JPH0518417B2 - - Google Patents

Info

Publication number
JPH0518417B2
JPH0518417B2 JP22752885A JP22752885A JPH0518417B2 JP H0518417 B2 JPH0518417 B2 JP H0518417B2 JP 22752885 A JP22752885 A JP 22752885A JP 22752885 A JP22752885 A JP 22752885A JP H0518417 B2 JPH0518417 B2 JP H0518417B2
Authority
JP
Japan
Prior art keywords
group
formula
substituted
general formula
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP22752885A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62264041A (ja
Inventor
Koichi Nakamura
Kozo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP22752885A priority Critical patent/JPS62264041A/ja
Priority to US06/917,755 priority patent/US4902599A/en
Priority to EP86114146A priority patent/EP0219087A3/en
Publication of JPS62264041A publication Critical patent/JPS62264041A/ja
Publication of JPH0518417B2 publication Critical patent/JPH0518417B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/0285—Silver salts, e.g. a latent silver salt image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/58—Coupling substances therefor
    • G03C1/585—Precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP22752885A 1985-10-12 1985-10-12 感光材料 Granted JPS62264041A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP22752885A JPS62264041A (ja) 1985-10-12 1985-10-12 感光材料
US06/917,755 US4902599A (en) 1985-10-12 1986-10-10 Light-sensitive material
EP86114146A EP0219087A3 (en) 1985-10-12 1986-10-13 Light-sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22752885A JPS62264041A (ja) 1985-10-12 1985-10-12 感光材料

Publications (2)

Publication Number Publication Date
JPS62264041A JPS62264041A (ja) 1987-11-17
JPH0518417B2 true JPH0518417B2 (enrdf_load_stackoverflow) 1993-03-11

Family

ID=16862314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22752885A Granted JPS62264041A (ja) 1985-10-12 1985-10-12 感光材料

Country Status (1)

Country Link
JP (1) JPS62264041A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2696434B2 (ja) 1991-01-23 1998-01-14 富士写真フイルム株式会社 画像形成方法

Also Published As

Publication number Publication date
JPS62264041A (ja) 1987-11-17

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees