JPS6227728B2 - - Google Patents
Info
- Publication number
- JPS6227728B2 JPS6227728B2 JP907580A JP907580A JPS6227728B2 JP S6227728 B2 JPS6227728 B2 JP S6227728B2 JP 907580 A JP907580 A JP 907580A JP 907580 A JP907580 A JP 907580A JP S6227728 B2 JPS6227728 B2 JP S6227728B2
- Authority
- JP
- Japan
- Prior art keywords
- mark
- electron beam
- position detection
- resist
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 25
- 238000001514 detection method Methods 0.000 claims description 17
- 238000010884 ion-beam technique Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 239000000758 substrate Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP907580A JPS56107555A (en) | 1980-01-29 | 1980-01-29 | Detection of position of electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP907580A JPS56107555A (en) | 1980-01-29 | 1980-01-29 | Detection of position of electron beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56107555A JPS56107555A (en) | 1981-08-26 |
| JPS6227728B2 true JPS6227728B2 (US06235095-20010522-C00021.png) | 1987-06-16 |
Family
ID=11710484
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP907580A Granted JPS56107555A (en) | 1980-01-29 | 1980-01-29 | Detection of position of electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56107555A (US06235095-20010522-C00021.png) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7150811B2 (en) * | 2002-11-26 | 2006-12-19 | Pei Company | Ion beam for target recovery |
-
1980
- 1980-01-29 JP JP907580A patent/JPS56107555A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56107555A (en) | 1981-08-26 |
