JPS6235514A - 分子線結晶成長方法 - Google Patents
分子線結晶成長方法Info
- Publication number
- JPS6235514A JPS6235514A JP17478985A JP17478985A JPS6235514A JP S6235514 A JPS6235514 A JP S6235514A JP 17478985 A JP17478985 A JP 17478985A JP 17478985 A JP17478985 A JP 17478985A JP S6235514 A JPS6235514 A JP S6235514A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- crystal growth
- molecular beam
- gap
- heating plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17478985A JPS6235514A (ja) | 1985-08-08 | 1985-08-08 | 分子線結晶成長方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17478985A JPS6235514A (ja) | 1985-08-08 | 1985-08-08 | 分子線結晶成長方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6235514A true JPS6235514A (ja) | 1987-02-16 |
JPH0319693B2 JPH0319693B2 (enrdf_load_stackoverflow) | 1991-03-15 |
Family
ID=15984697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17478985A Granted JPS6235514A (ja) | 1985-08-08 | 1985-08-08 | 分子線結晶成長方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6235514A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011526222A (ja) * | 2008-07-03 | 2011-10-06 | イーオーエス ゲゼルシャフト ミット ベシュレンクテル ハフツング イレクトロ オプティカル システムズ | 三次元物体を一層ずつ製造する装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5730320A (en) * | 1980-07-29 | 1982-02-18 | Fujitsu Ltd | Substrate holder for molecular beam epitaxy |
-
1985
- 1985-08-08 JP JP17478985A patent/JPS6235514A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5730320A (en) * | 1980-07-29 | 1982-02-18 | Fujitsu Ltd | Substrate holder for molecular beam epitaxy |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011526222A (ja) * | 2008-07-03 | 2011-10-06 | イーオーエス ゲゼルシャフト ミット ベシュレンクテル ハフツング イレクトロ オプティカル システムズ | 三次元物体を一層ずつ製造する装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0319693B2 (enrdf_load_stackoverflow) | 1991-03-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |