JPS6240723B2 - - Google Patents
Info
- Publication number
- JPS6240723B2 JPS6240723B2 JP53040326A JP4032678A JPS6240723B2 JP S6240723 B2 JPS6240723 B2 JP S6240723B2 JP 53040326 A JP53040326 A JP 53040326A JP 4032678 A JP4032678 A JP 4032678A JP S6240723 B2 JPS6240723 B2 JP S6240723B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- controlled
- wafer
- rotation position
- setting method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 10
- 230000003287 optical effect Effects 0.000 claims description 6
- 230000006835 compression Effects 0.000 claims description 5
- 238000007906 compression Methods 0.000 claims description 5
- 238000001514 detection method Methods 0.000 description 17
- 238000010586 diagram Methods 0.000 description 5
- 230000009194 climbing Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Landscapes
- Control Of Position Or Direction (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4032678A JPS54133076A (en) | 1978-04-07 | 1978-04-07 | Set system for pattern rotation location |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4032678A JPS54133076A (en) | 1978-04-07 | 1978-04-07 | Set system for pattern rotation location |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54133076A JPS54133076A (en) | 1979-10-16 |
| JPS6240723B2 true JPS6240723B2 (enrdf_load_html_response) | 1987-08-29 |
Family
ID=12577475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4032678A Granted JPS54133076A (en) | 1978-04-07 | 1978-04-07 | Set system for pattern rotation location |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54133076A (enrdf_load_html_response) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05307919A (ja) * | 1990-12-21 | 1993-11-19 | Nippon Tungsten Co Ltd | 電気接点 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5666234A (en) * | 1979-11-02 | 1981-06-04 | Canon Kk | Measuring apparatus |
| JPS587822A (ja) * | 1981-07-06 | 1983-01-17 | Toshiba Corp | 回転位置合せ装置 |
| DE4113524A1 (de) * | 1991-04-25 | 1992-10-29 | Abb Patent Gmbh | Verfahren zur behandlung von oberflaechen |
-
1978
- 1978-04-07 JP JP4032678A patent/JPS54133076A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05307919A (ja) * | 1990-12-21 | 1993-11-19 | Nippon Tungsten Co Ltd | 電気接点 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54133076A (en) | 1979-10-16 |
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