより支持さ
れており、概略以下のように構成されている。Next, as shown in FIGS. 1 and 2, a rotation device 11 is housed in the storage chamber 1 on a base 10 at the bottom thereof. This rotating device 11 is supported by a rectangular frame 12 and a pair of pillars 13a and 13b facing each other on both sides thereof, and is roughly constructed as follows.
すなわち、両支社13a、13bの上端部間には回転軸
14が、また、この回転軸14の正面側端部には鎖車2
1aがそれぞれ嵌挿されている。That is, a rotating shaft 14 is provided between the upper ends of both branches 13a and 13b, and a chain wheel 2 is provided at the front end of this rotating shaft 14.
1a are inserted into each.
また、フレーム12上には一軸綿の周りで回転する鎖車
21b、伝達ギア23がそれぞれ設けられ、この伝達ギ
ア23には図示しない駆動モータ−によって回転駆動さ
れる駆動ギア25が噛合されている。さらにまた、両鎖
車21a、21b間にはチェーン24が掛装されており
、駆動ギア25の回転にともなって伝達ギア23、鎖車
21b、ヂエーン24および鎖車21aを介して回転軸
14が回転されるようになっている。Furthermore, a chain wheel 21b that rotates around a uniaxial cotton and a transmission gear 23 are provided on the frame 12, and a drive gear 25 that is rotationally driven by a drive motor (not shown) is meshed with the transmission gear 23. . Furthermore, a chain 24 is hung between the chain wheels 21a and 21b, and as the drive gear 25 rotates, the rotating shaft 14 is rotated through the transmission gear 23, the chain wheel 21b, the chain wheel 24, and the chain wheel 21a. It is designed to be rotated.
上記基台10、フレーム12、支柱13a、13bおよ
び回転軸14はいずれも炭素鋼材からなり、その表面に
はいずれも前記熱硬化性アクリル樹脂塗料からなる塗膜
が形成されている。The base 10, the frame 12, the columns 13a, 13b, and the rotating shaft 14 are all made of carbon steel, and a coating film made of the thermosetting acrylic resin paint is formed on their surfaces.
次に、この回転軸14の両端には同じく表面に前記塗料
の塗膜が形成された一対の炭素鋼製支持円盤15a、1
5bが一体回転可能に固着されており、さらにこれらの
支持円盤15a、15b間にはポリプロピレン、ポリウ
レタンなどの合成樹脂バンパーBを載置するだめのハン
ガー16が所定の角度間隔をおいて大台設けられている
。Next, at both ends of this rotating shaft 14, a pair of carbon steel support disks 15a, 15a and 15a, each having a coating film of the paint formed on the surface thereof, is provided.
5b are fixed to be rotatable together, and furthermore, between these support disks 15a and 15b, hangers 16 on which synthetic resin bumpers B such as polypropylene or polyurethane are placed are provided at predetermined angular intervals. It is being
第7図に示すように、各ハンガー16は板材を折曲げ形
成してなる一対の支持片17と、それらの下面にあって
平行に架設された一対の架設棒18a、18bと、これ
らの架設棒18a、18bを連結する連結棒19と、バ
ンパーBの端部を支えるためのネット20とから構成さ
れている。As shown in FIG. 7, each hanger 16 includes a pair of support pieces 17 formed by bending a plate material, a pair of installation rods 18a and 18b installed in parallel on the lower surface of the support pieces 17, and a pair of installation rods 18a and 18b installed in parallel on the lower surface of the support pieces 17. It is composed of a connecting rod 19 that connects the rods 18a and 18b, and a net 20 that supports the end of the bumper B.
また、上記ハンガー16、支持片17、架設棒18a、
18b、連結棒19およびネット20はいずれも炭素鋼
材からなり、その表面には酸化防止を目的として高周波
イオンブレーティング法による酸化ニッケルの薄膜層が
形成されている。In addition, the hanger 16, the support piece 17, the erection rod 18a,
18b, the connecting rod 19, and the net 20 are all made of carbon steel, and a thin film layer of nickel oxide is formed on their surfaces by high-frequency ion blasting to prevent oxidation.
なお、各ハンガー16は両支持片17の」二端部位置で
金具22を介して両支持円盤15a、15bにそれぞれ
相対回転可能に取着されているため、回転軸14すなわ
ち支持円盤15a、15bの静止時および回転時におい
て、常に水平に保たれるようになっている。In addition, since each hanger 16 is relatively rotatably attached to both support disks 15a, 15b via metal fittings 22 at the two end positions of both support pieces 17, the rotating shaft 14, that is, support disks 15a, 15b It is designed to remain horizontal at all times, both at rest and when rotating.
次に、上記構成からなる本実施例のプラズマ処理装置を
用いたポリプロピレン製バンパーBの処理工程を説明す
る。Next, a process for processing the bumper B made of polypropylene using the plasma processing apparatus of this embodiment having the above-mentioned configuration will be described.
まず、収容室1の扉を開いてその中央部に収納されてい
る回転装置11をフレーム12とともに手前方向にスラ
イドさせ、プラズマ処理の施されルハンバーBを各ハン
ガー16の所定位置に載置する。次いで、回転装置11
を収容室1の中央部るまで減圧する。収容室11内が所
定圧まで減圧されたらバルブ2aを閉じ、駆動モーター
を作動させることにより支持円盤15a、15bを回転
させる。このとき、バンパーBの載置された各ハンガー
16はその上端部位置で両支持円盤15a。First, the door of the storage chamber 1 is opened, the rotation device 11 housed in the center thereof is slid forward together with the frame 12, and the plasma-treated Leham bar B is placed at a predetermined position on each hanger 16. Next, the rotating device 11
The pressure is reduced to the center of the storage chamber 1. When the pressure inside the storage chamber 11 is reduced to a predetermined pressure, the valve 2a is closed and the drive motor is activated to rotate the support disks 15a and 15b. At this time, each hanger 16 on which the bumper B is placed has both support disks 15a at its upper end position.
15bにそれぞれ相対回転可能に取着されているため、
バンパーBは水平状態を保持したまま両支持円盤15a
、15bとともに回転することになる。一方、回転装置
11の始動と同時にプラズマ発生装置が作動し、ここか
ら供給されるプラズマガスが導入管4を経てプラズマ噴
射管3の各噴射口5から収容室1内に噴射される。15b so that they can rotate relative to each other,
Bumper B holds both support disks 15a while maintaining its horizontal state.
, 15b. On the other hand, at the same time as the rotating device 11 is started, the plasma generating device is activated, and plasma gas supplied therefrom is injected into the storage chamber 1 from each injection port 5 of the plasma injection tube 3 via the introduction pipe 4.
このとき、排気口2に設けられたバルブ2aは゛キ干開
放され、プラズマガスの噴射による気圧上騨を防いで収
容室1内が常に所定圧に保たれるようになっている。At this time, the valve 2a provided at the exhaust port 2 is completely opened to prevent atmospheric pressure build-up due to the injection of plasma gas and to keep the inside of the storage chamber 1 at a predetermined pressure at all times.
上記プラズマ処理装置の収容室1の内壁および回転装置
11の主要部の表面にはいずれも酸化防止のための各種
被膜が形成されているため、長期間の使用においても基
材(炭素鋼)の腐食を防止することができる。また、従
来のステンレス・スチールを用いたプラズマ処理装置に
比べて安価で加工性の良好な基材を用いているため、装
置の製造コストは極めて安価である。Various coatings for preventing oxidation are formed on the inner wall of the storage chamber 1 and the surface of the main parts of the rotating device 11 of the plasma processing apparatus, so that even during long-term use, the base material (carbon steel) remains intact. Corrosion can be prevented. Furthermore, since the base material is cheaper and easier to work with than conventional plasma processing equipment using stainless steel, the manufacturing cost of the equipment is extremely low.
なお、本発明は上記実施例に限定されるものではなく、
その要旨を逸脱しない範囲で細部の仕様を適宜変更する
ことが可能である。例えば、■ 熱硬化性アクリル樹脂
傅料に代え、アミノアルキッド系、アクリル変性アルキ
ッド系、エポキシ系およびウレタン系塗料など、耐食性
の良好な各種の塗料を用いてもよ(、メッキもクロムの
みならずニッケルその他各種の金属を用いることも可能
である。Note that the present invention is not limited to the above embodiments,
Detailed specifications can be changed as appropriate without departing from the gist. For example, instead of thermosetting acrylic resin, various paints with good corrosion resistance such as amino alkyd, acrylic modified alkyd, epoxy, and urethane paints may be used. It is also possible to use nickel and other various metals.
■ 高周波イオンブレーティング法のみならずスパッタ
リング法、真空蒸着法などの各種乾式メッキ法を用いて
耐食性の良好な各種金属並びに金属酸化物からなる被膜
を形成してもよい。(2) A film made of various metals or metal oxides having good corrosion resistance may be formed using not only the high-frequency ion blasting method but also various dry plating methods such as sputtering method and vacuum evaporation method.
■ 基材としては炭素鋼のみならず他の安価な金属を用
いてもよく、部分的には合成樹脂を使用することも可能
である。(2) As the base material, not only carbon steel but also other inexpensive metals may be used, and it is also possible to partially use synthetic resin.
■ 複数のプラズマ噴射管を備えた他のタイプのプラズ
マ処理装置にも適用可能である。■ It is also applicable to other types of plasma processing equipment equipped with multiple plasma injection tubes.
発明の効果
以上詳述したように、本発明のプラズマ処理装置は、装
置を構成する収容室の内壁、プラズマ噴射管、支持円盤
、ハンガーなどの各基材に安価で加工性の良好な材料を
使用し、さらにそれら基材の表面、とりわけプラズマ照
射量の多いハンガーの基材表面に塗装、湿式メンキある
いは乾式メッキなどによる酸化防止被膜を形成したもの
であって、耐食性に優れ、かつ、製造コストも安価であ
るという効果を発揮し、プラズマ処理装置として優れた
発明である。Effects of the Invention As detailed above, the plasma processing apparatus of the present invention uses materials that are inexpensive and have good workability for each base material such as the inner wall of the storage chamber, the plasma injection tube, the support disk, and the hanger that constitute the apparatus. Furthermore, an anti-oxidation coating is formed by painting, wet coating, or dry plating on the surface of these base materials, especially the surface of the hanger base material, which is exposed to a large amount of plasma irradiation.It has excellent corrosion resistance and is inexpensive to manufacture. This invention also exhibits the effect of being inexpensive and is an excellent invention as a plasma processing apparatus.
第1図は本発明を具体化したプラズマ処理装置の一実施
例を示す断面図、第2図は第1図の斜視図・第3図は噴
射管の正面図、第4図は噴射管の破断面を示す部分拡大
図、第5図は第3図のA−A線断面図、第6図は第3図
のB−B線断面図、また、第7図はハンガーの端部を示
す拡大斜視図である。
1・・収容室、2・・排気口、5・・噴射口、3・・プ
ラズマ噴射管、B・・合成樹脂バンパー。
特許出願人 豊田合成株式会社代理人
弁理士 恩田博宣第2図
図面その2
図面その4
待図WJ無し
第7図Fig. 1 is a sectional view showing an embodiment of a plasma processing apparatus embodying the present invention, Fig. 2 is a perspective view of Fig. 1, Fig. 3 is a front view of the injection pipe, and Fig. 4 is a view of the injection pipe. 5 is a sectional view taken along the line A-A in FIG. 3, FIG. 6 is a sectional view taken along the line B-B in FIG. 3, and FIG. 7 shows the end of the hanger. It is an enlarged perspective view. 1. Containment chamber, 2. Exhaust port, 5. Injection port, 3. Plasma injection pipe, B. Synthetic resin bumper. Patent applicant Toyoda Gosei Co., Ltd. agent
Patent Attorney Hironobu Onda Figure 2 Drawing No. 4 Drawing No. WJ Figure 7
Claims (1)
容室(1)と、同収容室(1)内壁に配設され、同収容
室(1)内へプラズマガスを噴射するプラズマ噴射管(
3)と、同収容室(1)内を減圧する排気口(2)と、
被塗装品が載置される複数個のハンガー(16)とを備
えたプラズマ処理装置において、少なくともハンガー(
16)基材の表面には酸化防止被膜(8)が形成されて
いることを特徴とするプラズマ処理装置。1. A storage chamber (1) that accommodates objects to be painted such as synthetic resin bumpers (B), and a plasma injection device that is installed on the inner wall of the storage chamber (1) and injects plasma gas into the storage chamber (1). tube(
3), and an exhaust port (2) that depressurizes the inside of the containment chamber (1).
In a plasma processing apparatus equipped with a plurality of hangers (16) on which objects to be coated are placed, at least the hangers (16)
16) A plasma processing apparatus characterized in that an antioxidant coating (8) is formed on the surface of the base material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18609585A JPS6245631A (en) | 1985-08-24 | 1985-08-24 | Plasma treatment apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18609585A JPS6245631A (en) | 1985-08-24 | 1985-08-24 | Plasma treatment apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6245631A true JPS6245631A (en) | 1987-02-27 |
Family
ID=16182278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18609585A Pending JPS6245631A (en) | 1985-08-24 | 1985-08-24 | Plasma treatment apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6245631A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5513417A (en) * | 1993-07-19 | 1996-05-07 | Samsung Electronics Co., Ltd. | Silencing device for vacuum cleaner |
-
1985
- 1985-08-24 JP JP18609585A patent/JPS6245631A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5513417A (en) * | 1993-07-19 | 1996-05-07 | Samsung Electronics Co., Ltd. | Silencing device for vacuum cleaner |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN208308952U (en) | The uniform vacuum coater of plated film | |
US6821560B2 (en) | Surface-treating support member and method using the same | |
US5558909A (en) | Apparatus and method for vacuum-metallizing articles with significant deposition onto three-dimensional surfaces | |
JPS6245631A (en) | Plasma treatment apparatus | |
CN109338320B (en) | Process for magnetron sputtering coating on surface of plastic part | |
EP1129232B1 (en) | Apparatus for coating objects through pvd | |
CN208136324U (en) | A kind of vacuum coater | |
JPS6250334A (en) | Plasma treatment apparatus | |
JPS58208326A (en) | Plasma treatment | |
JPS60129158A (en) | Plasma treating device | |
US20030111342A1 (en) | Sputter coating apparatus | |
JP4510121B2 (en) | Sputtering apparatus and method of forming a film by sputtering | |
CN216826772U (en) | PVD instrument vacuum coating machine | |
CN106929803B (en) | Film coated plastic production equipment and its production method | |
JPS6245632A (en) | Plasma treatment apparatus | |
JPH027646Y2 (en) | ||
JPS6351062B2 (en) | ||
CN111101099B (en) | Anhydrous atomization vapor deposition method and vapor deposition device for automobile ornament | |
CN217450656U (en) | 360 rotatory spraying tool of degree | |
CN217856880U (en) | Surface treatment device for machining of mechanical parts | |
CN216274355U (en) | Multi-target vacuum chamber of film plating machine | |
KR20060074383A (en) | Apparatus for a coating layer for shielding electro magnetic interference and its method | |
CN220258413U (en) | Uniform spraying device for parts | |
CN209957891U (en) | Magnetic material vacuum coating machine with auxiliary heating function | |
JPS6215233A (en) | Plasma treatment and apparatus therefor |