JPS6234427U - - Google Patents
Info
- Publication number
- JPS6234427U JPS6234427U JP1985125538U JP12553885U JPS6234427U JP S6234427 U JPS6234427 U JP S6234427U JP 1985125538 U JP1985125538 U JP 1985125538U JP 12553885 U JP12553885 U JP 12553885U JP S6234427 U JPS6234427 U JP S6234427U
- Authority
- JP
- Japan
- Prior art keywords
- depth
- semiconductor substrate
- wet etching
- pattern
- alignment mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 238000001039 wet etching Methods 0.000 claims 2
- 238000001312 dry etching Methods 0.000 claims 1
- 238000005468 ion implantation Methods 0.000 description 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985125538U JPH0322903Y2 (enExample) | 1985-08-15 | 1985-08-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985125538U JPH0322903Y2 (enExample) | 1985-08-15 | 1985-08-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6234427U true JPS6234427U (enExample) | 1987-02-28 |
| JPH0322903Y2 JPH0322903Y2 (enExample) | 1991-05-20 |
Family
ID=31018519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985125538U Expired JPH0322903Y2 (enExample) | 1985-08-15 | 1985-08-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0322903Y2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109817605A (zh) * | 2018-05-29 | 2019-05-28 | 苏州能讯高能半导体有限公司 | 半导体器件及其制备方法 |
-
1985
- 1985-08-15 JP JP1985125538U patent/JPH0322903Y2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109817605A (zh) * | 2018-05-29 | 2019-05-28 | 苏州能讯高能半导体有限公司 | 半导体器件及其制备方法 |
| CN109817605B (zh) * | 2018-05-29 | 2025-02-28 | 苏州能讯高能半导体有限公司 | 半导体器件及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0322903Y2 (enExample) | 1991-05-20 |
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