JPS6242157A - イオンビ−ム照射加工装置 - Google Patents
イオンビ−ム照射加工装置Info
- Publication number
- JPS6242157A JPS6242157A JP60182464A JP18246485A JPS6242157A JP S6242157 A JPS6242157 A JP S6242157A JP 60182464 A JP60182464 A JP 60182464A JP 18246485 A JP18246485 A JP 18246485A JP S6242157 A JPS6242157 A JP S6242157A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- workpiece
- dot
- beam irradiation
- blank time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 title claims abstract description 72
- 230000001678 irradiating effect Effects 0.000 title claims description 4
- 239000002245 particle Substances 0.000 claims description 9
- 230000003472 neutralizing effect Effects 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 101100342337 Caenorhabditis elegans klf-1 gene Proteins 0.000 description 1
- 241000406668 Loxodonta cyclotis Species 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- CKHJYUSOUQDYEN-UHFFFAOYSA-N gallium(3+) Chemical compound [Ga+3] CKHJYUSOUQDYEN-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60182464A JPS6242157A (ja) | 1985-08-20 | 1985-08-20 | イオンビ−ム照射加工装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60182464A JPS6242157A (ja) | 1985-08-20 | 1985-08-20 | イオンビ−ム照射加工装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6242157A true JPS6242157A (ja) | 1987-02-24 |
| JPH0135340B2 JPH0135340B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-07-25 |
Family
ID=16118719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60182464A Granted JPS6242157A (ja) | 1985-08-20 | 1985-08-20 | イオンビ−ム照射加工装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6242157A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63241953A (ja) * | 1987-03-30 | 1988-10-07 | Seiko Instr & Electronics Ltd | イオンビーム加工方法 |
| JPH01130158A (ja) * | 1987-11-16 | 1989-05-23 | Seiko Instr & Electron Ltd | パターン膜修正方法およびその装置 |
| JPH0532289A (ja) * | 1991-01-19 | 1993-02-09 | Basf Magnetics Gmbh | テープカセツト用の平行六面体容器 |
| CN108766877A (zh) * | 2018-04-19 | 2018-11-06 | 中国科学院上海应用物理研究所 | 一种具有周期性的表面电势梯度的材料的制备方法 |
-
1985
- 1985-08-20 JP JP60182464A patent/JPS6242157A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63241953A (ja) * | 1987-03-30 | 1988-10-07 | Seiko Instr & Electronics Ltd | イオンビーム加工方法 |
| JPH01130158A (ja) * | 1987-11-16 | 1989-05-23 | Seiko Instr & Electron Ltd | パターン膜修正方法およびその装置 |
| JPH0532289A (ja) * | 1991-01-19 | 1993-02-09 | Basf Magnetics Gmbh | テープカセツト用の平行六面体容器 |
| CN108766877A (zh) * | 2018-04-19 | 2018-11-06 | 中国科学院上海应用物理研究所 | 一种具有周期性的表面电势梯度的材料的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0135340B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-07-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |