JPS6241417B2 - - Google Patents
Info
- Publication number
- JPS6241417B2 JPS6241417B2 JP55010050A JP1005080A JPS6241417B2 JP S6241417 B2 JPS6241417 B2 JP S6241417B2 JP 55010050 A JP55010050 A JP 55010050A JP 1005080 A JP1005080 A JP 1005080A JP S6241417 B2 JPS6241417 B2 JP S6241417B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- scanning
- area
- minute
- drawn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1005080A JPS56108233A (en) | 1980-02-01 | 1980-02-01 | Electron-beam lithography apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1005080A JPS56108233A (en) | 1980-02-01 | 1980-02-01 | Electron-beam lithography apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56108233A JPS56108233A (en) | 1981-08-27 |
| JPS6241417B2 true JPS6241417B2 (enExample) | 1987-09-02 |
Family
ID=11739563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1005080A Granted JPS56108233A (en) | 1980-02-01 | 1980-02-01 | Electron-beam lithography apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56108233A (enExample) |
-
1980
- 1980-02-01 JP JP1005080A patent/JPS56108233A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56108233A (en) | 1981-08-27 |
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