JPS6235264B2 - - Google Patents
Info
- Publication number
- JPS6235264B2 JPS6235264B2 JP13309683A JP13309683A JPS6235264B2 JP S6235264 B2 JPS6235264 B2 JP S6235264B2 JP 13309683 A JP13309683 A JP 13309683A JP 13309683 A JP13309683 A JP 13309683A JP S6235264 B2 JPS6235264 B2 JP S6235264B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- nitrogen gas
- hmds
- hexamethyldisilazane
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 66
- 239000000758 substrate Substances 0.000 claims description 48
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 34
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 32
- 238000000576 coating method Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 239000011248 coating agent Substances 0.000 claims description 14
- 239000007791 liquid phase Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 241001469893 Oxyzygonectes dovii Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13309683A JPS6025231A (ja) | 1983-07-20 | 1983-07-20 | ヘキサメチルジシラザンの塗布方法及びその装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13309683A JPS6025231A (ja) | 1983-07-20 | 1983-07-20 | ヘキサメチルジシラザンの塗布方法及びその装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6025231A JPS6025231A (ja) | 1985-02-08 |
| JPS6235264B2 true JPS6235264B2 (ko) | 1987-07-31 |
Family
ID=15096737
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13309683A Granted JPS6025231A (ja) | 1983-07-20 | 1983-07-20 | ヘキサメチルジシラザンの塗布方法及びその装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6025231A (ko) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6221140A (ja) * | 1985-07-22 | 1987-01-29 | Fujitsu Ltd | レジスト密着剤の保管方法 |
| DE3540469A1 (de) * | 1985-11-14 | 1987-05-21 | Wacker Chemitronic | Verfahren zum schutz von polierten siliciumoberflaechen |
| JPS62211643A (ja) * | 1986-03-12 | 1987-09-17 | Mitsubishi Electric Corp | 密着強化剤塗布方法 |
| KR20170092714A (ko) | 2008-10-21 | 2017-08-11 | 도오꾜오까고오교 가부시끼가이샤 | 표면 처리액 및 표면 처리 방법, 그리고 소수화 처리 방법 및 소수화된 기판 |
-
1983
- 1983-07-20 JP JP13309683A patent/JPS6025231A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6025231A (ja) | 1985-02-08 |
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