JPS6237529B2 - - Google Patents

Info

Publication number
JPS6237529B2
JPS6237529B2 JP60261110A JP26111085A JPS6237529B2 JP S6237529 B2 JPS6237529 B2 JP S6237529B2 JP 60261110 A JP60261110 A JP 60261110A JP 26111085 A JP26111085 A JP 26111085A JP S6237529 B2 JPS6237529 B2 JP S6237529B2
Authority
JP
Japan
Prior art keywords
reticle
wafer
pattern
mirror
reference pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60261110A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61166027A (ja
Inventor
Shinji Kunyoshi
Akihiro Takanashi
Tsuneo Terasawa
Toshishige Kurosaki
Sumio Hosaka
Yoshio Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60261110A priority Critical patent/JPS61166027A/ja
Publication of JPS61166027A publication Critical patent/JPS61166027A/ja
Publication of JPS6237529B2 publication Critical patent/JPS6237529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60261110A 1985-11-22 1985-11-22 縮小投影露光装置 Granted JPS61166027A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60261110A JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60261110A JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS61166027A JPS61166027A (ja) 1986-07-26
JPS6237529B2 true JPS6237529B2 (OSRAM) 1987-08-13

Family

ID=17357223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60261110A Granted JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS61166027A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04136716U (ja) * 1991-06-12 1992-12-18 三菱農機株式会社 作業用走行車におけるアクセル機構の無人操作装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04136716U (ja) * 1991-06-12 1992-12-18 三菱農機株式会社 作業用走行車におけるアクセル機構の無人操作装置

Also Published As

Publication number Publication date
JPS61166027A (ja) 1986-07-26

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