JPS6250335A - Plasma treatment apparatus - Google Patents

Plasma treatment apparatus

Info

Publication number
JPS6250335A
JPS6250335A JP19161385A JP19161385A JPS6250335A JP S6250335 A JPS6250335 A JP S6250335A JP 19161385 A JP19161385 A JP 19161385A JP 19161385 A JP19161385 A JP 19161385A JP S6250335 A JPS6250335 A JP S6250335A
Authority
JP
Japan
Prior art keywords
plasma
storage chamber
plasma gas
rotating shaft
injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19161385A
Other languages
Japanese (ja)
Inventor
Yasuhiko Ogisu
康彦 荻巣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyoda Gosei Co Ltd
Original Assignee
Toyoda Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyoda Gosei Co Ltd filed Critical Toyoda Gosei Co Ltd
Priority to JP19161385A priority Critical patent/JPS6250335A/en
Publication of JPS6250335A publication Critical patent/JPS6250335A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B29C59/142Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment of profiled articles, e.g. hollow or tubular articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00Other particular articles
    • B29L2031/30Vehicles, e.g. ships or aircraft, or body parts thereof
    • B29L2031/3044Bumpers

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To effect the uniform plasma treatment of bumpers within a short time without increasing the size of the apparatus, by injecting a plasma gas from a rotary shaft and/or hungers. CONSTITUTION:Bumpers B are mounted on hungers 23 of a rotary device 8 in a holding chamber 1, and the pressure in the chamber 1 is decreased by operating a regulation valve of a vent 3. Supporting discs are rotated by operating a motor 18 and at the same time a plasma generator is started. The plasma gas fed from this generator is passed through a feed pipe 25 and is injected from injection openings in a rotary shaft 10 as a plasma injection pipe. The increase in the pressure in the chamber 1 by plasma gas injection is prevented by operating the regulation valve of the vent 3. If required, the hangers 23 may be used as plasma gas injection pipes.

Description

【発明の詳細な説明】 発明の目的 (産業上の利用分野) 本発明は、収容室内の回転支持円盤に取着された複数個
のハンガーにバンパーその他の合成樹脂成形品を載置し
、その表面にプラズマ処理を施すことにより塗料などの
密着性を向上させるプラズマ処理装置に係り、詳しくは
プラズマを噴射するためのプラズマ噴射管に関するもの
である。
Detailed Description of the Invention Object of the Invention (Industrial Field of Application) The present invention provides a method for placing bumpers and other synthetic resin molded products on a plurality of hangers attached to a rotating support disk in a storage chamber. The present invention relates to a plasma treatment device that improves the adhesion of paint or the like by subjecting the surface to plasma treatment, and specifically relates to a plasma injection tube for injecting plasma.

(従来の技術) ポリエチレン(PE)、ポリプロピレン(PP)などの
ポリオレフィン系熱可塑性樹脂あるいは各種熱硬化性樹
脂は塗料や接着剤に対する密着性に乏しく、これらを塗
布しても塗膜の剥離が生じやすい。そのため、各種の前
処理法が採用されているが、近年、減圧下における放電
処理により合成樹脂基材表面を改質するプラズマ処理法
が多用されるようになった。
(Prior art) Polyolefin thermoplastic resins such as polyethylene (PE) and polypropylene (PP) or various thermosetting resins have poor adhesion to paints and adhesives, and even when these are applied, the paint film may peel off. Cheap. For this reason, various pretreatment methods have been adopted, and in recent years, plasma treatment methods have come into frequent use, in which the surface of synthetic resin substrates is modified by electric discharge treatment under reduced pressure.

上記プラズマ処理を行うための装置としては本願出願人
が先に出願した特願昭58−236546号に示す装置
を例示することができる。
An example of an apparatus for carrying out the above-mentioned plasma treatment is the apparatus shown in Japanese Patent Application No. 58-236546 previously filed by the applicant of the present invention.

すなわち、第5図に示すプラズマ処理装置であって、被
処理品である合成樹脂製バンパーBなどを収納する気密
可能な収容室51と、その内壁に配設され、被処理品に
プラズマガスを噴射する一本のプラズマ噴射管52と、
収容室51内を減圧するための排気口55と、回転軸5
7の回りで一体回転する一対の支持円盤53a、53b
と、これら一対の支持円盤53a、53b間に相対回動
可能に取着され、被処理品が載置される複数台のハンガ
ー54とを備えた構成になっている。
That is, the plasma processing apparatus shown in FIG. 5 includes an airtight storage chamber 51 for storing a synthetic resin bumper B etc. which is an article to be treated, and a storage chamber 51 arranged on the inner wall of the chamber 51 for supplying plasma gas to the article to be treated. One plasma injection tube 52 that injects,
An exhaust port 55 for reducing the pressure inside the storage chamber 51 and a rotating shaft 5
A pair of support disks 53a and 53b that rotate together around 7.
and a plurality of hangers 54, which are relatively rotatably attached between the pair of support disks 53a and 53b, and on which the objects to be processed are placed.

なお、上記プラズマ噴射管52は導入管56を介して図
示しないプラズマ発生装置に接続されており、同発生装
置から供給される酸素プラズマガスを収容室51内に噴
射するようになっている。
The plasma injection tube 52 is connected to a plasma generator (not shown) via an introduction tube 56, and is configured to inject oxygen plasma gas supplied from the generator into the accommodation chamber 51.

(発明が解決しようとする問題点) ところが、上記装置においてプラズマ噴射管は収容室内
に一本しかないため、バンパーなどの大型成形品の処理
面全体を均一にプラズマ処理する場合には長時間を要す
るという問題点がある。
(Problem to be Solved by the Invention) However, since the above-mentioned apparatus has only one plasma injection tube in the storage chamber, it takes a long time to uniformly plasma-treat the entire surface of a large molded product such as a bumper. There is a problem that it is necessary.

そこで処理時間を短縮するための手段として、プラズマ
噴射管を多数本設ける構成が採用されているが、プラズ
マ処理装置が複雑化し、製造コストが高価なものになる
などの問題点が生ずる。
Therefore, as a means to shorten the processing time, a configuration in which a large number of plasma injection tubes are provided has been adopted, but this poses problems such as complicating the plasma processing apparatus and increasing manufacturing cost.

本発明はこれらの問題点に鑑みてなされたものであって
、バンパーなどの大型成形品の処理に際し、プラズマ処
理装置を複雑化することなく、短時間で被処理品を均一
にプラズマ処理する手段を提供するものである。
The present invention has been made in view of these problems, and is a means of uniformly plasma-treating the target product in a short time without complicating the plasma processing equipment when processing large molded products such as bumpers. It provides:

発明の構成 (問題点を解決するための手段) すなわち、本発明は合成樹脂バンパー等の被塗装品を収
容する収容室と、同収容室内へプラズマガスを噴射する
プラズマ噴射管と、同収容室内を減圧する排気口と、回
転軸の周りで一体回転する一対の支持円盤およびこの一
対の支持円盤間に相対回動可能に取着され、被塗装品が
載置される複数個のハンガーからなる回転装置とを備え
たプラズマ処理装置において、前記回転軸および/また
はハンガーがプラズマ噴射管であることを特徴とするプ
ラズマ処理装置を採用することにより、上記問題点の解
決を図ったものである。
Structure of the Invention (Means for Solving the Problems) That is, the present invention provides a storage chamber for accommodating objects to be painted such as synthetic resin bumpers, a plasma injection pipe for injecting plasma gas into the storage chamber, and a plasma injection tube for injecting plasma gas into the storage chamber. It consists of an exhaust port that depressurizes the air, a pair of support disks that rotate together around a rotating shaft, and a plurality of hangers that are attached so as to be relatively rotatable between the pair of support disks and on which the workpiece to be coated is placed. The above-mentioned problems are solved by employing a plasma processing apparatus equipped with a rotating device, in which the rotating shaft and/or the hanger are plasma injection tubes.

(作用) 前記回転軸は被処理品が載置された各ハンガーの中心部
に位置し、しかも被処理品から至近距離にある。そのた
め、この回転軸から噴射されるプラズマガスは各ハンガ
ーに載置された被処理品に対し均等に拡散され、しかも
被処理品への照射量も十分である。また、ハンガーの一
部をプラズマ噴射管として構成した場合にも、隣接する
ハンガーに載置された被処理品に対しプラズマガスを十
分に照射することが可能となる。
(Function) The rotating shaft is located at the center of each hanger on which an item to be processed is placed, and is located at a close distance from the item to be processed. Therefore, the plasma gas injected from the rotating shaft is uniformly diffused to the objects to be processed placed on each hanger, and the amount of irradiation to the objects to be processed is also sufficient. Further, even when a part of the hanger is configured as a plasma injection tube, it is possible to sufficiently irradiate the plasma gas to the workpieces placed on the adjacent hangers.

従って、これらの構成を採用することにより、被処理品
を短時間で、かつ、均一に処理することができる。
Therefore, by employing these configurations, it is possible to uniformly process the items to be processed in a short time.

(実施例) 以下、本発明を車両用バンパーの表面をプラズマ処理す
る装置に具体化した一実施例につき、第1〜3図に従っ
て説明する。
(Example) Hereinafter, an example in which the present invention is embodied in an apparatus for plasma-treating the surface of a vehicle bumper will be described with reference to FIGS. 1 to 3.

本実施例のプラズマ処理装置の収容室1は第1図に示す
ように、その−側端に出入口2を備え、この出入口2に
は扉4が開閉可能に取着されている。さらに、この収容
室1の裏側壁中央部には図示しない吸引ポンプに接続さ
れた排気口3が設けられ、収容室1内を減圧可能として
いる。
As shown in FIG. 1, the storage chamber 1 of the plasma processing apparatus of this embodiment has an entrance 2 at its negative end, and a door 4 is attached to the entrance 2 so that it can be opened and closed. Furthermore, an exhaust port 3 connected to a suction pump (not shown) is provided at the center of the back wall of the storage chamber 1, making it possible to reduce the pressure inside the storage chamber 1.

また、収容室1内の底部には一対のレール5が所定間隔
を置いて配設され、収容室1内のほぼ全長にわたって延
びており、回転支持台6を扉4方向に移動可能に支持し
ている。
Furthermore, a pair of rails 5 are arranged at a predetermined interval at the bottom of the storage chamber 1 and extend over almost the entire length of the storage chamber 1, supporting the rotary support 6 so as to be movable in the direction of the door 4. ing.

第1〜3図に示すように、この回転支持台6は支持フレ
ーム7と、その支持フレーム7上に水平軸線の回りで回
転可能に支持された回転装置8とにより構成され、支持
フレーム7の下部両側にはレール5に沿って転勤する複
数個の車輪9が回転可能に取着されている。また、回転
装置8は中央の回転軸10とその両端近傍に固定された
一対の支持円盤11とにより構成されている。
As shown in FIGS. 1 to 3, this rotary support stand 6 is composed of a support frame 7 and a rotation device 8 supported on the support frame 7 so as to be rotatable around a horizontal axis. A plurality of wheels 9 are rotatably attached to both sides of the lower part and are rotated along the rail 5. Further, the rotating device 8 includes a central rotating shaft 10 and a pair of support disks 11 fixed near both ends of the rotating shaft 10.

上記回転輪10は一端が封止された中空円筒状のステン
レス鋼からなり、他端には導入管25が図示しないロッ
ク機構によって着脱可能に装着されている。また、上記
導入管25の他端は図示しないプラズマ発生装置に接続
されている。
The rotating ring 10 is made of stainless steel and has a hollow cylindrical shape with one end sealed, and an introduction pipe 25 is detachably attached to the other end by a locking mechanism (not shown). The other end of the introduction pipe 25 is connected to a plasma generator (not shown).

さらに、この回転軸10には全周にわたってほぼ均一に
多数の噴射口26が形成されており、プラズマ発生装置
から供給される酸素プラズマガスが収容室l内に噴射さ
れるようになっている。
Furthermore, a large number of injection ports 26 are formed almost uniformly over the entire circumference of the rotating shaft 10, so that the oxygen plasma gas supplied from the plasma generator is injected into the storage chamber l.

また、回転軸10の右端には山車12が、また左側には
スプロケットホイール13がそれぞれ固定されている。
Further, a float 12 is fixed to the right end of the rotating shaft 10, and a sprocket wheel 13 is fixed to the left side.

このスプロケットホイール13と対応して支持フレーム
7の左側板には第二のスプロケットホイール14および
歯車15が支え軸16により一体回転可能に支持される
とともに両スプロケットホイール13.14間にはチェ
ーン17が掛装されている。また、収容室1の外側には
モーター18が支持板19を介して配設され、そのモー
ター軸20が軸受筒21を介して収容室1内に突出して
いる。そして、このモーター軸20の内端には歯車22
が固定され、収容室1内への回転支持台6の移動に伴っ
て支持フレーム7上の歯車15に保合離脱するようにな
っている。
Corresponding to this sprocket wheel 13, a second sprocket wheel 14 and a gear 15 are rotatably supported on the left side plate of the support frame 7 by a support shaft 16, and a chain 17 is connected between both sprocket wheels 13 and 14. It is hung. Further, a motor 18 is disposed outside the storage chamber 1 via a support plate 19, and a motor shaft 20 thereof projects into the storage chamber 1 via a bearing sleeve 21. A gear 22 is provided at the inner end of this motor shaft 20.
is fixed, and as the rotary support base 6 moves into the storage chamber 1, it engages with and separates from the gear 15 on the support frame 7.

第1.2図に示すように、前記回転支持台6の両支持円
盤11間には複数台(本実施例では6台)のハンガー2
3がその左右両側板の上端部で支え軸24により相対回
転可能に取着され、その上部に被処理品である合成樹脂
製の自動車用バンパーBなどが載置されるようになって
いる。
As shown in FIG. 1.2, there are a plurality of hangers 2 (six in this embodiment) between both support disks 11 of the rotary support base 6.
3 is attached to the upper end portions of the left and right side plates thereof so as to be relatively rotatable by means of support shafts 24, and the article to be processed, such as a synthetic resin automobile bumper B, is placed on top of the support shaft 24.

次に、以上の構成からなるプラズマ処理装置を用いたバ
ンパーBの処理工程を説明する。
Next, a process for processing the bumper B using the plasma processing apparatus having the above configuration will be explained.

まず、収容室1の扉4を開いてその中央部に収納された
回転装置8を支持フレーム7とともに手前にスライドさ
せ、プラズマ処理の施されるバンパーBを各ハンガー2
3の所定位置に載置する。
First, open the door 4 of the storage chamber 1, slide the rotating device 8 housed in the center of the door toward you together with the support frame 7, and place the bumper B to be subjected to plasma treatment on each hanger 2.
3. Place it in the specified position.

さらに、回転装置8を収容室lの中央部に戻して導入管
25の先端と回転軸10の先端とをロック機構を介して
嵌着し、次いで、扉4を閉じた後、排気口3に設けられ
た図示しない開閉バルブを開放して収容室1内の気圧が
0.5〜0.6Torr程度になるまで減圧する。
Furthermore, the rotating device 8 is returned to the center of the storage chamber l, the tip of the introduction tube 25 and the tip of the rotating shaft 10 are fitted via the lock mechanism, and then, after closing the door 4, the exhaust port 3 is connected to the rotating device 8. A provided opening/closing valve (not shown) is opened to reduce the pressure inside the storage chamber 1 to about 0.5 to 0.6 Torr.

収容室l内が所定圧まで減圧されたら開閉バルブを閉し
、モーター18を作動して支持円盤11を回転させる。
When the pressure inside the storage chamber 1 is reduced to a predetermined pressure, the opening/closing valve is closed, and the motor 18 is activated to rotate the support disk 11.

一方、支持円盤11の回転と同時にプラズマ発生装置も
始動し、この発生装置から供給されるプラズマガスが導
入管25を経てプラズマ噴射管である回転軸lOの各噴
射口26から収容室1内に噴射される。なお、このとき
排気口3に設けられた開閉バルブが若干開放され、プラ
ズマガスの噴射による収容室l内の気圧上昇を防止して
いる。
On the other hand, at the same time as the support disk 11 rotates, the plasma generator also starts, and the plasma gas supplied from the generator passes through the introduction pipe 25 and enters the accommodation chamber 1 from each injection port 26 of the rotating shaft lO, which is a plasma injection pipe. Injected. Note that at this time, the opening/closing valve provided at the exhaust port 3 is slightly opened to prevent an increase in the pressure inside the storage chamber 1 due to the injection of plasma gas.

以上のように、」二記プラズマ処理装置においては、バ
ンパーBの近傍である回転軸10からプラズマガスが噴
射されるため、短時間で均一なプラズマ処理を施すこと
が可能となる。
As described above, in the plasma processing apparatus described in Section 2, since plasma gas is injected from the rotating shaft 10 near the bumper B, uniform plasma processing can be performed in a short time.

次に、第4図は本発明の他の実施例を示すものであって
、回転軸10のみならずハンガー23のフレーム28も
プラズマ噴射管として構成されており、隣接するハンガ
ー23に載置されたバンパーBに十分なプラズマガスが
照射されるようになっている。従って、より短時間で均
一なプラズマ処理を施すことが可能となり、バンパーB
のみならず、特に表面形状の複雑な被処理品のプラズマ
処理に採用することができる。
Next, FIG. 4 shows another embodiment of the present invention, in which not only the rotating shaft 10 but also the frame 28 of the hanger 23 are configured as plasma injection tubes, and the frame 28 of the hanger 23 is placed on the adjacent hanger 23. The bumper B is irradiated with sufficient plasma gas. Therefore, it is possible to perform uniform plasma treatment in a shorter time, and bumper B
In addition, it can be particularly applied to plasma processing of workpieces with complex surface shapes.

なお、本発明は上記各実施例に限定されるものではなく
、例えば噴射口の数を増加したり、その断面形状を楕円
形にしたりしてもよく、さらに、回転軸の口径や材質を
変更するなど、その要旨を逸脱しない範囲で細部の仕様
を自由に変更することが可能である。
Note that the present invention is not limited to the above-mentioned embodiments; for example, the number of injection ports may be increased, the cross-sectional shape thereof may be made oval, and the diameter and material of the rotating shaft may also be changed. It is possible to freely change the detailed specifications without departing from the gist.

発明の効果 以上詳述したように、本発明にあってはバンパーなどの
被処理品の至近距離にある回転軸および/またはハンガ
ーからプラズマガスが噴1・1されるため、プラズマ処
理装置を大型化することなく、短時間で均一なプラズマ
処理が可能になるという効果を発揮し、バンパーのみな
らず各種の合成樹脂成形品のプラズマ処理に適用できる
優れた発明である。
Effects of the Invention As detailed above, in the present invention, plasma gas is jetted 1.1 from the rotating shaft and/or hanger located close to the object to be processed, such as a bumper. This is an excellent invention that can be applied to plasma treatment not only for bumpers but also for various synthetic resin molded products.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明を具体化したプラズマ処理装置の一実施
例を示す縦断面図、第2図は同装置の斜視図、第3図は
同′j装置の部分拡大側断面図、第4図は他の実施例を
示す斜視図、また、第5図は従来のプラズマ処理装置を
示す斜視図である。 ■・・収容室、10・・回転軸、23・・ハンガー、B
・・バンパー。 312図 jI4BKI 第5図 手続r市1E吉(方式) 2、発明の名称 プラズマ処理装置 3、補正をする者 事f1との関係: 特許出願人 住 所   愛知県西春日井郡春日村大字落合字良畑1
番地氏 名   豊田合成 株式会社 (名 称)  代表者  根本 正大 4、代即人
FIG. 1 is a vertical sectional view showing an embodiment of a plasma processing apparatus embodying the present invention, FIG. 2 is a perspective view of the same apparatus, FIG. 3 is a partially enlarged side sectional view of the same apparatus, and FIG. This figure is a perspective view showing another embodiment, and FIG. 5 is a perspective view showing a conventional plasma processing apparatus. ■... Containment chamber, 10... Rotating shaft, 23... Hanger, B
··bumper. 312 Figure jI4BKI Figure 5 Procedure r City 1E Kichi (Method) 2. Name of the invention Plasma processing device 3 Relationship with the person making the amendment f1: Patent applicant address Ochiai Aza Ryohata, Kasuga Village, Nishi Kasugai District, Aichi Prefecture 1
Address Name Toyoda Gosei Co., Ltd. (Name) Representative Masahiro Nemoto 4, Sototo

Claims (1)

【特許請求の範囲】[Claims] 1、合成樹脂バンパー(B)等の被塗装品を収容する収
容室(1)と、同収容室(1)内へプラズマガスを噴射
するプラズマ噴射管と、同収容室(1)内を減圧する排
気口(3)と、回転軸(10)の周りで一体回転する一
対の支持円盤(11)および前記一対の支持円盤(11
)間に相対回動可能に取着され、被塗装品が載置される
複数個のハンガー(23)からなる回転装置(8)とを
備えたプラズマ処理装置において、前記回転軸(10)
および/またはハンガー(23)がプラズマ噴射管であ
ることを特徴とするプラズマ処理装置。
1. A storage chamber (1) that accommodates objects to be painted such as synthetic resin bumpers (B), a plasma injection pipe that injects plasma gas into the storage chamber (1), and a depressurization system inside the storage chamber (1). a pair of support disks (11) that rotate integrally around a rotating shaft (10), and a pair of support disks (11) that
) and a rotating device (8) consisting of a plurality of hangers (23) on which the workpiece to be coated is mounted and mounted so as to be relatively rotatable between the rotating shaft (10).
and/or a plasma processing apparatus characterized in that the hanger (23) is a plasma injection tube.
JP19161385A 1985-08-29 1985-08-29 Plasma treatment apparatus Pending JPS6250335A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19161385A JPS6250335A (en) 1985-08-29 1985-08-29 Plasma treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19161385A JPS6250335A (en) 1985-08-29 1985-08-29 Plasma treatment apparatus

Publications (1)

Publication Number Publication Date
JPS6250335A true JPS6250335A (en) 1987-03-05

Family

ID=16277545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19161385A Pending JPS6250335A (en) 1985-08-29 1985-08-29 Plasma treatment apparatus

Country Status (1)

Country Link
JP (1) JPS6250335A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0658416A2 (en) * 1993-11-23 1995-06-21 Dyconex Patente Ag Method for texturing polymer foils

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0658416A2 (en) * 1993-11-23 1995-06-21 Dyconex Patente Ag Method for texturing polymer foils
EP0658416A3 (en) * 1993-11-23 1995-07-26 Heinze Dyconex Patente

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