JPS62264041A - 感光材料 - Google Patents

感光材料

Info

Publication number
JPS62264041A
JPS62264041A JP22752885A JP22752885A JPS62264041A JP S62264041 A JPS62264041 A JP S62264041A JP 22752885 A JP22752885 A JP 22752885A JP 22752885 A JP22752885 A JP 22752885A JP S62264041 A JPS62264041 A JP S62264041A
Authority
JP
Japan
Prior art keywords
group
substituted
general formula
image
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22752885A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0518417B2 (enrdf_load_stackoverflow
Inventor
Koichi Nakamura
幸一 中村
Kozo Sato
幸蔵 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP22752885A priority Critical patent/JPS62264041A/ja
Priority to US06/917,755 priority patent/US4902599A/en
Priority to EP86114146A priority patent/EP0219087A3/en
Publication of JPS62264041A publication Critical patent/JPS62264041A/ja
Publication of JPH0518417B2 publication Critical patent/JPH0518417B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/0285Silver salts, e.g. a latent silver salt image
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/58Coupling substances therefor
    • G03C1/585Precursors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP22752885A 1985-10-12 1985-10-12 感光材料 Granted JPS62264041A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP22752885A JPS62264041A (ja) 1985-10-12 1985-10-12 感光材料
US06/917,755 US4902599A (en) 1985-10-12 1986-10-10 Light-sensitive material
EP86114146A EP0219087A3 (en) 1985-10-12 1986-10-13 Light-sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22752885A JPS62264041A (ja) 1985-10-12 1985-10-12 感光材料

Publications (2)

Publication Number Publication Date
JPS62264041A true JPS62264041A (ja) 1987-11-17
JPH0518417B2 JPH0518417B2 (enrdf_load_stackoverflow) 1993-03-11

Family

ID=16862314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22752885A Granted JPS62264041A (ja) 1985-10-12 1985-10-12 感光材料

Country Status (1)

Country Link
JP (1) JPS62264041A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0496397A1 (en) 1991-01-23 1992-07-29 Fuji Photo Film Co., Ltd. Light-sensitive material containing silver halide, reducing agent, polymerizable compound and polymerization inhibitor releasing compound

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0496397A1 (en) 1991-01-23 1992-07-29 Fuji Photo Film Co., Ltd. Light-sensitive material containing silver halide, reducing agent, polymerizable compound and polymerization inhibitor releasing compound

Also Published As

Publication number Publication date
JPH0518417B2 (enrdf_load_stackoverflow) 1993-03-11

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees