JPS6241311B2 - - Google Patents
Info
- Publication number
- JPS6241311B2 JPS6241311B2 JP23271682A JP23271682A JPS6241311B2 JP S6241311 B2 JPS6241311 B2 JP S6241311B2 JP 23271682 A JP23271682 A JP 23271682A JP 23271682 A JP23271682 A JP 23271682A JP S6241311 B2 JPS6241311 B2 JP S6241311B2
- Authority
- JP
- Japan
- Prior art keywords
- pbtio
- thin film
- substrate
- sputtering
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 15
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000013077 target material Substances 0.000 claims description 6
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 239000011812 mixed powder Substances 0.000 claims description 3
- 239000013078 crystal Substances 0.000 description 10
- 239000010408 film Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 239000000395 magnesium oxide Substances 0.000 description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910003781 PbTiO3 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
Landscapes
- Inorganic Insulating Materials (AREA)
- Optical Integrated Circuits (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23271682A JPS59121119A (ja) | 1982-12-28 | 1982-12-28 | 強誘電体薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23271682A JPS59121119A (ja) | 1982-12-28 | 1982-12-28 | 強誘電体薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59121119A JPS59121119A (ja) | 1984-07-13 |
| JPS6241311B2 true JPS6241311B2 (US20030186963A1-20031002-C00026.png) | 1987-09-02 |
Family
ID=16943661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23271682A Granted JPS59121119A (ja) | 1982-12-28 | 1982-12-28 | 強誘電体薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59121119A (US20030186963A1-20031002-C00026.png) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61121006A (ja) * | 1984-11-16 | 1986-06-09 | Matsushita Electric Ind Co Ltd | 交叉光導波路の製造方法 |
| JPH0762235B2 (ja) * | 1987-10-05 | 1995-07-05 | 松下電器産業株式会社 | 強誘電体薄膜の製造方法 |
| JPH0812302B2 (ja) * | 1987-11-02 | 1996-02-07 | 株式会社日立製作所 | チタン酸化物薄膜の製造方法 |
| JP2506978B2 (ja) * | 1988-08-22 | 1996-06-12 | 松下電器産業株式会社 | チタン酸鉛薄膜の製造方法 |
| JP2676304B2 (ja) * | 1992-06-03 | 1997-11-12 | アネルバ株式会社 | 強誘電体薄膜作製方法 |
| JP4916210B2 (ja) * | 2006-04-12 | 2012-04-11 | 中国電力株式会社 | 電柱立上り防護管 |
-
1982
- 1982-12-28 JP JP23271682A patent/JPS59121119A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59121119A (ja) | 1984-07-13 |
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