JPS6239535B2 - - Google Patents

Info

Publication number
JPS6239535B2
JPS6239535B2 JP54169185A JP16918579A JPS6239535B2 JP S6239535 B2 JPS6239535 B2 JP S6239535B2 JP 54169185 A JP54169185 A JP 54169185A JP 16918579 A JP16918579 A JP 16918579A JP S6239535 B2 JPS6239535 B2 JP S6239535B2
Authority
JP
Japan
Prior art keywords
data
pattern
central processing
electron beam
processing unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54169185A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5694626A (en
Inventor
Takeari Uema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16918579A priority Critical patent/JPS5694626A/ja
Publication of JPS5694626A publication Critical patent/JPS5694626A/ja
Publication of JPS6239535B2 publication Critical patent/JPS6239535B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP16918579A 1979-12-27 1979-12-27 Data-processing method in electron-beam exposure system Granted JPS5694626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16918579A JPS5694626A (en) 1979-12-27 1979-12-27 Data-processing method in electron-beam exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16918579A JPS5694626A (en) 1979-12-27 1979-12-27 Data-processing method in electron-beam exposure system

Publications (2)

Publication Number Publication Date
JPS5694626A JPS5694626A (en) 1981-07-31
JPS6239535B2 true JPS6239535B2 (enrdf_load_stackoverflow) 1987-08-24

Family

ID=15881805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16918579A Granted JPS5694626A (en) 1979-12-27 1979-12-27 Data-processing method in electron-beam exposure system

Country Status (1)

Country Link
JP (1) JPS5694626A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5386531A (en) * 1977-01-10 1978-07-31 Nec Corp Display unit of cathode-ray tube

Also Published As

Publication number Publication date
JPS5694626A (en) 1981-07-31

Similar Documents

Publication Publication Date Title
EP0066882B1 (en) Electron beam exposure system
US4538232A (en) Electron-beam lithographic apparatus
GB2152717A (en) Pattern data handling system for an electron beam exposure system
JPH0357608B2 (enrdf_load_stackoverflow)
JPS6227538B2 (enrdf_load_stackoverflow)
US5088050A (en) Apparatus for preparing output data from input image data, using basic output-image unit pattern data
JPS6298724A (ja) 電子線描画装置
JPS6239535B2 (enrdf_load_stackoverflow)
JP2744833B2 (ja) 荷電粒子ビーム描画方法
JP2786676B2 (ja) 荷電ビーム描画方法
EP0009662B1 (en) Method and apparatus for storing and reconstructing chinese-like characters
EP0090802B1 (en) A page modification method in a printer subsystem of the partial page buffer composing type
JP2664732B2 (ja) 荷電ビーム描画方法
US4468566A (en) Corpuscular beam control circuit arrangement
JP2697943B2 (ja) 荷電粒子ビーム描画における描画データの処理方法
JPS6390827A (ja) 荷電粒子線描画方法および装置
JPS6230491B2 (enrdf_load_stackoverflow)
JPS6381819A (ja) 電子ビ−ム露光の制御方式
JPS61287228A (ja) 電子線露光装置における描画方法
US5065445A (en) Apparatus for expanding and formatting runlength data for multiple exposure beams
JPS63133525A (ja) 荷電ビ−ム露光装置
JP2839587B2 (ja) 荷電ビーム描画方法
JP2633905B2 (ja) 電子ビーム露光装置
JPS63292377A (ja) 横線ベクトルの高速描画方式
JPH0218496B2 (enrdf_load_stackoverflow)