JPS57114145A - Manufacture of hard mask - Google Patents

Manufacture of hard mask

Info

Publication number
JPS57114145A
JPS57114145A JP236981A JP236981A JPS57114145A JP S57114145 A JPS57114145 A JP S57114145A JP 236981 A JP236981 A JP 236981A JP 236981 A JP236981 A JP 236981A JP S57114145 A JPS57114145 A JP S57114145A
Authority
JP
Japan
Prior art keywords
glass substrate
transparent glass
hard mask
manufacture
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP236981A
Other languages
Japanese (ja)
Other versions
JPS623942B2 (en
Inventor
Tadao Kato
Yaichiro Watakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP236981A priority Critical patent/JPS57114145A/en
Publication of JPS57114145A publication Critical patent/JPS57114145A/en
Publication of JPS623942B2 publication Critical patent/JPS623942B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To manufacture a hard mask usable semipermanently in a process for manufacturing a large-scale integrated circuit by mounting a transparent glass substrate on a transparent glass substrate having a pattern of a thin metallic film on the surface and uniting them by heating in a vacuum melting furnace. CONSTITUTION:On a transparent glass substrate 1 having a pattern 2 of a thin metallic film on the surface, a transparent glass substrate 11 equal to the substrate 1 in coefft. of thermal expansion, refractive index, etc. is mounted, and the substrates 1, 11 are melted and bonded together by heating to a temp. close to the softening point in a vacuum melting furnace. Thus, a sandwich-like hard mask is obtd.
JP236981A 1981-01-07 1981-01-07 Manufacture of hard mask Granted JPS57114145A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP236981A JPS57114145A (en) 1981-01-07 1981-01-07 Manufacture of hard mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP236981A JPS57114145A (en) 1981-01-07 1981-01-07 Manufacture of hard mask

Publications (2)

Publication Number Publication Date
JPS57114145A true JPS57114145A (en) 1982-07-15
JPS623942B2 JPS623942B2 (en) 1987-01-28

Family

ID=11527334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP236981A Granted JPS57114145A (en) 1981-01-07 1981-01-07 Manufacture of hard mask

Country Status (1)

Country Link
JP (1) JPS57114145A (en)

Also Published As

Publication number Publication date
JPS623942B2 (en) 1987-01-28

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