JPS623942B2 - - Google Patents
Info
- Publication number
- JPS623942B2 JPS623942B2 JP236981A JP236981A JPS623942B2 JP S623942 B2 JPS623942 B2 JP S623942B2 JP 236981 A JP236981 A JP 236981A JP 236981 A JP236981 A JP 236981A JP S623942 B2 JPS623942 B2 JP S623942B2
- Authority
- JP
- Japan
- Prior art keywords
- transparent glass
- glass substrate
- pattern
- hard mask
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000002844 melting Methods 0.000 claims description 6
- 230000008018 melting Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 1
- 230000007547 defect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Description
【発明の詳細な説明】
この発明は、大規模集積回路（VLSI）等に用
いられるハードマスクの製造方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a hard mask used in large scale integrated circuits (VLSI) and the like.
従来、VLSI用のガラスマスクは第１図に示す
ように、透明ガラス基板１上にクロム等の金属薄
膜よりなるパターン２を有するものであつた。第
１図に示すように、パターン２は光を通過させな
いクロム薄膜等の金属薄膜よりなり、透明ガラス
基板１は光をよく通すガラス材料より構成されて
いる。 Conventionally, a glass mask for VLSI has had a pattern 2 made of a thin film of metal such as chromium on a transparent glass substrate 1, as shown in FIG. As shown in FIG. 1, the pattern 2 is made of a metal thin film such as a chromium thin film that does not allow light to pass through, and the transparent glass substrate 1 is made of a glass material that allows light to pass through.
このような従来のハードマスクにおいては、パ
ターン２が外部に触れ易くなつているため、パタ
ーン２に傷がつき易く、欠陥が発生し易い欠点が
あつた。 In such a conventional hard mask, since the pattern 2 is easily touched by the outside, the pattern 2 is easily damaged and defects are easily generated.
この発明は、従来のパターン欠陥の発生し易い
ハードマスクの欠点を除去し、VLSI製造工程中
で半永久的に使用できるハードマスクの製造方法
を提供するものである。以下、この発明について
説明する。 The present invention provides a method for manufacturing a hard mask that can be used semi-permanently in the VLSI manufacturing process by eliminating the drawbacks of conventional hard masks that are prone to pattern defects. This invention will be explained below.
この発明によるハードマスクの製造方法を第２
図と第３図で説明する。第２図に示すように従来
の透明ガラス基板１のパターン２のある面上に透
明ガラス基板１と同質、すなわち熱膨張係数や光
の屈折率等が等しい透明ガラス基板１１を真空溶
融炉内において軟化点近くで熱すると、透明ガラ
ス基板１と透明ガラス基板１１が溶融して第２図
に示すようなサンドイツチ状のハードマスクがで
きあがる。なお、第３図に示すように、空気ある
いは不活性ガス（アルゴンガス等）内で溶融させ
た場合は気泡３が発生するが、この発明のように
真空溶融炉内で行うと、第２図に示すように透明
ガラス基板１と透明ガラス基板１１およびパター
ン２の間に何ら気泡を発生しない。したがつて、
光を用いるハードマスクとしては何ら支障をきた
さず、パターン面も裏面もガラスでおおわれてい
るため、VLSIの製造工程中何ら欠陥を生ぜず、
初期に形成された無欠陥マスクが半永久的に使用
可能となる。 A second method for manufacturing a hard mask according to the present invention
This will be explained with reference to the figure and FIG. As shown in FIG. 2, a transparent glass substrate 11 of the same quality as the transparent glass substrate 1, that is, having the same coefficient of thermal expansion and the same refractive index of light, etc., is placed on the surface of the conventional transparent glass substrate 1 with the pattern 2 in a vacuum melting furnace. When heated near the softening point, the transparent glass substrate 1 and the transparent glass substrate 11 are melted and a sandwich-like hard mask as shown in FIG. 2 is completed. As shown in Fig. 3, bubbles 3 are generated when melting is carried out in air or inert gas (argon gas, etc.), but when melting is carried out in a vacuum melting furnace as in the present invention, as shown in Fig. 2. As shown in the figure, no bubbles are generated between the transparent glass substrate 1, the transparent glass substrate 11, and the pattern 2. Therefore,
It does not cause any problems as a hard mask that uses light, and since both the pattern surface and the back surface are covered with glass, no defects occur during the VLSI manufacturing process.
The initially formed defect-free mask can be used semi-permanently.
以上説明したように、この発明はパターンを有
する透明ガラス基板上にこれと同質の透明ガラス
基板を載置し、真空溶融炉中でそれらの軟化点近
傍で熱して両透明ガラス基板を一体化させるもの
であるので、透明ガラス基板、およびパターンの
変質等を最小限におさえることができる利点があ
る。 As explained above, the present invention places a transparent glass substrate of the same quality on a transparent glass substrate having a pattern, and heats them in a vacuum melting furnace near their softening point to integrate both transparent glass substrates. Since it is a transparent glass substrate, it has the advantage that deterioration of the transparent glass substrate and pattern can be kept to a minimum.
第１図は従来の方法で形成された光用ハードマ
スクの断面図、第２図はこの発明の製造方法によ
り製作されたハードマスクの断面図、第３図は空
気中等で加熱した場合の例を示す断面図である。
図中、１は透明ガラス基板、２はパターン、３
は気泡、１１は透明ガラス基板である。なお、図
中の同一符号は同一または相当部分を示す。
Fig. 1 is a cross-sectional view of an optical hard mask formed by a conventional method, Fig. 2 is a cross-sectional view of a hard mask manufactured by the manufacturing method of the present invention, and Fig. 3 is an example of a case heated in air etc. FIG. In the figure, 1 is a transparent glass substrate, 2 is a pattern, and 3
1 is a bubble, and 11 is a transparent glass substrate. Note that the same reference numerals in the figures indicate the same or corresponding parts.
Claims (1)
ンを有するガラスマスクを用い、前記透明ガラス
基板の前記パターンを有する面上に前記透明ガラ
ス基板と同質の透明ガラス基板を載置し、真空溶
融炉内で前記透明ガラス基板のガラスの軟化点近
傍で熱することにより前記両透明ガラス基板を接
着し一体化することを特徴とするハードマスクの
製造方法。1 Using a glass mask having a pattern made of a metal thin film on a transparent glass substrate, a transparent glass substrate of the same quality as the transparent glass substrate is placed on the surface of the transparent glass substrate having the pattern, and the process is performed in a vacuum melting furnace. A method for manufacturing a hard mask, characterized in that both transparent glass substrates are bonded and integrated by heating near the softening point of the glass of the transparent glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP236981A JPS57114145A (en) | 1981-01-07 | 1981-01-07 | Manufacture of hard mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP236981A JPS57114145A (en) | 1981-01-07 | 1981-01-07 | Manufacture of hard mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57114145A JPS57114145A (en) | 1982-07-15 |
| JPS623942B2 true JPS623942B2 (en) | 1987-01-28 |
Family
ID=11527334
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP236981A Granted JPS57114145A (en) | 1981-01-07 | 1981-01-07 | Manufacture of hard mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57114145A (en) |
-
1981
- 1981-01-07 JP JP236981A patent/JPS57114145A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57114145A (en) | 1982-07-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3880632A (en) | Method of joining optical glass parts | |
| EP0052901A1 (en) | Method of producing integrated optical waveguide circuits and circuits obtained by means of this method | |
| JP2001026052A (en) | Transfer of minute shape and manufacture of optical part | |
| US2659665A (en) | Reticles | |
| GB1323349A (en) | Coloured transparent photo-mask and a method for producing the same | |
| KR970072031A (en) | Manufacturing method of optical wave optical circuit on flat plane | |
| JPS623942B2 (en) | ||
| JPS6087327A (en) | Preparation of chromium mask | |
| JPS57167025A (en) | Photo mask | |
| JPS63184708A (en) | Thin film optical circuit | |
| JPS57501747A (en) | ||
| JPS57119348A (en) | Hard mask | |
| JPS58102233A (en) | Photomask | |
| JP2855092B2 (en) | Manufacturing method of optical waveguide | |
| JPS5983950A (en) | Preparation of glass substrate | |
| JP4085155B2 (en) | Glass material having refractive index distribution and manufacturing method thereof | |
| JPS56114951A (en) | Method for correcting mask pattern defect | |
| JPS5688319A (en) | Method for forming film pattern | |
| JPS57115546A (en) | Manufacture of mask | |
| JPS62212605A (en) | Production of optical waveguide | |
| JPS59116750A (en) | Radiation mask base layer for x ray lithography and manufacture thereof | |
| JP4195925B2 (en) | Method for producing glass material having refractive index distribution | |
| JPS5587148A (en) | Correction method for light shielding mask | |
| JPS62105934A (en) | Production of optical element | |
| JPH09328325A (en) | Quartz substrate and production of quartz-based glass waveguide type optical part using the same |