JPS62298027A - 薄膜型磁気記録媒体の製造方法 - Google Patents
薄膜型磁気記録媒体の製造方法Info
- Publication number
- JPS62298027A JPS62298027A JP13990786A JP13990786A JPS62298027A JP S62298027 A JPS62298027 A JP S62298027A JP 13990786 A JP13990786 A JP 13990786A JP 13990786 A JP13990786 A JP 13990786A JP S62298027 A JPS62298027 A JP S62298027A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- magnetic recording
- vapor
- onto
- iron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 41
- 239000010409 thin film Substances 0.000 title claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052742 iron Inorganic materials 0.000 claims abstract description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000001301 oxygen Substances 0.000 claims abstract description 8
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000000696 magnetic material Substances 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 21
- 239000000758 substrate Substances 0.000 abstract description 14
- 239000011521 glass Substances 0.000 abstract description 2
- 239000008246 gaseous mixture Substances 0.000 abstract 4
- 230000005284 excitation Effects 0.000 abstract 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 6
- 229910001882 dioxygen Inorganic materials 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 101150110330 CRAT gene Proteins 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13990786A JPS62298027A (ja) | 1986-06-16 | 1986-06-16 | 薄膜型磁気記録媒体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13990786A JPS62298027A (ja) | 1986-06-16 | 1986-06-16 | 薄膜型磁気記録媒体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62298027A true JPS62298027A (ja) | 1987-12-25 |
| JPH054729B2 JPH054729B2 (enrdf_load_stackoverflow) | 1993-01-20 |
Family
ID=15256406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13990786A Granted JPS62298027A (ja) | 1986-06-16 | 1986-06-16 | 薄膜型磁気記録媒体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62298027A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0262724A (ja) * | 1988-08-30 | 1990-03-02 | Matsushita Electric Ind Co Ltd | 磁気記録媒体の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60231924A (ja) * | 1984-04-28 | 1985-11-18 | Taiyo Yuden Co Ltd | 薄膜型磁気記録媒体の製造方法 |
-
1986
- 1986-06-16 JP JP13990786A patent/JPS62298027A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60231924A (ja) * | 1984-04-28 | 1985-11-18 | Taiyo Yuden Co Ltd | 薄膜型磁気記録媒体の製造方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0262724A (ja) * | 1988-08-30 | 1990-03-02 | Matsushita Electric Ind Co Ltd | 磁気記録媒体の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH054729B2 (enrdf_load_stackoverflow) | 1993-01-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| RU2030483C1 (ru) | Способ нанесения пленок на основе оксида кремния | |
| RU2117338C1 (ru) | Система материалов для магнитооптической записи | |
| Miyake et al. | Rutile‐type TiO2 formation by ion beam dynamic mixing | |
| Durandet et al. | New plasma‐assisted deposition technique using helicon activated reactive evaporation | |
| US6812164B2 (en) | Method and apparatus for ionization film formation | |
| Celotta et al. | Sources of polarized electrons | |
| JPS62298027A (ja) | 薄膜型磁気記録媒体の製造方法 | |
| JPS6124214A (ja) | Ｃｏ−Ｏ系薄膜型垂直磁気記録媒体の製造方法 | |
| JPS60231924A (ja) | 薄膜型磁気記録媒体の製造方法 | |
| Ishii et al. | Deposition of ferromagnetic metal thin films by ion beam sputtering | |
| JPH0334619B2 (enrdf_load_stackoverflow) | ||
| JPH043010B2 (enrdf_load_stackoverflow) | ||
| Berry et al. | Material-dependent variations of alignment in beam-foil excitation | |
| Stirling et al. | Reactive sputtering of nickel, iron, and nickel ferrite | |
| US3475309A (en) | Method of making paramagnetic nickel ferrite thin films | |
| JPS63251931A (ja) | 薄膜型磁気記録媒体の製造方法 | |
| JPH0697647B2 (ja) | フエライト薄膜の製造方法 | |
| Szokefalvi-Nagy et al. | Experimental evidence of the enhancement of the low-temperature oxidation rate of titanium films by the Mott potential | |
| JPS63251930A (ja) | 薄膜型磁気記録媒体の製造方法 | |
| JPS60236113A (ja) | 磁気記録材料およびその製造方法 | |
| JPS60125933A (ja) | 磁性媒体の製法 | |
| JPS6362872A (ja) | 薄膜形成方法 | |
| JPS63245829A (ja) | 酸化物超電導薄膜の製造方法 | |
| JPS6353255A (ja) | 炭素薄膜の形成方法 | |
| JPS5916144A (ja) | 磁気記録媒体の製造方法 |