JPS623972B2 - - Google Patents
Info
- Publication number
- JPS623972B2 JPS623972B2 JP55134618A JP13461880A JPS623972B2 JP S623972 B2 JPS623972 B2 JP S623972B2 JP 55134618 A JP55134618 A JP 55134618A JP 13461880 A JP13461880 A JP 13461880A JP S623972 B2 JPS623972 B2 JP S623972B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- resist
- adhesive
- molecular weight
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000853 adhesive Substances 0.000 claims description 32
- 230000001070 adhesive effect Effects 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 18
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 13
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 32
- 238000010894 electron beam technology Methods 0.000 description 12
- 238000005530 etching Methods 0.000 description 10
- 230000018109 developmental process Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55134618A JPS5759328A (en) | 1980-09-27 | 1980-09-27 | Method for fixed exfoliation of sample |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55134618A JPS5759328A (en) | 1980-09-27 | 1980-09-27 | Method for fixed exfoliation of sample |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5759328A JPS5759328A (en) | 1982-04-09 |
JPS623972B2 true JPS623972B2 (US07714131-20100511-C00038.png) | 1987-01-28 |
Family
ID=15132593
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55134618A Granted JPS5759328A (en) | 1980-09-27 | 1980-09-27 | Method for fixed exfoliation of sample |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5759328A (US07714131-20100511-C00038.png) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63156477U (US07714131-20100511-C00038.png) * | 1987-04-01 | 1988-10-13 | ||
JPH02163477A (ja) * | 1988-12-19 | 1990-06-22 | Kayaba Ind Co Ltd | 回転ピストンポンプ並びにモータ |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59192834U (ja) * | 1983-06-09 | 1984-12-21 | 富士通株式会社 | 基板保持構造 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5318969A (en) * | 1976-08-06 | 1978-02-21 | Nippon Telegr & Teleph Corp <Ntt> | Wafer fixing method |
-
1980
- 1980-09-27 JP JP55134618A patent/JPS5759328A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5318969A (en) * | 1976-08-06 | 1978-02-21 | Nippon Telegr & Teleph Corp <Ntt> | Wafer fixing method |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63156477U (US07714131-20100511-C00038.png) * | 1987-04-01 | 1988-10-13 | ||
JPH02163477A (ja) * | 1988-12-19 | 1990-06-22 | Kayaba Ind Co Ltd | 回転ピストンポンプ並びにモータ |
Also Published As
Publication number | Publication date |
---|---|
JPS5759328A (en) | 1982-04-09 |
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