JPS62283897A - 化合物半導体単結晶の気相成長方法 - Google Patents

化合物半導体単結晶の気相成長方法

Info

Publication number
JPS62283897A
JPS62283897A JP12672386A JP12672386A JPS62283897A JP S62283897 A JPS62283897 A JP S62283897A JP 12672386 A JP12672386 A JP 12672386A JP 12672386 A JP12672386 A JP 12672386A JP S62283897 A JPS62283897 A JP S62283897A
Authority
JP
Japan
Prior art keywords
crystal
chamber
seed crystal
growth
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12672386A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0371400B2 (enExample
Inventor
Tomoji Yamagami
山上 智司
Yoshitaka Tomomura
好隆 友村
Masahiko Kitagawa
雅彦 北川
Shigeo Nakajima
中島 重夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP12672386A priority Critical patent/JPS62283897A/ja
Publication of JPS62283897A publication Critical patent/JPS62283897A/ja
Publication of JPH0371400B2 publication Critical patent/JPH0371400B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP12672386A 1986-05-30 1986-05-30 化合物半導体単結晶の気相成長方法 Granted JPS62283897A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12672386A JPS62283897A (ja) 1986-05-30 1986-05-30 化合物半導体単結晶の気相成長方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12672386A JPS62283897A (ja) 1986-05-30 1986-05-30 化合物半導体単結晶の気相成長方法

Publications (2)

Publication Number Publication Date
JPS62283897A true JPS62283897A (ja) 1987-12-09
JPH0371400B2 JPH0371400B2 (enExample) 1991-11-13

Family

ID=14942278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12672386A Granted JPS62283897A (ja) 1986-05-30 1986-05-30 化合物半導体単結晶の気相成長方法

Country Status (1)

Country Link
JP (1) JPS62283897A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49129694A (enExample) * 1973-04-04 1974-12-12
JPS6143275U (ja) * 1984-08-17 1986-03-20 三洋電機株式会社 結晶成長装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49129694A (enExample) * 1973-04-04 1974-12-12
JPS6143275U (ja) * 1984-08-17 1986-03-20 三洋電機株式会社 結晶成長装置

Also Published As

Publication number Publication date
JPH0371400B2 (enExample) 1991-11-13

Similar Documents

Publication Publication Date Title
JPS5948792B2 (ja) 炭化けい素結晶成長法
JPS62283897A (ja) 化合物半導体単結晶の気相成長方法
JPH0371399B2 (enExample)
Goodrum Solution top-seeding: Growth of GeO2 polymorphs
US1347350A (en) Crystal production
JPS62153192A (ja) 化合物半導体の結晶成長方法
US3649210A (en) Apparatus for crucible-free zone-melting of crystalline materials
JP2680617B2 (ja) 炭化ケイ素単結晶の成長方法
JP3231050B2 (ja) 化合物半導体の結晶成長法
JPS62167284A (ja) ブリツジマン法による単結晶の製造方法及び装置
JPH0510315B2 (enExample)
JPH02167883A (ja) 化合物半導体単結晶の製造方法及び装置
GB1502087A (en) Method of preparing semiconductor compounds and manufacturing single crystals thereof
JPH03261699A (ja) ZnSe単結晶の育成方法
JPS6126215A (ja) GaAs単結晶の製造方法
JP2662020B2 (ja) 縦型ボード法による化合物半導体の単結晶成長方法
JPS60118700A (ja) 半導体結晶の製造方法
JP3532245B2 (ja) 混晶単結晶体の製造方法
JPS63112487A (ja) 化合物半導体の結晶成長方法および装置
JPH024126Y2 (enExample)
JPH0316988A (ja) 化合物半導体単結晶製造装置
JPS60200893A (ja) ルツボ
JPH05339094A (ja) 酸化物単結晶の製造装置
JPS63134594A (ja) 3−v族化合物半導体単結晶の製造方法
JPS63190799A (ja) 2−6族化合物結晶の成長方法