JPS6227384B2 - - Google Patents

Info

Publication number
JPS6227384B2
JPS6227384B2 JP57052070A JP5207082A JPS6227384B2 JP S6227384 B2 JPS6227384 B2 JP S6227384B2 JP 57052070 A JP57052070 A JP 57052070A JP 5207082 A JP5207082 A JP 5207082A JP S6227384 B2 JPS6227384 B2 JP S6227384B2
Authority
JP
Japan
Prior art keywords
etching
film
chromium
tungsten
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57052070A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58169150A (ja
Inventor
Katsuyuki Arii
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57052070A priority Critical patent/JPS58169150A/ja
Publication of JPS58169150A publication Critical patent/JPS58169150A/ja
Publication of JPS6227384B2 publication Critical patent/JPS6227384B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57052070A 1982-03-30 1982-03-30 フオトマスクの製造方法 Granted JPS58169150A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57052070A JPS58169150A (ja) 1982-03-30 1982-03-30 フオトマスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57052070A JPS58169150A (ja) 1982-03-30 1982-03-30 フオトマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS58169150A JPS58169150A (ja) 1983-10-05
JPS6227384B2 true JPS6227384B2 (en, 2012) 1987-06-15

Family

ID=12904554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57052070A Granted JPS58169150A (ja) 1982-03-30 1982-03-30 フオトマスクの製造方法

Country Status (1)

Country Link
JP (1) JPS58169150A (en, 2012)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6793103B2 (ja) 2017-09-29 2020-12-02 ミネベアミツミ株式会社 ひずみゲージ
JP2019066453A (ja) 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP2019066454A (ja) 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ、センサモジュール
JP2019066312A (ja) 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP2019113411A (ja) 2017-12-22 2019-07-11 ミネベアミツミ株式会社 ひずみゲージ、センサモジュール
JP2019184344A (ja) * 2018-04-05 2019-10-24 ミネベアミツミ株式会社 ひずみゲージ及びその製造方法
WO2020085247A1 (ja) 2018-10-23 2020-04-30 ミネベアミツミ株式会社 アクセルペダル、ステアリング、６軸センサ、エンジン、バンパー等

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5322031B2 (en, 2012) * 1974-02-02 1978-07-06
JPS53108285A (en) * 1977-03-03 1978-09-20 Hattori Isao Photomask original plate

Also Published As

Publication number Publication date
JPS58169150A (ja) 1983-10-05

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