JPS62273543A - フオトマスクの製造方法 - Google Patents

フオトマスクの製造方法

Info

Publication number
JPS62273543A
JPS62273543A JP61117932A JP11793286A JPS62273543A JP S62273543 A JPS62273543 A JP S62273543A JP 61117932 A JP61117932 A JP 61117932A JP 11793286 A JP11793286 A JP 11793286A JP S62273543 A JPS62273543 A JP S62273543A
Authority
JP
Japan
Prior art keywords
thin film
resist
film
photomask
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61117932A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0549213B2 (enrdf_load_stackoverflow
Inventor
Junji Hirokane
順司 広兼
Junichi Wadokoro
和所　純一
Tomoyuki Miyake
知之 三宅
Tetsuya Inui
哲也 乾
Kazuo Ban
和夫 伴
Kenji Oota
賢司 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP61117932A priority Critical patent/JPS62273543A/ja
Priority to CA000530396A priority patent/CA1313792C/en
Priority to EP92120246A priority patent/EP0533217B1/en
Priority to DE3752197T priority patent/DE3752197T2/de
Priority to EP87102561A priority patent/EP0234547B1/en
Priority to DE3789881T priority patent/DE3789881T2/de
Priority to US07/019,704 priority patent/US5087535A/en
Publication of JPS62273543A publication Critical patent/JPS62273543A/ja
Priority to US07/684,680 priority patent/US5457006A/en
Publication of JPH0549213B2 publication Critical patent/JPH0549213B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61117932A 1986-02-28 1986-05-21 フオトマスクの製造方法 Granted JPS62273543A (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP61117932A JPS62273543A (ja) 1986-05-21 1986-05-21 フオトマスクの製造方法
CA000530396A CA1313792C (en) 1986-02-28 1987-02-23 Method of manufacturing photo-mask and photo-mask manufactured thereby
EP92120246A EP0533217B1 (en) 1986-02-28 1987-02-24 Photo-mask and method of production thereof
DE3752197T DE3752197T2 (de) 1986-02-28 1987-02-24 Photomaske und Herstellungsverfahren dafür
EP87102561A EP0234547B1 (en) 1986-02-28 1987-02-24 Method of manufacturing photomask and photo-mask manufactured thereby
DE3789881T DE3789881T2 (de) 1986-02-28 1987-02-24 Verfahren zur Herstellung von Photomasken und Photomaske.
US07/019,704 US5087535A (en) 1986-02-28 1987-02-27 Method of manufacturing photo-mask and photo-mask manufactured thereby
US07/684,680 US5457006A (en) 1986-02-28 1991-03-29 Method of manufacturing photo-mask and photo-mask manufactured thereby

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61117932A JPS62273543A (ja) 1986-05-21 1986-05-21 フオトマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS62273543A true JPS62273543A (ja) 1987-11-27
JPH0549213B2 JPH0549213B2 (enrdf_load_stackoverflow) 1993-07-23

Family

ID=14723772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61117932A Granted JPS62273543A (ja) 1986-02-28 1986-05-21 フオトマスクの製造方法

Country Status (1)

Country Link
JP (1) JPS62273543A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62231959A (ja) * 1986-04-01 1987-10-12 Sharp Corp フオトマスクの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62231959A (ja) * 1986-04-01 1987-10-12 Sharp Corp フオトマスクの製造方法

Also Published As

Publication number Publication date
JPH0549213B2 (enrdf_load_stackoverflow) 1993-07-23

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees