JPS62263967A - 縦型基板ホルダ - Google Patents

縦型基板ホルダ

Info

Publication number
JPS62263967A
JPS62263967A JP10684986A JP10684986A JPS62263967A JP S62263967 A JPS62263967 A JP S62263967A JP 10684986 A JP10684986 A JP 10684986A JP 10684986 A JP10684986 A JP 10684986A JP S62263967 A JPS62263967 A JP S62263967A
Authority
JP
Japan
Prior art keywords
substrate
hole
shaped
main body
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10684986A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0564234B2 (enrdf_load_stackoverflow
Inventor
Hideyuki Odagi
秀幸 小田木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP10684986A priority Critical patent/JPS62263967A/ja
Publication of JPS62263967A publication Critical patent/JPS62263967A/ja
Publication of JPH0564234B2 publication Critical patent/JPH0564234B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Connection Of Plates (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP10684986A 1986-05-12 1986-05-12 縦型基板ホルダ Granted JPS62263967A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10684986A JPS62263967A (ja) 1986-05-12 1986-05-12 縦型基板ホルダ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10684986A JPS62263967A (ja) 1986-05-12 1986-05-12 縦型基板ホルダ

Publications (2)

Publication Number Publication Date
JPS62263967A true JPS62263967A (ja) 1987-11-16
JPH0564234B2 JPH0564234B2 (enrdf_load_stackoverflow) 1993-09-14

Family

ID=14444077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10684986A Granted JPS62263967A (ja) 1986-05-12 1986-05-12 縦型基板ホルダ

Country Status (1)

Country Link
JP (1) JPS62263967A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5769952A (en) * 1994-06-07 1998-06-23 Tokyo Electron, Ltd. Reduced pressure and normal pressure treatment apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5769952A (en) * 1994-06-07 1998-06-23 Tokyo Electron, Ltd. Reduced pressure and normal pressure treatment apparatus

Also Published As

Publication number Publication date
JPH0564234B2 (enrdf_load_stackoverflow) 1993-09-14

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