JPS6239539B2 - - Google Patents
Info
- Publication number
- JPS6239539B2 JPS6239539B2 JP3186280A JP3186280A JPS6239539B2 JP S6239539 B2 JPS6239539 B2 JP S6239539B2 JP 3186280 A JP3186280 A JP 3186280A JP 3186280 A JP3186280 A JP 3186280A JP S6239539 B2 JPS6239539 B2 JP S6239539B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- plate
- wavelength
- shaped body
- grooves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 15
- 229910052594 sapphire Inorganic materials 0.000 claims description 11
- 239000010980 sapphire Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims 2
- 235000012431 wafers Nutrition 0.000 description 26
- 238000010586 diagram Methods 0.000 description 4
- 238000005452 bending Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/009—Working by laser beam, e.g. welding, cutting or boring using a non-absorbing, e.g. transparent, reflective or refractive, layer on the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/16—Removal of by-products, e.g. particles or vapours produced during treatment of a workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- High Energy & Nuclear Physics (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3186280A JPS56129340A (en) | 1980-03-13 | 1980-03-13 | Method of dividing platelike material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3186280A JPS56129340A (en) | 1980-03-13 | 1980-03-13 | Method of dividing platelike material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56129340A JPS56129340A (en) | 1981-10-09 |
JPS6239539B2 true JPS6239539B2 (zh) | 1987-08-24 |
Family
ID=12342853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3186280A Granted JPS56129340A (en) | 1980-03-13 | 1980-03-13 | Method of dividing platelike material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56129340A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01138080U (zh) * | 1988-03-15 | 1989-09-21 | ||
JP2008131008A (ja) * | 2006-11-24 | 2008-06-05 | Disco Abrasive Syst Ltd | ウエーハのレーザー加工方法およびレーザー加工装置 |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4857699A (en) * | 1987-01-30 | 1989-08-15 | Duley Walter W | Means of enhancing laser processing efficiency of metals |
JPS6424469A (en) * | 1987-07-20 | 1989-01-26 | Sanyo Electric Co | Photosensor manufacturing equipment |
JPH01266983A (ja) * | 1988-04-20 | 1989-10-24 | Hitachi Seiko Ltd | プリント基板穴明機 |
JPH04180649A (ja) * | 1990-11-15 | 1992-06-26 | Nec Yamagata Ltd | 半導体チップサンプリング装置 |
JPH0929472A (ja) * | 1995-07-14 | 1997-02-04 | Hitachi Ltd | 割断方法、割断装置及びチップ材料 |
JP4592855B2 (ja) * | 1999-12-24 | 2010-12-08 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
DE10144008A1 (de) * | 2001-09-07 | 2003-03-27 | Siemens Ag | Verfahren und Vorrichtung zum Erzeugen einer Bohrung in einem Werkstück mit Laserstrahlung |
WO2006038713A1 (en) * | 2004-10-07 | 2006-04-13 | Showa Denko K.K. | Production method for semiconductor device |
JP2006203251A (ja) * | 2004-10-07 | 2006-08-03 | Showa Denko Kk | 半導体素子の製造方法 |
JP4908936B2 (ja) * | 2005-06-30 | 2012-04-04 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP2007142277A (ja) * | 2005-11-21 | 2007-06-07 | Matsushita Electric Works Ltd | 発光素子の製造方法 |
JP2012199399A (ja) * | 2011-03-22 | 2012-10-18 | Panasonic Corp | レーザ加工方法及びレーザ加工装置 |
JP2013058536A (ja) * | 2011-09-07 | 2013-03-28 | Disco Abrasive Syst Ltd | デバイスウェーハの分割方法 |
JP5472242B2 (ja) * | 2011-09-20 | 2014-04-16 | 日亜化学工業株式会社 | 窒化物半導体素子の製造方法 |
JP6422693B2 (ja) * | 2014-07-16 | 2018-11-14 | 株式会社ディスコ | レーザー加工装置 |
TW201603927A (zh) * | 2014-07-29 | 2016-02-01 | Youngtek Electronics Corp | 雷射切割方法及其裝置 |
JP7219590B2 (ja) * | 2018-10-30 | 2023-02-08 | 浜松ホトニクス株式会社 | レーザ加工装置 |
JP7518646B2 (ja) * | 2020-03-30 | 2024-07-18 | 株式会社カネカ | 太陽電池セル、太陽電池モジュール及び太陽電池セル製造方法 |
-
1980
- 1980-03-13 JP JP3186280A patent/JPS56129340A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01138080U (zh) * | 1988-03-15 | 1989-09-21 | ||
JP2008131008A (ja) * | 2006-11-24 | 2008-06-05 | Disco Abrasive Syst Ltd | ウエーハのレーザー加工方法およびレーザー加工装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS56129340A (en) | 1981-10-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6239539B2 (zh) | ||
KR101975607B1 (ko) | 레이저 가공 장치 | |
US7364986B2 (en) | Laser beam processing method and laser beam machine | |
US8093530B2 (en) | Laser cutting apparatus and laser cutting method | |
TW201735143A (zh) | SiC晶圓的生成方法 | |
JP3670267B2 (ja) | レーザ加工方法 | |
JP4509573B2 (ja) | 半導体基板、半導体チップ、及び半導体デバイスの製造方法 | |
JP5940906B2 (ja) | レーザー加工装置 | |
US20060255022A1 (en) | Wafer laser processing method and laser beam processing machine | |
JP2004515365A (ja) | 半導体材料のレーザー加工 | |
WO2002022301A1 (fr) | Procede et dispositif d'usinage par rayonnement laser | |
CN102785028A (zh) | 激光加工方法以及激光加工装置 | |
JP2006108459A (ja) | シリコンウエーハのレーザー加工方法およびレーザー加工装置 | |
CN1301178C (zh) | 半导体中微结构的紫外线激光烧蚀的图案化 | |
JP2005294325A (ja) | 基板製造方法及び基板製造装置 | |
JP4509720B2 (ja) | レーザ加工方法 | |
TW201916139A (zh) | 晶圓加工方法 | |
CN110977188A (zh) | 一种基于空间光调制器的多焦点晶圆内部切割装置 | |
JP2005294656A (ja) | 基板製造方法及び基板製造装置 | |
JP2005142303A (ja) | シリコンウエーハの分割方法および分割装置 | |
KR20080093321A (ko) | 레이저가공 장치 | |
JP2003001458A (ja) | レーザ加工方法 | |
JPS62104692A (ja) | レ−ザ加工装置 | |
WO2004080642A1 (ja) | レーザ加工方法 | |
KR100562423B1 (ko) | 웨이퍼 절단용 레이저 시스템 및 이를 이용한 웨이퍼 절단방법 |