JP4700921B2 - Indicator manufacturing method - Google Patents

Indicator manufacturing method Download PDF

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JP4700921B2
JP4700921B2 JP2004088065A JP2004088065A JP4700921B2 JP 4700921 B2 JP4700921 B2 JP 4700921B2 JP 2004088065 A JP2004088065 A JP 2004088065A JP 2004088065 A JP2004088065 A JP 2004088065A JP 4700921 B2 JP4700921 B2 JP 4700921B2
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stainless steel
steel plate
index
film
photoresist film
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JP2005274346A (en
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元喜 伊藤
正昭 佐藤
山口  克行
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Citizen Holdings Co Ltd
Citizen Watch Co Ltd
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Citizen Holdings Co Ltd
Citizen Watch Co Ltd
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Description

本発明は、マーク、記号、数字などの指標に関し、特に、表示板に用いる指標とその製造方法に関する。   The present invention relates to an index such as a mark, a symbol, or a number, and more particularly to an index used for a display board and a manufacturing method thereof.

時計用表示板には、時字を示す指標や商品名、ブランド名を示すマークなどの指標が用いられるが、これらの指標で厚みがあって立体感の現れた指標は時計自体に高級感を感じさせるものとなっている。この厚みのある指標の作り方に、従来から色々な方法が取られているが、その一つに、下記の特許文献1に示された製造方法がある。   Indicators such as time letters, product names, brand names, etc. are used for the timepiece display board, but these indicators are thick and have a three-dimensional appearance that gives the watch itself a high-class feel. It makes me feel. Various methods have been conventionally used for producing such a thick index. One of them is a manufacturing method disclosed in Patent Document 1 below.

特開平3−176689号公報Japanese Patent Laid-Open No. 3-17689

上記特許文献1に示された製造方法を図6を用いて説明する。図6は上記特許文献1に示された植字の製造方法を工程順を示した要部断面図を示している。最初に、黄銅板11の表面を鏡面に仕上げ、その上に仕上げメッキを施し、その上に粘着材12a付きベースフィルム12を貼付ける(図6(a))。次に、黄銅板11の反対側の面にフォトレジスト膜13を形成し、その上にフォトマスクを配設して露光、現像などを行い、レジストパターン13aを形成する。そして、エッチング液を吹きかけて植字14を作る(図6(b))。次に、植字14の側面にメッキを施した後、フォトレジスト膜13を溶剤で剥離し、その剥離面の所に接着剤15を形成する(図6(c))。次に、表示板16の所定の位置に植字14を接着剤15を介して接着し、ベースフィルム12を剥離する(図6(d))。   The manufacturing method disclosed in Patent Document 1 will be described with reference to FIG. FIG. 6 is a cross-sectional view of a main part showing the order of steps in the method of manufacturing the typesetting disclosed in Patent Document 1. First, the surface of the brass plate 11 is finished to a mirror surface, finish plating is performed thereon, and the base film 12 with the adhesive material 12a is stuck thereon (FIG. 6A). Next, a photoresist film 13 is formed on the opposite surface of the brass plate 11, and a photomask is disposed thereon, and exposure, development, and the like are performed to form a resist pattern 13a. Then, an etching solution is sprayed to make the typesetting 14 (FIG. 6B). Next, after plating the side face of the typesetting 14, the photoresist film 13 is peeled off with a solvent, and an adhesive 15 is formed at the peeled surface (FIG. 6C). Next, the typesetting 14 is bonded to a predetermined position of the display panel 16 via the adhesive 15 and the base film 12 is peeled off (FIG. 6D).

上記の製造方法を取ることによって、光沢があり立体感のある植字が得られたとされている。しかしながら、上記の製造方法の下では、植字の側面は光沢が現れない。エッチング液により黄銅板をエッチングすると面が粗れ、その上にメッキを施してもメッキ面が凹凸していて光沢が現れない。植字の上面は鏡面仕上げになっているので光沢があって綺麗に見えるが、側面は光沢がない。しかも、厚みがあって立体感が現れた植字においては、なお更、その側面も視認され、無光沢の側面が目立つようになり、光沢性もチグハグで、今ひとつ光沢性に物足りなさを感じるものとなっていた。また、材料に黄銅板を使用しているが、この材料は柔らかく、研磨して鏡面に仕上げるにはキズなどが付き易くてなかなか作業が難しい問題を有する。   It is said that a glossy and three-dimensional typesetting was obtained by taking the above manufacturing method. However, under the above manufacturing method, the side face of the typesetting does not appear glossy. When a brass plate is etched with an etching solution, the surface becomes rough, and even if plating is performed thereon, the plated surface is uneven and gloss does not appear. The upper side of the typesetting has a mirror finish, so it looks glossy and beautiful, but the side is not glossy. Moreover, in the typesetting that is thick and has a three-dimensional appearance, the side surface is also visually recognized, the matte side surface becomes conspicuous, the glossiness is also crisp, and it feels that the glossiness is still unsatisfactory. It was. Further, although a brass plate is used as a material, this material is soft and has a problem that it is difficult to work because it is easily scratched to be polished to a mirror surface.

また、植字の側面は黄銅材表面にメッキが施されてはいるものの、長い期間における耐蝕性を考えると必ずしも十分なものとは言い難い。特に、表面が凹凸していると錆びなどの腐蝕が生じやすい。   In addition, although the side face of the typesetting is plated on the surface of the brass material, it is not always sufficient when considering the corrosion resistance over a long period of time. In particular, if the surface is uneven, corrosion such as rust is likely to occur.

本発明は、上記の課題に鑑みてなされたもので、その課題を解決するための手段として、本発明の請求項1に記載の製造方法の発明は、鏡面を有するステンレス鋼板を洗浄する工程と、前記ステンレス鋼板の鏡面上に金属蒸着膜を形成する工程と、該蒸着膜を形成した面上に保護シートを貼付ける工程と、前記ステンレス鋼板の下面にフォトレジスト膜を形成する工程と、該フォトレジスト膜上にフォトマスクを配設して露光・現像し、不要部分のフォトレジスト膜を溶解除去する工程と、残されたフォトレジスト膜を乾燥した後に前記ステンレス鋼板を上面が下面より幅広くなるようにエッチングする工程と、該エッチングの後に電解研磨する工程と、前記フォトレジスト膜を剥離する工程と、を有することを特徴とするものである。 The present invention has been made in view of the above problems, and as means for solving the problems, the invention of the manufacturing method according to claim 1 of the present invention includes a step of cleaning a stainless steel plate having a mirror surface. A step of forming a metal vapor deposition film on the mirror surface of the stainless steel plate, a step of attaching a protective sheet on the surface on which the vapor deposition film is formed, a step of forming a photoresist film on the lower surface of the stainless steel plate, A step of arranging a photomask on the photoresist film, exposing and developing, dissolving and removing the unnecessary photoresist film, and drying the remaining photoresist film, the upper surface of the stainless steel plate becomes wider than the lower surface. and etching as a step of electrolytic polishing after the etching, is characterized in that and a step of removing the photoresist film.

また、本発明の請求項2に記載の製造方法の発明は、鏡面を有するステンレス鋼板を洗浄すると共に鏡面を少し粗す工程と、該鏡面を少し粗したステンレス鋼板上にストライクニッケルメッキを施す工程と、該ストライクニッケルメッキを施した後に光沢ニッケルメッキを施す工程と、該光沢ニッケルメッキを施した後に着色メッキを施す工程と、該着色メッキを施した面上に保護シートを貼付ける工程と、前記ステンレス鋼板の下面にフォトレジスト膜を形成する工程と、該フォトレジスト膜上にフォトマスクを配設して露光・現像し、不要部分のフォトレジスト膜を溶解除去する工程と、残されたフォトレジスト膜を乾燥した後に前記ステンレス鋼板を上面が下面より幅広くなるようにエッチングする工程と、該エッチングの後に電解研磨する工程と、前記フォトレジスト膜を剥離する工程と、を有することを特徴とするものである。 Further, the invention of the manufacturing method according to claim 2 of the present invention is a step of cleaning a stainless steel plate having a mirror surface and slightly roughening the mirror surface, and a step of applying strike nickel plating on the stainless steel plate having a slightly rough mirror surface. And a step of applying bright nickel plating after the strike nickel plating, a step of applying colored plating after applying the bright nickel plating, a step of attaching a protective sheet on the surface subjected to the colored plating, A step of forming a photoresist film on the lower surface of the stainless steel plate, a step of disposing a photomask on the photoresist film, exposing and developing, and dissolving and removing unnecessary portions of the photoresist film; a step of the stainless steel plate top surface is etched so as wider than the lower surface after the resist film is dried, the electrolyte Labs after the etching It is characterized in further comprising the steps of, and a step of removing the photoresist film.

また、本発明の請求項に記載の製造方法の発明は、前記ステンレス鋼板の上面に凹凸模様を形成したことを特徴とするものである。 The invention of the manufacturing method according to claim 3 of the present invention is characterized in that an uneven pattern is formed on the upper surface of the stainless steel plate.

また、本発明の請求項に記載の製造方法の発明は、前記ステンレス鋼板の下面に少なくとも1個の凹部を形成したことを特徴とするものである。
The invention of the manufacturing method according to claim 4 of the present invention is characterized in that at least one recess is formed on the lower surface of the stainless steel plate.

発明の効果として、本発明の製造方法から得られる指標は、ステンレス鋼材で出来ている。従って、耐蝕性が非常に良い。また、材料が硬質であることからキズなどが付き難く、綺麗な鏡面が得られる。また、上面が下面より幅広にできている。従って、上方から見ると下面側は見えず、また、側面側も見えない。また、指標を斜め方向から見ても側面は見えにくい状態にある。更に、上面と側面は鏡面仕上げになっていて光沢を持っている。表面全体に光沢が現れて、一見して、上面、側面の区別がつかない。指標全体に光沢が現れて立体感を感じさせると共に高級感を感じさせる。
As an effect of the invention, the index obtained from the production method of the present invention is made of a stainless steel material. Therefore, the corrosion resistance is very good. In addition, since the material is hard, scratches and the like are hardly attached, and a beautiful mirror surface can be obtained. The upper surface is wider than the lower surface. Therefore, when viewed from above, the lower surface side cannot be seen, and the side surface side cannot be seen. In addition, the side surface is difficult to see even when the index is viewed from an oblique direction. In addition, the top and side surfaces are mirror-finished and glossy. Gloss appears on the entire surface, and at a glance, it is impossible to distinguish between the upper surface and the side surface. Gloss appears throughout the index, giving it a three-dimensional feel and a sense of luxury.

また、本発明の製造方法から得られる指標は、上面に金属蒸着膜や金属メッキ膜が形成されて、所望の色調の金属光沢色調が現れる。装飾性が高まると共に、カラーバリエーションを豊富にできる。また、上面に凹凸模様も形成している。光沢のある模様が現れ、これも装飾性を高める作用をなす。模様とカラーでデザインバリエーションを豊富に取り揃えることができる。
Further , the index obtained from the production method of the present invention is that a metal vapor deposition film or a metal plating film is formed on the upper surface, and a metallic luster color tone having a desired color tone appears. The decorativeness is enhanced and color variations can be enriched. Further, an uneven pattern is also formed on the upper surface. A shiny pattern appears, which also enhances the decorativeness. A wide variety of design variations are available in patterns and colors.

また、本発明の製造方法から得られる指標は、下面に凹部を持っている。この凹部は接着剤溜まりと接着面積を広く取る目的で設けるもので、指標と接着剤との接着面積が増え、接着固定を強固にする効果を生む。また、この凹部を設けることで指標からの接着剤のはみ出しを少なくし、指標と表示板との接着部の外観品質を高める効果を生む。
Moreover, the index obtained from the manufacturing method of the present invention has a recess on the lower surface. This recess is provided for the purpose of increasing the adhesive reservoir and the bonding area, and increases the bonding area between the index and the adhesive, thereby producing an effect of strengthening the adhesive fixation. Further, by providing this recess, the protrusion of the adhesive from the index is reduced, and the appearance quality of the bonded portion between the index and the display plate is improved.

厚みがあって金属光沢の現れた本発明の指標を、下面に設けた接着剤を介して表示板に貼付ければ、その表示板に、金属光沢感、貴金属感、高装飾感、立体感を付与して高級感を感じさせる効果も生む。   If the indicator of the present invention, which is thick and has a metallic luster, is attached to the display board via an adhesive provided on the lower surface, the display board has a metallic luster, precious metal, high decoration, and three-dimensionality. Produces an effect that gives it a sense of luxury.

以下、本発明の最良の実施形態を図1〜図5を用いて説明する。最初に図の説明をする。図1は本発明の第1実施形態に係る指標を表示板に貼付けた時における要部断面図を示している。また、図2は図1における指標の製造方法を示す工程図で、図2(a)はステンレス鋼板の上面を鏡面にした状態の断面図、図2(b)は金属蒸着膜を形成した状態の断面図、図2(c)は保護シートを貼付けた状態の断面図、図2(d)はフォトレジスト膜を形成した状態の断面図、図2(e)はフォトマスクを配設して露光している状態の断面図、図2(f)は現像して不要部分のフォトレジスト膜を溶解除去した状態の断面図、図2(g)はステンレス鋼板をエッチングした状態の断面図、図2(h)は電解研磨した状態の断面図、図2(i)は残りのフォトレジスト膜を剥離した状態の断面図、図2(j)は接着剤を塗布した状態の断面図を示している。また、図3は図2(g)と図2(h)におけるエッチングした後に電解研磨を施した時の状態を説明する拡大断面図を示している。図4は本発明の第2実施形態に係る指標を表示板に貼付けた時における要部断面図を示している。また、図5は図4における指標の製造方法を示す工程図で、図5(a)はステンレス鋼板の上面を鏡面にした状態の断面図、図5(b)は図5(a)のステンレス鋼板を洗浄した状態を示す断面図、図5(c)はストライクニッケルメッキを施した断面図、図5(d)は光沢ニッケルメッキを施した断面図、図5(e)は装飾用金属メッキを施した断面図、図5(f)は保護シートを貼付けた状態の断面図を示している。   Hereinafter, the best embodiment of the present invention will be described with reference to FIGS. First, the figure will be explained. FIG. 1: has shown principal part sectional drawing when the parameter | index which concerns on 1st Embodiment of this invention is affixed on the display board. 2 is a process diagram showing a method of manufacturing the index in FIG. 1, FIG. 2 (a) is a sectional view in which the upper surface of the stainless steel plate is a mirror surface, and FIG. 2 (b) is a state in which a metal vapor deposition film is formed. 2C is a cross-sectional view with a protective sheet attached, FIG. 2D is a cross-sectional view with a photoresist film formed, and FIG. 2E is a photomask disposed. FIG. 2F is a cross-sectional view of the exposed state, FIG. 2F is a cross-sectional view of a state where an unnecessary portion of the photoresist film is dissolved and removed, and FIG. 2G is a cross-sectional view of the stainless steel plate etched. 2 (h) is a cross-sectional view of the electropolished state, FIG. 2 (i) is a cross-sectional view of the remaining photoresist film, and FIG. 2 (j) is a cross-sectional view of the state where the adhesive is applied. Yes. FIG. 3 is an enlarged cross-sectional view for explaining a state when electrolytic polishing is performed after etching in FIGS. 2 (g) and 2 (h). FIG. 4 shows a cross-sectional view of the main part when the indicator according to the second embodiment of the present invention is attached to the display board. 5 is a process diagram showing a method of manufacturing the index in FIG. 4, FIG. 5 (a) is a sectional view in which the upper surface of the stainless steel plate is a mirror surface, and FIG. 5 (b) is the stainless steel in FIG. 5 (a). FIG. 5 (c) is a cross-sectional view with strike nickel plating, FIG. 5 (d) is a cross-sectional view with bright nickel plating, and FIG. 5 (e) is a decorative metal plating. FIG. 5F shows a cross-sectional view in a state where a protective sheet is pasted.

本発明の第1実施形態に係る指標29は、図1に示すように、ステンレス鋼材からなる指標チップ20cと、その上面20aに形成した金属蒸着膜21aとから構成されている。そして、この指標29は接着剤25を介して表示板30の所定の位置に接着固定されるようになっている。金属蒸着膜21aは装飾用に着色するために設けるもので、本実施形態では、金(Au)蒸着膜を形成して金色の色調を出したが、特に限定するものではなく、他の金属の蒸着膜を形成しても良い。例えば、クロム(Cr)蒸着膜と酸化クロム(Cr)蒸着膜の薄膜を積層すると黒色とかブルー色(これらの色はCr蒸着膜とCr蒸着膜のそれぞれの膜厚を変えることによって出現する)などの色調を出すことができる。指標チップ20cは、ステンレス鋼材から出来ており、後述するエッチング、電解研磨などによる蝕刻方法で形成する。また、上面20aと両側面20gは鏡面に仕上げられていて光沢を有している。従って、上面20aに設けた金属蒸着膜21aも光沢を持っている。また、指標チップ20cの下面20bは接着剤25を介して表示板30の所定の位置に接着固定される。 As shown in FIG. 1, the index 29 according to the first embodiment of the present invention is composed of an index chip 20c made of a stainless steel material and a metal vapor deposition film 21a formed on the upper surface 20a. The index 29 is bonded and fixed to a predetermined position of the display panel 30 through the adhesive 25. The metal vapor deposition film 21a is provided for coloring for decoration. In this embodiment, a gold (Au) vapor deposition film is formed to give a golden color tone. However, the metal vapor deposition film 21a is not particularly limited. A vapor deposition film may be formed. For example, when a thin film of a chromium (Cr) vapor deposition film and a chromium oxide (Cr 2 O 3 ) vapor deposition film is laminated, black or blue color (these colors change the film thickness of each of the Cr vapor deposition film and the Cr 2 O 3 vapor deposition film). The color tone can be obtained. The indicator chip 20c is made of a stainless steel material, and is formed by an etching method such as etching or electrolytic polishing described later. Further, the upper surface 20a and both side surfaces 20g are finished to be mirror surfaces and have gloss. Therefore, the metal vapor deposition film 21a provided on the upper surface 20a is also glossy. In addition, the lower surface 20b of the index chip 20c is bonded and fixed to a predetermined position of the display panel 30 through the adhesive 25.

更に、この指標29は、上面の幅寸法m1が下面の幅寸法m2より大きくなっている。従って、指標29の上方より指標29を見ると、側面20gは見えず、金蒸着膜21aだけが光沢のある金色を呈して視認される。また、斜め方向から見た場合においても、指標29の厚みが薄い場合には側面が殆ど視認されない。指標29の厚みが厚い場合には側面との区別は多少視認されるが、側面にも光沢が現れており、且つ、上面の光沢有る金蒸着膜の金色が目立って見えることより殆ど側面が目立たない。また、全体に光沢感が現れて、しかも貴金属感を感じさせる指標が視認される。また、この指標29はステンレス鋼材を用いて形成している。耐蝕性に強く、硬質であることからキズなどが発生しずらく、綺麗な鏡面が得られる。   Further, in this indicator 29, the width dimension m1 of the upper surface is larger than the width dimension m2 of the lower surface. Therefore, when the index 29 is viewed from above the index 29, the side surface 20g is not visible, and only the gold vapor deposition film 21a is visually recognized as a glossy gold color. Even when viewed from an oblique direction, when the index 29 is thin, the side surface is hardly visually recognized. When the thickness of the indicator 29 is thick, the distinction from the side surface is somewhat visually recognized, but the side surface is almost conspicuous because the gloss appears on the side surface and the gold color of the glossy gold deposited film on the upper surface is conspicuous. Absent. In addition, a glossy appearance appears throughout, and an index that gives a feeling of precious metal is visually recognized. The indicator 29 is formed using a stainless steel material. It has strong corrosion resistance and is hard, so scratches are unlikely to occur and a beautiful mirror surface can be obtained.

次に、この指標29の製造方法を図2を用いて説明する。所望の厚みのステンレス鋼板20を用意し、上面20aをラッピング加工などにより鏡面に仕上げる(図2(a))。これは、市販の鏡面加工が施されたステンレス鋼板を購入して使用しても構わない。次に、このステンレス鋼板20の洗浄を行う。これは、次工程で行う金属蒸着の付着性を良くするために行うもので、中性洗剤液による脱脂→塩酸の3%溶液または硫酸の5%溶液による酸洗い→純水による水洗い→熱風などによる乾燥の工程を経て洗浄する。次に、鏡面に仕上げた上面20aに金属蒸着膜21を形成する(図2(b))。本実施形態では金の蒸着膜を形成しているいるが、これは、真空蒸着機を用いて、蒸着機のチャンバー内の蒸着時の圧力を、1×10−6〜5×10−5torr(1.33×10−4〜6.65×10−3Pa)で行うのが良い。蒸着膜厚は700〜1000Å位の範囲に形成すると金本来の金属色が得られる。次に、保護シート22を接着剤を介して貼付ける(図2(c))。保護シート22としてはポリエチレンテレフタレート樹脂シートなどが好適に使用できるが、特に材質には限定するものではなく、耐熱性に強く、張りのあるシートが好ましい。次に、ステンレス鋼板22の下面20bにフォトレジスト膜23をスクリーン印刷、回転塗布機などの公知の方法で形成する(図2(d))。膜厚は10〜20μm位の範囲で良い。 Next, a method for manufacturing the indicator 29 will be described with reference to FIG. A stainless steel plate 20 having a desired thickness is prepared, and the upper surface 20a is finished to a mirror surface by lapping or the like (FIG. 2 (a)). You may purchase and use the commercially available stainless steel plate in which the mirror surface process was given. Next, the stainless steel plate 20 is cleaned. This is done to improve the adhesion of metal deposition performed in the next process. Degreasing with a neutral detergent solution → Pickling with a 3% solution of hydrochloric acid or a 5% solution of sulfuric acid → Washing with pure water → Hot air, etc. Wash through the drying step. Next, the metal vapor deposition film 21 is formed on the upper surface 20a finished to a mirror surface (FIG. 2B). In the present embodiment, a gold vapor deposition film is formed. This is because a vacuum vapor deposition machine is used, and the pressure during vapor deposition in the chamber of the vapor deposition machine is 1 × 10 −6 to 5 × 10 −5 torr. (1.33 × 10 −4 to 6.65 × 10 −3 Pa) is preferable. When the deposited film thickness is in the range of 700 to 1000 mm, the original metallic color of gold can be obtained. Next, the protective sheet 22 is affixed through an adhesive (FIG. 2C). As the protective sheet 22, a polyethylene terephthalate resin sheet or the like can be suitably used, but the material is not particularly limited, and a sheet having strong heat resistance and tension is preferable. Next, a photoresist film 23 is formed on the lower surface 20b of the stainless steel plate 22 by a known method such as screen printing or a spin coater (FIG. 2D). The film thickness may be in the range of about 10 to 20 μm.

次に、指標の形状を撮し取ったフォトマスク24をフォトレジスト膜23上に載置し、紫外線照射を行い、露光する(図2(e))。そして、現像などを行って指標部分に当たる所の硬化したレジスト膜23aを残し、それ以外の柔らかい部分のレジスト膜23bをレジスト専用の有機溶媒、例えば、キシレン、トルエン又はアセトン等を用いて溶解処理して除去する(図2(f))。そして、残されたレジスト膜23aを乾燥して完全に硬化させた後に、35〜45Be′の塩化第2鉄、40°Cのエッチング液を吹きかけてステンレス鋼材を所定の深さの所まで溶解する(図2(g))。このエッチングは仕上がり寸法に対して30〜50μm残した状態で止める。なお、塩化第2鉄のエッチング液に塩酸を少量加えるとエッチング速度を速めることもできる。そして次に、エッチングした部分を電解研磨を行って仕上げる(図2(h))。電解研磨は、リン酸65〜75%、硫酸15〜12%、無水クロム酸15〜12%、(重量%)比重1.74の浴液を用い、電流密度35〜50A/dm、温度65〜80°C、時間10〜15分の条件で行い、30〜50μm研磨する。この電解研磨によって指標となる素材の指標チップ20cが得られ、また、金属蒸着膜21も削られて指標チップ20cの所の金属蒸着膜21aだけ残る。また、この電解研磨によって指標チップ20cの側面20gは鏡面に仕上がる。次に、残されている硬化したフォトレジスト膜23aを剥離液でもって剥離する(図2(i))。これによって指標チップ20cと金属蒸着膜21aから構成される指標29が得られる。そして次に、表示板にこの指標29を貼付けるに当たって、剥離したフォトレジスト膜23aの跡の所に接着剤25を形成する(図2(j))。接着剤25の形成はマスキングを施して吹き付け塗装、印刷、その他公知の方法で行うことができる。なお、マスキングをしないでスクリーン印刷方法やオフセット印刷方法で接着剤25を設けることも可能ではある。最後に、この指標29を接着剤25を介して表示板30の所定の位置に貼付け、保護シート22を剥離すると図1に示す指標29を貼付けた表示板が得られる。 Next, a photomask 24 obtained by photographing the shape of the index is placed on the photoresist film 23, exposed to ultraviolet rays, and exposed (FIG. 2 (e)). Then, development is performed to leave the cured resist film 23a corresponding to the index portion, and the other soft portion of the resist film 23b is dissolved using an organic solvent dedicated to resist, such as xylene, toluene, or acetone. (FIG. 2 (f)). Then, after the remaining resist film 23a is dried and completely cured, a stainless steel material is melted to a predetermined depth by spraying an etching solution of ferric chloride of 35 to 45 Be ′ and 40 ° C. (FIG. 2 (g)). This etching is stopped in a state where 30 to 50 μm is left with respect to the finished size. The etching rate can also be increased by adding a small amount of hydrochloric acid to the ferric chloride etching solution. Next, the etched portion is finished by electropolishing (FIG. 2H). Electropolishing uses a bath solution of phosphoric acid 65 to 75%, sulfuric acid 15 to 12%, chromic anhydride 15 to 12%, (weight%) specific gravity 1.74, current density 35 to 50 A / dm 2 , temperature 65 Polishing is performed under conditions of ˜80 ° C. and time of 10 to 15 minutes, and polishing is performed at 30 to 50 μm. By this electrolytic polishing, an index chip 20c of a material serving as an index is obtained, and the metal vapor deposition film 21 is also shaved, leaving only the metal vapor deposition film 21a at the index chip 20c. Moreover, the side surface 20g of the indicator chip 20c is finished to a mirror surface by this electrolytic polishing. Next, the remaining cured photoresist film 23a is stripped with a stripping solution (FIG. 2 (i)). As a result, an index 29 composed of the index chip 20c and the metal vapor deposition film 21a is obtained. Next, when the index 29 is attached to the display board, an adhesive 25 is formed at the trace of the peeled photoresist film 23a (FIG. 2 (j)). The adhesive 25 can be formed by masking, spray coating, printing, or other known methods. It is also possible to provide the adhesive 25 by screen printing or offset printing without masking. Finally, the indicator 29 is attached to a predetermined position of the display board 30 via the adhesive 25, and the protective sheet 22 is peeled off, whereby the display board attached with the indicator 29 shown in FIG.

ここで、本発明の指標29は上面の幅m1が下面の幅m2より幅広に出来ている。この幅広に形成する方法を図3を用いて説明する。ステンレス鋼板20にエッチングを施すと、深さ方向ばかりでなく幅方向、即ち、側面側も溶解して削り取られて太鼓状の形状を示して蝕刻される。しかも、深さ方向の奥のコーナ部、即ち、図3の中で丸印で示したA部はR形状をもって蝕刻されてくる。また、エッチングの後に30〜50μmの電解研磨を施してもエッチングで蝕刻された形状に倣って研磨されるので、奥のコーナ部はR状に仕上がる。そこで、エッチングの時間、及び電解研磨の研磨時間を十分管理して、指標29の上面の幅が下面の幅より所要幅大きくなる所で電解研磨を終わらすようにすると、上面の幅を下面の幅より幅広に形成することができる。   Here, the index 29 of the present invention is such that the upper surface width m1 is wider than the lower surface width m2. A method of forming this wide will be described with reference to FIG. When the stainless steel plate 20 is etched, not only in the depth direction, but also in the width direction, that is, the side surface is melted and scraped off to show a drum-like shape and etched. Moreover, the corner portion in the depth direction, that is, the A portion indicated by a circle in FIG. 3 is etched with an R shape. Further, even if electrolytic polishing of 30 to 50 μm is performed after the etching, it is polished according to the shape etched by the etching, so that the corner portion at the back is finished in an R shape. Therefore, if the etching time and the polishing time for electropolishing are sufficiently managed so that the electropolishing is terminated when the width of the upper surface of the indicator 29 is larger than the width of the lower surface, the upper surface width is reduced to the lower surface width. It can be formed wider.

以上の製造方法を取ることにより、指標の上面、側面が鏡面に仕上げられ、鏡面光沢が現れる。また、指標の上面を下面より幅広に形成することが出来るので、側面が見えないようになってくる。   By taking the above manufacturing method, the upper surface and the side surface of the index are finished to a mirror surface, and mirror gloss appears. In addition, since the upper surface of the index can be formed wider than the lower surface, the side surface becomes invisible.

また、金属蒸着膜は装飾用の着色のために設けるものであるので、使用する金属の種類を変えて色々な色調を出すことができる。また、2種の金属を積層してその厚みなどを微妙に変えることにより色々な色調の指標が得られる。そして、指標の色のバリエーションを豊富に持つことができる。また、指標の上面に凹凸模様も設けることもできる。鏡面のステンレス鋼板に型打ち方法で凹凸模様を設けても良い。模様を設けることにより、また、その装飾バリエーションを増やすことができる。   Further, since the metal vapor deposition film is provided for decorative coloring, various colors can be obtained by changing the type of metal used. In addition, various color indexes can be obtained by laminating two kinds of metals and changing their thickness and the like slightly. And it can have abundant color variations of the indicator. An uneven pattern can also be provided on the upper surface of the index. An uneven pattern may be provided on a mirror-finished stainless steel plate by a stamping method. By providing a pattern, the decoration variation can be increased.

次に、本発明の第2実施形態に係る指標について図4、図5を用いて説明する。図4は本発明の第2実施形態に係る指標を表示板に貼付けた状態の要部断面図を示している。また、図5は図4における指標の製造方法を示す一部の工程図である。   Next, an index according to the second embodiment of the present invention will be described with reference to FIGS. FIG. 4: has shown principal part sectional drawing of the state which affixed the parameter | index which concerns on 2nd Embodiment of this invention on the display board. FIG. 5 is a partial process diagram illustrating a method of manufacturing the index in FIG.

第2実施形態に係る指標49は、図4に示すように、ステンレス鋼材からなる指標チップ40cと、その上面40aに形成したストライクニッケルメッキ膜41a、このストライクニッケルメッキ膜41aの上に施した光沢ニッケルメッキ膜42a、更に、この光沢ニッケルメッキ膜42aの上に施した装飾用の金属メッキ膜43aとから構成されている。即ち、ストライクニッケルメッキ膜41aと光沢ニッケルメッキ膜42aと装飾用金属メッキ膜43aの3層が積層した構成を取っている。そして、接着剤45を介して表示板30の所定の位置に貼付けられて使用されるようになっている。前述の第1実施形態の指標は金属蒸着膜で指標の色調を出したが、本実施形態の指標は、その色調を金属メッキ膜で出すものである。本実施形態の指標49は、装飾用の金属メッキ膜43aとして金メッキ膜を形成して、金色の着色を施している。装飾用の着色は最上層の金属メッキの金属の種類を選択することによって他の色調も出現できる。例えば、白色ロジウムのメッキを施すと白色気味の指標が、黒ルテニウムのメッキを施すと黒色の指標が得られる。また、最上層に形成した金属メッキ膜43aは鏡面光沢を持っている。この鏡面光沢は光沢ニッケルメッキ膜42aを設けてあることにより出現する。また、指標チップ40cの両側面40gも鏡面光沢を持っている。また、本実施形態の指標49は、前述の第1実施形態のものと同様に、指標49の上面幅が下面40b(表示板との接着面側)より幅広に形成されている。更に、本実施形態の指標49はその下面40bに凹部40hを持っている。この凹部40hは表示板30との接着強度を更に強固にするために設けている。凹部があるとその中に接着剤が入り込み、接着面積が広くなる。接着面積が広くなることにより接着強度も強くなる。また、この凹部に接着剤が入り込むことで、指標の外周にはみ出す接着剤の量も少なくなり、外観向上の効果にも結びついている。この凹部40hの形状は特に限定するものではなく、溝状に設けても良いし、円錐状に設けても良い。また、必要ならば2個、3個と設けても良い。特に、数や形状には限定しない。   As shown in FIG. 4, the indicator 49 according to the second embodiment includes an indicator chip 40c made of stainless steel, a strike nickel plated film 41a formed on the upper surface 40a, and a gloss applied on the strike nickel plated film 41a. A nickel plating film 42a and a decorative metal plating film 43a formed on the bright nickel plating film 42a are also included. That is, the strike nickel plating film 41a, the bright nickel plating film 42a and the decorative metal plating film 43a are laminated. Then, it is used by being affixed to a predetermined position of the display panel 30 through an adhesive 45. The index of the first embodiment described above gives the color tone of the index with the metal vapor deposition film, but the index of this embodiment shows the color tone with the metal plating film. The indicator 49 of the present embodiment is gold-colored by forming a gold-plated film as the decorative metal-plated film 43a. Decorative colors can also appear in other colors by selecting the metal type of the top metal plating. For example, when white rhodium is plated, an indicator of whiteness is obtained, and when black ruthenium is plated, a black indicator is obtained. The metal plating film 43a formed on the uppermost layer has a specular gloss. This specular gloss appears when the bright nickel plating film 42a is provided. Also, both side surfaces 40g of the index chip 40c have a specular gloss. In addition, the index 49 of the present embodiment is formed so that the upper surface width of the index 49 is wider than the lower surface 40b (the side of the bonding surface with the display panel), as in the first embodiment. Furthermore, the indicator 49 of the present embodiment has a recess 40h on its lower surface 40b. The recess 40h is provided to further strengthen the adhesive strength with the display panel 30. If there is a recess, the adhesive will enter it and the bonding area will increase. By increasing the bonding area, the bonding strength increases. In addition, since the adhesive enters the concave portion, the amount of the adhesive that protrudes to the outer periphery of the index is reduced, which leads to an effect of improving the appearance. The shape of the recess 40h is not particularly limited, and may be provided in a groove shape or in a conical shape. If necessary, two or three may be provided. In particular, the number and shape are not limited.

以上のような構成を取る指標49は、前述の第1実施形態の指標と同じ効果を持つと同時に、表示板との接着強度が増す効果も現れる。また、当然ながら、指標49の上面に色々な凹凸模様も設けることができる。   The index 49 having the above-described configuration has the same effect as the index of the first embodiment described above, and also has the effect of increasing the adhesive strength with the display panel. Of course, various uneven patterns can be provided on the upper surface of the indicator 49.

次に、上記構成を取る指標49の製造方法について図5を用いて説明する。本実施形態の指標は、前述の第1実施形態と同様に、鏡面が形成されたステンレス鋼板を使用する。図5(a)は、上面40aが鏡面になって、下面40bには凹部40hが形成されているステンレス鋼板40を示している。凹部40hはプレス加工方法や切削加工方法などによって設けられる。また、鏡面は研削研磨、ラッピング研磨、電解研磨などの方法で設けることができる。次に、このステンレス鋼板40を脱脂・洗浄する。脱脂・洗浄は、脱脂→酸洗い→純水洗い→乾燥の手順で行う。脱脂は中性洗剤溶液でもって洗浄する。酸洗いは10〜20%の硫酸溶液、約70°Cの加温の中で、ガスが発生するまで浸漬して行う。この酸洗いは硫酸の濃度を濃い目にして行うので鏡面が犯されて表面が少し粗面になり梨地調の表面になる。純水洗いは表面に付着する硫酸溶液を中和すると共に良く洗い流すために行う。乾燥は熱風乾燥、遠心乾燥などで行う。この洗浄工程は、ステンレス鋼板を洗浄すると共に、鏡面なる表面を粗している。これは、メッキの密着性を良くするために行うもので、上面40aは梨地調の表面になっている(図5(b))。次に、ストライクニッケルメッキを行い、0.3μm程度のニッケルメッキ膜41を設ける(図5(c))。このストライクニッケルメッキは、次の光沢ニッケルメッキの密着性を良くするために行うもので、塩化ニッケル240g/l、塩酸80〜120g/lのメッキ浴液に、電流密度5〜20A/dmの下で、常温にて2〜4分間浸漬することで行われる。次に、このストライクニッケルメッキ膜41の上に光沢ニッケルメッキを施して光沢ニッケルメッキ膜42を形成する(図5(d))。メッキ厚は3〜10μmの範囲であるが、これによってメッキ表面が鏡面仕上がりになり光沢が現れる。次に、この光沢ニッケルメッキ膜42の上に装飾用の金属メッキを施し、金属メッキ膜43を形成する(図5(e))。本実施形態では金メッキを施して金色の着色をしたものであるが、白色ロジウムメッキを施すと白色系の着色が得られる。また、黒ルテニウムメッキを施すと黒色の着色が得られる。この装飾用の金属メッキは着色用であるので0.1〜0.3μm程度の厚みがあれば良い。次に、保護シート44を金属メッキ膜43の上に貼る(図5(f))。保護シートを貼る工程の以降の工程は前述の第1実施形態の工程と全く同じ工程を取る。即ち、ステンレス鋼板40の下面40b側にフォトレジスト膜を形成し、フォトマスクを配設し、紫外線照射して露光し、現像などを行って指標となる部分以外の部分のレジスト膜を除去し、次に、残されたレジスト膜を乾燥して完全に硬化させた後にエッチング、電解研磨を行い、最後に、フォトレジスト膜の剥離などを行って指標49を得る。これらの工程は第1実施形態と同じであるので説明は省略する。 Next, a method for manufacturing the indicator 49 having the above configuration will be described with reference to FIG. As an index of the present embodiment, a stainless steel plate having a mirror surface is used as in the first embodiment. FIG. 5A shows a stainless steel plate 40 in which the upper surface 40a is a mirror surface and the lower surface 40b is formed with a recess 40h. The recess 40h is provided by a pressing method, a cutting method, or the like. The mirror surface can be provided by a method such as grinding polishing, lapping polishing, or electrolytic polishing. Next, the stainless steel plate 40 is degreased and cleaned. Degreasing and washing are performed in the order of degreasing → pickling → pure water washing → drying. Degreasing is performed with a neutral detergent solution. The pickling is performed by dipping in a 10-20% sulfuric acid solution at about 70 ° C. until gas is generated. This pickling is performed with a high concentration of sulfuric acid, so that the mirror surface is violated and the surface becomes a little rough, resulting in a satin finish. Pure water washing is performed to neutralize the sulfuric acid solution adhering to the surface and to wash away well. Drying is performed by hot air drying, centrifugal drying or the like. In this cleaning step, the stainless steel plate is cleaned and the mirror surface is roughened. This is performed in order to improve the adhesion of the plating, and the upper surface 40a is a satin finish surface (FIG. 5B). Next, strike nickel plating is performed to provide a nickel plating film 41 of about 0.3 μm (FIG. 5C). This strike nickel plating is performed in order to improve the adhesion of the next bright nickel plating. In a plating bath solution of nickel chloride 240 g / l and hydrochloric acid 80 to 120 g / l, the current density is 5 to 20 A / dm 2 . Under, it is performed by dipping for 2 to 4 minutes at room temperature. Next, bright nickel plating is performed on the strike nickel plating film 41 to form a bright nickel plating film 42 (FIG. 5D). Although the plating thickness is in the range of 3 to 10 μm, the plating surface has a mirror finish and gloss appears. Next, decorative metal plating is performed on the bright nickel plating film 42 to form a metal plating film 43 (FIG. 5E). In the present embodiment, gold plating is performed and gold coloration is performed, but white rhodium plating is used to obtain white coloration. Further, when black ruthenium plating is applied, black coloring is obtained. Since this metal plating for decoration is for coloring, a thickness of about 0.1 to 0.3 μm is sufficient. Next, the protective sheet 44 is pasted on the metal plating film 43 (FIG. 5F). Subsequent steps after the step of attaching the protective sheet take exactly the same steps as those in the first embodiment. That is, a photoresist film is formed on the lower surface 40b side of the stainless steel plate 40, a photomask is provided, exposed to ultraviolet rays, exposed, developed, etc., to remove the resist film in portions other than the index portion, Next, the remaining resist film is dried and completely cured, and then etching and electropolishing are performed. Finally, the photoresist film is peeled off to obtain the index 49. Since these steps are the same as those in the first embodiment, description thereof is omitted.

以上の工程を経ることによって図4に示した指標49を得る。指標49の最上層の金属メッキ膜43に光沢が現れ、また、側面40gにも光沢が現れることから側面が殆ど目立たず、全体に光沢のある指標が得られる。見える部分の指標全面が鏡面仕上げになっているからステンレス鋼材の効用と共に耐蝕性も非常に良い。また、指標49の最上層に設ける装飾用の金属メッキ膜の金属の種類を変えることにより色々な色の装飾を得ることができる。そして、装飾色のバリエーションを豊富に揃えることができる。また、当然ながら色々な凹凸模様も設けることも可能である。また、本実施形態の如く、指標の下面に凹部を設けると接着強度が更に強くなる効果も得る。   Through the above steps, the index 49 shown in FIG. 4 is obtained. Gloss appears on the uppermost metal plating film 43 of the index 49, and gloss also appears on the side surface 40g, so that the side surface is hardly noticeable and a glossy index is obtained as a whole. Since the entire surface of the visible indicator is mirror-finished, the corrosion resistance is very good as well as the utility of stainless steel. In addition, various colors of decoration can be obtained by changing the metal type of the decorative metal plating film provided on the uppermost layer of the indicator 49. And you can arrange a wide variety of decoration colors. Of course, various uneven patterns can also be provided. Further, as in the present embodiment, if the concave portion is provided on the lower surface of the index, an effect of further increasing the adhesive strength can be obtained.

なお、第1実施形態の指標及び第2実施形態の指標は、何れも電解研磨によって指標の側面を鏡面仕様に仕上げている。しかしながら、指標の上面が下面より幅広になっていると、指標の厚みが0.2mm以下に薄くなると側面は殆ど視認することが出来ない。従って、耐蝕性のある素材を使用していることもあって、電解研磨の工程を省き、エッチングだけの工程で指標形状を成形しても全く問題なく使用できる。また、電解研磨後に、洗浄・乾燥を行い、乾式メッキ法(蒸着、イオンプレーティング、スパッタリングなど)や湿式メッキ法を行うことで指標チップの側面にも装飾用の金属膜を形成することが可能である。そして、指標を完全に同一色調で統一することも可能である。なお、指標チップの側面に装飾用の金属膜を設けた場合は、レジスト膜の剥離は、金属膜の形成後に剥離液によって行えば良い。   In addition, as for the parameter | index of 1st Embodiment and the parameter | index of 2nd Embodiment, all have finished the side surface of the parameter | index into the mirror surface specification by electrolytic polishing. However, if the upper surface of the index is wider than the lower surface, the side surface is hardly visible when the thickness of the index is reduced to 0.2 mm or less. Therefore, since a corrosion-resistant material is used, even if the electrolytic polishing process is omitted and the index shape is formed only by the etching process, it can be used without any problem. In addition, after electropolishing, it is possible to form a decorative metal film on the side of the indicator chip by performing cleaning and drying, and performing dry plating (evaporation, ion plating, sputtering, etc.) or wet plating. It is. It is also possible to unify the indicators with the same color tone. Note that in the case where a decorative metal film is provided on the side surface of the index chip, the resist film may be peeled off with a peeling solution after the metal film is formed.

本発明の指標は各種の表示板に使用できる。時計用の表示板、各種機器装置のメータ類の表示板、銘板類等であるが、その他に、各種機器装置の単体指標としても使用できるものである。   The indicator of the present invention can be used for various display boards. Display boards for watches, display boards for meters of various equipment devices, nameplates, etc., but can also be used as a single indicator for various equipment devices.

本発明の第1実施形態に係る指標を表示板に貼付けた時における要部断面図である。It is principal part sectional drawing when the parameter | index which concerns on 1st Embodiment of this invention is affixed on the display board. 図1における指標の製造方法を示す工程図で、図2(a)はステンレス鋼板の上面を鏡面にした状態の断面図、図2(b)は金属蒸着膜を形成した状態の断面図、図2(c)は保護シートを貼付けた状態の断面図、図2(d)はフォトレジスト膜を形成した状態の断面図、図2(e)はフォトマスクを配設して露光している状態の断面図、図2(f)は現像して不要部分のフォトレジスト膜を溶解除去した状態の断面図、図2(g)はステンレス鋼板をエッチングした状態の断面図、図2(h)は電解研磨した状態の断面図、図2(i)は残りのフォトレジスト膜を剥離した状態の断面図、図2(j)は接着剤を塗布した状態の断面図である。FIG. 2A is a cross-sectional view showing a method of manufacturing an index in FIG. 1, FIG. 2A is a cross-sectional view in which the upper surface of a stainless steel plate is a mirror surface, and FIG. 2B is a cross-sectional view in a state in which a metal vapor deposition film is formed. 2 (c) is a sectional view with a protective sheet attached, FIG. 2 (d) is a sectional view with a photoresist film formed, and FIG. 2 (e) is a state in which a photomask is provided and exposed. FIG. 2F is a cross-sectional view of a state where an unnecessary portion of the photoresist film is dissolved and removed, FIG. 2G is a cross-sectional view of a stainless steel plate etched, and FIG. FIG. 2 (i) is a sectional view in a state where the remaining photoresist film is peeled off, and FIG. 2 (j) is a sectional view in a state where an adhesive is applied. 図2(g)と図2(h)におけるエッチングした後に電解研磨を施した時の状態を説明する拡大断面図である。FIG. 3 is an enlarged cross-sectional view illustrating a state when electropolishing is performed after etching in FIGS. 2 (g) and 2 (h). 本発明の第2実施形態に係る指標を表示板に貼付けた時における要部断面図である。It is principal part sectional drawing when the parameter | index which concerns on 2nd Embodiment of this invention is affixed on the display board. 図4における指標の製造方法を示す工程図で、図5(a)はステンレス鋼板の上面を鏡面にした状態の断面図、図5(b)は図5(a)のステンレス板を洗浄した状態を示す断面図、図5(c)はストライクニッケルメッキを施した断面図、図5(d)は光沢ニッケルメッキを施した断面図、図5(e)は装飾用金属メッキを施した断面図、図5(f)は保護シートを貼付けた状態の断面図である。FIGS. 5A and 5B are process diagrams showing a method of manufacturing the index in FIG. 4, in which FIG. 5A is a cross-sectional view of a stainless steel plate with a mirror surface on the upper surface, and FIG. 5 (c) is a cross-sectional view with strike nickel plating, FIG. 5 (d) is a cross-sectional view with bright nickel plating, and FIG. 5 (e) is a cross-sectional view with decorative metal plating. FIG.5 (f) is sectional drawing of the state which affixed the protection sheet. 特許文献1に示された植字の製造方法を行程順を示した要部断面図で、図6(a)は、鏡面に仕上げた黄銅板の表面に仕上げメッキを施し、粘着材付きベースフィルムを貼付けた状態を示した断面図、図6(b)は、黄銅板の反対側の面にフォトレジスト膜を設け、フォトマスクを用いて露光、現像などを行ってレジストパターンを形成し、エッチング液にて植字を形成した状態を示す断面図、図6(c)は、植字の側面にメッキを施した後にフォトレジスト膜を剥離して接着剤を形成した状態を示す断面図、図6(d)は、表示板に植字を接着剤を介して接着してベースフィルムを剥離した状態を示す断面図である。FIG. 6 (a) is a cross-sectional view of the main part showing the order of the manufacturing method of the typesetting shown in Patent Document 1, and FIG. 6 (a) shows a finish plating on the surface of the brass plate finished to a mirror surface, FIG. 6B is a cross-sectional view showing the pasted state, in which a photoresist film is provided on the opposite surface of the brass plate, and a resist pattern is formed by performing exposure, development, etc. using a photomask. FIG. 6C is a cross-sectional view showing a state where an adhesive is formed by peeling the photoresist film after plating the side face of the typesetting, and FIG. ) Is a cross-sectional view showing a state where the base film is peeled off by bonding the typesetting to the display board via an adhesive.

符号の説明Explanation of symbols

20、40 ステンレス鋼板
20a、40a 上面
20b、40b 下面
20c、40c 指標チップ
20g、40g 側面
40h 凹部
21、21a、 金属蒸着膜
22、44 保護シート
23、23a フォトレジスト膜
24 フォトマスク
25、45 接着剤
30 表示板
41、41a ストライクニッケルメッキ膜
42、42a 光沢ニッケルメッキ膜
43、43a 装飾用の金属メッキ膜
m1 上面の幅
m2 下面の幅
20, 40 Stainless steel plate 20a, 40a Upper surface 20b, 40b Lower surface 20c, 40c Index chip 20g, 40g Side surface 40h Recess 21, 21a, metal vapor deposition film 22, 44 Protective sheet 23, 23a Photoresist film 24 Photomask 25, 45 Adhesive 30 Display board 41, 41a Strike nickel plating film 42, 42a Bright nickel plating film 43, 43a Metal plating film for decoration m1 Width of upper surface m2 Width of lower surface

Claims (4)

鏡面を有するステンレス鋼板を洗浄する工程と、
前記ステンレス鋼板の鏡面上に金属蒸着膜を形成する工程と、
該蒸着膜を形成した面上に保護シートを貼付ける工程と、
前記ステンレス鋼板の下面にフォトレジスト膜を形成する工程と、
該フォトレジスト膜上にフォトマスクを配設して露光・現像し、不要部分のフォトレジスト膜を溶解除去する工程と、
残されたフォトレジスト膜を乾燥した後に前記ステンレス鋼板を上面が下面より幅広くなるようにエッチングする工程と、
該エッチングの後に電解研磨する工程と、
前記フォトレジスト膜を剥離する工程と、
を有することを特徴とする指標の製造方法。
Cleaning a stainless steel plate having a mirror surface;
Forming a metal vapor deposition film on the mirror surface of the stainless steel plate;
A step of attaching a protective sheet on the surface on which the deposited film is formed;
Forming a photoresist film on the lower surface of the stainless steel plate;
A step of disposing a photomask on the photoresist film, exposing and developing, and dissolving and removing unnecessary portions of the photoresist film;
Etching the stainless steel plate so that the upper surface is wider than the lower surface after drying the remaining photoresist film;
Electropolishing after the etching;
Peeling the photoresist film;
A method for producing an index characterized by comprising:
鏡面を有するステンレス鋼板を洗浄すると共に鏡面を少し粗す工程と、
該鏡面を少し粗したステンレス鋼板上にストライクニッケルメッキを施す工程と、
該ストライクニッケルメッキを施した後に光沢ニッケルメッキを施す工程と、
該光沢ニッケルメッキを施した後に着色メッキを施す工程と、
該着色メッキを施した面上に保護シートを貼付ける工程と、
前記ステンレス鋼板の下面にフォトレジスト膜を形成する工程と、
該フォトレジスト膜上にフォトマスクを配設して露光・現像し、不要部分のフォトレジスト膜を溶解除去する工程と、
残されたフォトレジスト膜を乾燥した後に前記ステンレス鋼板を上面が下面より幅広くなるようにエッチングする工程と、
該エッチングの後に電解研磨する工程と、
前記フォトレジスト膜を剥離する工程と、
を有することを特徴とする指標の製造方法。
Cleaning the stainless steel plate having a mirror surface and slightly roughing the mirror surface;
Applying strike nickel plating on a stainless steel plate with a slightly roughened mirror surface;
Applying the bright nickel plating after the strike nickel plating;
Applying colored plating after applying the bright nickel plating;
A step of attaching a protective sheet on the colored plated surface;
Forming a photoresist film on the lower surface of the stainless steel plate;
A step of disposing a photomask on the photoresist film, exposing and developing, and dissolving and removing unnecessary portions of the photoresist film;
Etching the stainless steel plate so that the upper surface is wider than the lower surface after drying the remaining photoresist film;
Electropolishing after the etching;
Peeling the photoresist film;
A method for producing an index characterized by comprising:
前記ステンレス鋼板の上面に凹凸模様を形成したことを特徴とする請求項1または請求項2に記載の指標の製造方法。 Method for producing an indicator according to claim 1 or claim 2, characterized in that the formation of the uneven pattern on the upper surface of the stainless steel plate. 前記ステンレス鋼板の下面に少なくとも1個の凹部を形成したことを特徴とする請求項1または請求項2に記載の指標の製造方法。 Method for producing an indicator according to claim 1 or claim 2, characterized by forming at least one recess on a lower surface of the stainless steel plate.
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JP2008128278A (en) * 2006-11-17 2008-06-05 Neriki:Kk Diaphragm valve and seat assembly for valve
JP2016099267A (en) * 2014-11-25 2016-05-30 シチズンホールディングス株式会社 Weight for automatic winding clock
CN108008620A (en) * 2017-12-21 2018-05-08 广东乐芯智能科技有限公司 A kind of wrist-watch

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JPH03176689A (en) * 1989-12-05 1991-07-31 Citizen Watch Co Ltd Production of composing type
JPH0580163A (en) * 1991-09-20 1993-04-02 Seiko Epson Corp Exterior parts for clock
WO1999005233A1 (en) * 1997-07-22 1999-02-04 Citizen Watch Co., Ltd. Method of fixing very small articles
JP2001000600A (en) * 1999-06-22 2001-01-09 Endo Mfg Co Ltd Golf club and production of golf club head
JP2001293429A (en) * 2000-04-12 2001-10-23 Tefuko International Kk Method for preparing thick-film resin pattern and thick- film resin pattern
JP2003246196A (en) * 2002-02-25 2003-09-02 Seiko Epson Corp Method for manufacturing decorative article, decorative article, and timepiece

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Publication number Priority date Publication date Assignee Title
JPH03176689A (en) * 1989-12-05 1991-07-31 Citizen Watch Co Ltd Production of composing type
JPH0580163A (en) * 1991-09-20 1993-04-02 Seiko Epson Corp Exterior parts for clock
WO1999005233A1 (en) * 1997-07-22 1999-02-04 Citizen Watch Co., Ltd. Method of fixing very small articles
JP2001000600A (en) * 1999-06-22 2001-01-09 Endo Mfg Co Ltd Golf club and production of golf club head
JP2001293429A (en) * 2000-04-12 2001-10-23 Tefuko International Kk Method for preparing thick-film resin pattern and thick- film resin pattern
JP2003246196A (en) * 2002-02-25 2003-09-02 Seiko Epson Corp Method for manufacturing decorative article, decorative article, and timepiece

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