JPS62260077A - Production of precisely etched display parts for ornamentation - Google Patents

Abstract

PURPOSE:To facilitate the production of complex and minute precisely etched display parts for ornamentation by plating a metallic base material having a patterned org. resist on the part to be etched with an etching resistant metal, removing the resist and etching the base material. CONSTITUTION:An org. resist on a metallic base material 1 is patterned by a printing process or a photoresist process, and the patterned org. resist 2 is baked and dried. The base material 1 having the resist 2 is plated with a metal proof against an etching soln. to form a plating resist 3. The org. resist 2 is then removed, the base material 1 is etched and finally finish plating 5 is carried out.

Description

[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing decorative precision etched parts.

[Summary of the invention]

In A of the 7 methods for manufacturing decorative precision engraved display parts of the present invention,
As shown in Fig. 1, the printing method involves temporarily patterning the organic resist using the photoresist method, then applying metal plating that can withstand the etching solution to form a plating resist, and removing the organic resist with the hole diameter and the temporary pattern (If). By etching only the exposed metal of the material with a selective etching solution that can melt scales, it is easy to manufacture complex and extremely small ornamental precision etched display parts.

[Conventional technology]

The conventional seven manufacturing methods for decorative precision engraved display parts are:
As described in the tI Technology Handbook (edited by the Japan Institute of Metals Technology, published by Nikkan Kogyo Shimbun) and the Surface Technology Directory (published by Koshinsha), the 6
The figure shows a schematic diagram of the processing process using the photoresist method or the printing method.
h) is a cross-sectional view of the exposure process, (c) is a cross-sectional view of the actual machine, baking, or printing process, (d) is a cross-sectional view of the masking process, (a) is a cross-sectional view of the etching process, and (f) is the resist (g) shows a cross-sectional view of the removal process, and (g) shows a cross-sectional view of the final plating process.

Using the photoresist method, a photosensitive solution is applied to the surface of the metal material, the areas that need to be etched are pre-caulked, the areas that need to be etched are placed on a mask made by photolithography, exposed, developed, and baked.
Mask off unnecessary parts such as the back side with organic paint, ink tape, etc.

Next, as shown in FIG. 6(, ), the photoresist film is removed after etching with an etching solution suitable for etching the material Kinbatake, and the surface is subjected to final plating, anodizing, etc. Friend doing the processing.

In addition, as shown in FIGS. 6(a) to 6(g), an organic resist was formed by a printing method (screen, offset, tacho, etc.) and processed in the same way as the Otoresist method in the previous example.

Furthermore, there are physical etching methods such as engraving machines, press surface embossing, lasers, sandblasting, water jets, etc., and etching methods using electrolytic polishing.

[Problem that the invention seeks to solve]

However, the prior art 7-otoresist method described above has many technical limitations and has the following problems.

(1) The photoresist method is suitable for processing planar shapes such as circuit boards and name plates, and for processing complex shapes such as curved surfaces and extremely small parts, the work such as photoresist coating and exposure is technically difficult. It was extremely difficult.

(2) It was necessary to mask parts that did not require etching, such as the sides and back of the parts.

(3) In the case of a fine pattern, the area of the resist portion other than the etched portion is large, and there are many defects such as pinholes due to an adverse environment such as dust, fluff, etc., and the number of inspection and correction steps is large.

(4) When the resist area is wide, it is extremely difficult to remove the uncured removal plate layer in the resist area.

(5) Expensive equipment and equipment such as coating machines, exposure machines, developing machines, dark rooms, and clean rooms were required.

(6) The photosensitive resist solution uses harmful organic solvents, and some of the existing solutions use chlorinated organic solvents (triclene, triethane, etc.). Health inspection, regular work environment measurements, and special health diagnosis skills were required.

In addition, the printing method resist has the following problems.

(1) Fine butter 7 ((L Q 6 tan ~ (L 1
tm), the ink spreads a lot (8m), and it is difficult to do dense patterning.

(2) When etching minute parts, the resist area becomes large and there are many defects such as uneven printing, avatars, and pinholes.

In the physical engraving method, there was a gap in terms of product quality and production of a wide variety of products in small quantities.

In the 'lt de-polishing method, 'rj1. The problem is that it is difficult to energize miscellaneous and extremely small parts, causing them to break.

The present invention is intended to solve these problems.The purpose of the present invention is to use metal plating and resist to facilitate the processing of complex and extremely small decorative precision engraved display parts17, and to realize significant cost reductions. Our goal is to provide high-quality, value-added products at low prices that cannot be achieved using conventional methods.

Another purpose is to contribute to improving the environment, safety and health of Tomome, which does not use harmful organic solvents.

[Means for solving problems]

The method for manufacturing precision engraved display parts for decoration of the present invention is to apply an organic resist such as a printing method or a photoresist method to a metal material on a metal material, and then apply an organic resist by a printing method or a photoresist method. Then, the material is plated with metal that can withstand the etching liquid to create a plating resist, the temporary buttering organic resist is removed, and only the exposed metal of the beam material can be etched with a selective etching liquid. Fll[.

[Example-1] The present invention will be specifically described below based on examples.

FIG. 1 shows a schematic diagram of the processing process of the present invention, ra) ij
@ side view of organic resist temporary patterning, (?,) is a cross section of metal plating resist molding, (c) is a cross section of resist temporary patterning removal, (1) is a cross section of etching, (@)fl A cross-sectional view of finish plating, etc. is shown.

As shown in Figure 2, the brand name, moyo, etc. are engraved on the watch hands. After printing a chemical and highly abrasion-resistant organic resist ink (epoxy, phenol, Actul, etc.) to a thickness of 5 to 10 μm using the tacho printing method,
Dry by infrared rays, hot air drying, etc. (120° x 30 minutes).

Next, after degreasing and pretreatment using a tightening basket rack, as shown in Figure 1 (h), bright nickel plating is applied to 115 μm.
~1μ gold plating is further applied to 11μ to form a di-plating resist.

Next, as described in Section 11, 9(e), by cathodic electrolysis in a boiling, alkaline degreasing solution, the organic resist described above was peeled off by the strong alkali and hydrogen gas generated during electrolysis. After that, as shown in Figure 1 (4), only the brass material is selectively etched using persulfuric acid) IJ Neem 50 f /
/, ~250 f / /, 5 to 20μ etching, and finish plating (gold plating, rhodium plating, etc.) is performed on the whole.

In this case, the remaining droplets from the gold plating resist may be dissolved and recovered before final plating, if necessary.

The reaction formula with the material brass material is the following difference and etching characteristics. The corrosion coefficient (etching 7 actor) for etching tK is as shown in the third prisoner.

N12820g +Cu ==Cu804+NIL28
04NJ820g + Zn = zn day 04+N&2
SO4 [Example-2] In Figure 4 of the clock character, the character material (brass, nickel silver, phosphor bronze, etc. copper alloy) 41i thickness, 0.2 darkness to 14
The outside diameter of the neck is cut out, the foot attachment and foot allowance are processed, and the necessary surface roughness such as ridges, radials, streaks, stitches, etc. Temporary patterning of the brand name, scale, decorations, etc. is printed and baked using the printing method, octopus printing, or screen printing method (photoresist method may also be used).

Next, as in Example 1, a metal plating resist was applied,
After removing the temporary pattern print, the required amount is etched, silver plating or other finishing plating is applied, and clear lacquer or other finishing coating is applied.

This method makes it easy to create characters with a three-dimensional effect.

[Example 3] Watch case, as shown in Fig. 5, the case material (brass, stainless steel) is pressed, cut and formed, and the flattened surface etc. are finished. After 'c, Examples, 1, 2. After performing temporary patterning, printing, plating registrar, and removing the temporary patterning print in the same manner as in Example 1, if brass is used as the material.
Etch as in step 2.

When using stainless steel as the material, apply one layer of gold plating resist.
~5μ, and use g (1, ferric chloride).

[Example 4] When using a cylindrical case (aluminum) for a writing instrument such as a fountain pen or a ballpoint pen, after applying mechanical bottom shape, surface polishing, air line, etc., temporary pattern printing as in Example 1, After baking, pre-treatment such as degreasing and zinc replacement is performed L7, electroless nickel plating is performed for 15 to 5 μm, and after removing the temporary patterning printing, chloride and hydroxide are applied. Etch with engraving liquid.

〔Effect of the invention〕

As mentioned above, according to the present invention, the parts that require etching are temporarily buttered with a specific resist, baked and dried, and after 7 hours, a plating resist that can withstand the material etching solution is applied. By removing the resist and etching with an etching solution capable of etching only the raw material metal, the following sample was obtained.

(11) Complicated surfaces such as curved surfaces, etc., and it is now technically possible to engrave the tops of the joint parts with precision and precision.

(21 Only the fine pattern is etched @Naka, the resist part is made of gold or glaze plating resist, so there is no need to mask the non-etchable parts such as the side and back parts.9.

(3) The type and film thickness of the gold 5 plating resist that corresponds to the required design etching dimensions can be freely set.

(4) Special Yazo equipment such as photosensitive liquid, exposure, and developing machine is not required.

(5) Since no harmful organic solvents are used, the working environment, safety and health can be improved, and the same as above can be achieved.

(6) Suitable for high-mix, low-volume production, improving quality and significantly reducing costs.

As described above, the practical effects of the present invention are extremely large.

[Brief explanation of drawings]

The first decoy (,) to (,) are schematic diagrams of the processing steps of the present invention. 1...Material metal 2...Organic resist part 3...Metal plated resin part 4...Etched part 5...Final plating part 6...Masking part The second part is Example 1 of the present invention An external view of the engraved clock hands. FIG. 3 is a diagram showing the relationship between etching amount and corrosion coefficient (etching factor) in Example 1 of the present invention. FIG. 4 is an external view of an engraved watch case according to Example 2 of the present invention. FIG. 5 is an external view of a watch case engraved in Examples 1-3 of the present invention. The sixth factors (,) to (g) are schematic diagrams of processing steps using the conventional 7-hole printing method or mortar printing method. Applicant Seiko Epson Co., Ltd. Agent Patent Attorney Mogami fIJ and 1 other person Figure 2 Figure 3 j 84 Figure 51) [Form 2]-7 Figure 6

Claims (1)

[Claims] On the metal material of the decorative display component, the parts requiring etching are temporarily patterned using a printing method or a photoresist method, etc., and after baking and drying, metal plating that can withstand the material etching liquid is performed to obtain a plating resist. A method for producing a precision etched display part for decoration, characterized in that a temporary patterning organic resist is removed and etching is performed using an etching solution that is selective enough to etch only the exposed metal of the material.