JPS62250928A - Wet gas absorbing treatment device and method - Google Patents

Wet gas absorbing treatment device and method

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Publication number
JPS62250928A
JPS62250928A JP61095521A JP9552186A JPS62250928A JP S62250928 A JPS62250928 A JP S62250928A JP 61095521 A JP61095521 A JP 61095521A JP 9552186 A JP9552186 A JP 9552186A JP S62250928 A JPS62250928 A JP S62250928A
Authority
JP
Japan
Prior art keywords
gas
liquid
porous plates
contacts
absorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61095521A
Other languages
Japanese (ja)
Inventor
Hideo Enomoto
榎本 秀夫
Toshiyuki Oota
敏行 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KEMIKOOTO KK
Original Assignee
KEMIKOOTO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KEMIKOOTO KK filed Critical KEMIKOOTO KK
Priority to JP61095521A priority Critical patent/JPS62250928A/en
Publication of JPS62250928A publication Critical patent/JPS62250928A/en
Pending legal-status Critical Current

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  • Gas Separation By Absorption (AREA)

Abstract

PURPOSE:To form a water layer with low pressure loss and enhance gas-liquid contact efficiency by forming more than one couple of porous plates installed within an interval of 200mm in a gas absorption column and counter-current contacting treating gas with absorbing liquid. CONSTITUTION:Gas guided in from a gas introduction section 1 contacts with dropping absorbing liquid accumulated between porous plates 7 and 8 installed within an interval of 200mm, then contacts a liquid layer formed between porous plates 7 and 8 and absorbs. Then, gas contacts the dropping liquid and liquid layer of absorbing liquid between porous plates 5 and 6, absorbs, passes through an exhaust duct 13, a gas-liquid separator 14 and a fan F and is exhausted out of a gas outlet 16. Thus, gas-liquid contacts are repeatedly made between porous plates 5 and 6, and also 7 and 8, to enhance gas-liquid contact efficiency.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はガス吸収処理装置および処理方法、とりわけ湿
式ガス吸収処理装置および処理方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a gas absorption treatment apparatus and treatment method, particularly to a wet gas absorption treatment apparatus and treatment method.

〔従来の技術〕[Conventional technology]

湿式ガス吸収法は、特定ガス成分の除去方法として知ら
れ各種有害ガス成分、悪臭等の大気汚染防止及び作業環
境改善等の公害防止設備として多用されている。
The wet gas absorption method is known as a method for removing specific gas components, and is frequently used as pollution prevention equipment for preventing air pollution such as various harmful gas components and bad odors, and improving the working environment.

これら湿式ガス吸収方法としては充填塔、スプレー搭、
泡鐘搭、多孔板塔のような吸収装置を用いる方法が、一
般的である。
These wet gas absorption methods include packed towers, spray towers,
Methods using absorption devices such as bubble towers and perforated plate towers are common.

〔本発明が解決しようとする問題点〕[Problems to be solved by the present invention]

前記した従来の湿式ガス吸収方法は、それぞれ良い方法
であるが、気液接触が不充分であり、そのためガス吸収
率が低いという問題があった。
Although each of the conventional wet gas absorption methods described above is good, there is a problem in that gas-liquid contact is insufficient, resulting in a low gas absorption rate.

この対策として気液接触を充分に行わせるために、厚い
水層内にガスを通過させる方法が考案されている。しか
し、この方法だと水層を厚くすることにより排気ファン
の動力を極端に高くしなければならず、設備費も膨大な
ものとなる。又、騒音などの二次公害を起こすおそれが
ある。
As a countermeasure to this problem, a method has been devised in which gas is passed through a thick water layer in order to achieve sufficient gas-liquid contact. However, with this method, the power of the exhaust fan must be extremely high due to the thickening of the water layer, and the equipment costs will also be enormous. Additionally, there is a risk of secondary pollution such as noise.

有害ガス、悪臭等は公害面では厳しく規制されなければ
ならないが、産業上のプロセスとしては、なくてはなら
ないケースが殆どである。
Harmful gases, bad odors, etc. must be strictly regulated in terms of pollution, but in most cases they are indispensable for industrial processes.

そのため操業を制約されるおそれもある0本発明はこの
様な有害ガス、悪臭等の除去を効率良<、シかも安価な
設備費と安価なランニングコストで対応したいという業
界の強い要望にこたえて開発したものである。
As a result, there is a risk that operations may be restricted.The present invention responds to the industry's strong demand for efficient removal of such harmful gases, bad odors, etc., with low equipment costs and low running costs. It was developed.

〔問題を解決するための手段〕[Means to solve the problem]

本発明の目的は前記した有害ガス等による作業環境の改
善と悪臭等の大気汚染を防止するための排ガス処理装置
および方法を提供することにあるが、この目的を達成す
るために、本発明はガス吸収塔内に保持する多孔板を2
枚以上とし、2枚の多孔板を一対として一方の多孔板と
他方の多孔板の間隔を200mm以内としたものである
The purpose of the present invention is to provide an exhaust gas treatment device and method for improving the working environment and preventing atmospheric pollution such as bad odors caused by the above-mentioned harmful gases. 2 perforated plates held in the gas absorption tower
or more, and two perforated plates are used as a pair, and the distance between one perforated plate and the other perforated plate is 200 mm or less.

これにより一方の多孔板と他方の多孔板の間に200I
llPa以内の薄い水層を簡単に形成することができる
This allows 200I between one perforated plate and the other perforated plate.
A thin water layer of less than 11 Pa can be easily formed.

ガス吸収の効率はいかに水層と気体を効率良く接触 さ
せることができるかという点にかかっている。
The efficiency of gas absorption depends on how efficiently the water layer and gas can be brought into contact.

水層の厚みを増加すれば気液接触を充分に行うことがで
き、ガス吸収率も向上するが水層の厚みが増すほど吸引
ファンの動力も高くしなければならない。
Increasing the thickness of the water layer allows for sufficient gas-liquid contact and improves the gas absorption rate, but as the thickness of the water layer increases, the power of the suction fan must also be increased.

ファンの動力を高くするとモーター自身もファン自体も
大型化しガス吸収塔が高価になる。
If the power of the fan is increased, both the motor and the fan will become larger and the gas absorption tower will become more expensive.

本発明はこの問題点を解消するため、対をなす2枚の多
孔板の中間に薄膜の水層を形成し、この水層にガスを通
過させることで解決したものである。
The present invention solves this problem by forming a thin water layer in the middle of a pair of two perforated plates and passing gas through this water layer.

水層は多孔板同士の中間層に形成されるので上部多孔板
から流入する吸収液と下部多孔板から流出する吸収液の
流動で激しく拡散され乱流となり、気液接触が促進され
る。
Since the water layer is formed in the intermediate layer between the perforated plates, the absorption liquid flowing in from the upper perforated plate and the absorbing liquid flowing out from the lower perforated plate are violently diffused, creating a turbulent flow, and promoting gas-liquid contact.

この水層は当然のことであるが、多層であればそれだけ
気液接触の機会が多くなりガス吸収率が向上する。
It goes without saying that the water layer is multilayered, but the more opportunities there are for gas-liquid contact, the higher the gas absorption rate.

対となる多孔板同士の間隔を200mm以内としたのは
経済ベースからくる理由であり200mmを越える範囲
では圧力損失が大となり不経済であることによる。
The reason why the distance between the pair of perforated plates is set to 200 mm or less is based on economic considerations, and if the distance exceeds 200 mm, the pressure loss becomes large and it is uneconomical.

一方、間隔の下限に限定を加えないのは処理ガスの風量
および風速により、単位面積当たりの水層形成厚みが異
なり、−概に下限が決まらないことによる。
On the other hand, the reason why there is no limit on the lower limit of the interval is because the thickness of water layer formation per unit area varies depending on the flow rate and wind speed of the processing gas, and the lower limit is generally not determined.

水層が形成され、乱流となって気液接触が促進されるに
は、だいたい5mm以上の間隔が必要である。
A gap of approximately 5 mm or more is required to form a water layer and create turbulent flow to promote gas-liquid contact.

又、ガスはガス吸収塔内に強制的に送り込む方法でも、
吸引して吸入する方法をとっても良いが高温ガスや腐食
性のガスなどを処理すると声は機器類の耐久性を考慮し
、吸引する方法をとる方が良い。
Alternatively, the gas can be forcibly fed into the gas absorption tower.
You can use the suction method, but when dealing with high-temperature gases or corrosive gases, it is better to use the suction method, considering the durability of the equipment.

尚、気液接触したガスと吸収液は激しく接触し、排気中
に液状の飛沫が混入することがあるので、気液分離器を
取りつけるのも良い方法である。
It is also a good idea to install a gas-liquid separator, since the gas and absorption liquid in gas-liquid contact may come into intense contact and liquid droplets may be mixed into the exhaust gas.

〔作 用〕[For production]

次に具体的な作用を添付図面について説明する。 Next, specific operations will be explained with reference to the attached drawings.

第1図は本発明の湿式ガス吸収処理装置の概要を示す1
例でガスはガス導入部1からガス吸収塔9に導入されガ
ス吸収塔内4を通ってガス排気導管13へ送られ、排気
経路へ進行する。
Figure 1 shows an overview of the wet gas absorption treatment apparatus of the present invention.
In the example, gas is introduced into the gas absorption tower 9 from the gas introduction part 1, passed through the gas absorption tower interior 4, is sent to the gas exhaust conduit 13, and proceeds to the exhaust path.

この間、ガス吸収塔内4には吸収液溜槽2内に溜められ
たガス吸収液3が循環パイプ10を通してポンプPによ
り送液管11を通ってスプレー機構12へ送られ給液さ
れる。
During this time, the gas absorption liquid 3 stored in the absorption liquid storage tank 2 is fed into the gas absorption tower 4 by being sent to the spray mechanism 12 through the circulation pipe 10 and the pump P through the liquid supply pipe 11.

スプレー機構12から給液されたガス吸収液は多孔板5
〜8を通過して吸収液溜槽2内に戻り循環される。
The gas absorption liquid supplied from the spray mechanism 12 is applied to the perforated plate 5.
8, returns to the absorption liquid storage tank 2, and is circulated.

スプレー機構12から給液されたガス吸収液は多孔板5
と6の間および多孔板7と8の間で液層を形成し、落下
しながら吸収液溜槽2に戻ることになるが、この系は排
気経路とは向流になっている。
The gas absorption liquid supplied from the spray mechanism 12 is applied to the perforated plate 5.
A liquid layer is formed between the absorption liquid tank 2 and 6 and between the perforated plates 7 and 8, and returns to the absorption liquid storage tank 2 while falling, but this system is in a countercurrent flow to the exhaust path.

ガス導入部1から導入されたガスは、はじめに多孔板7
と8の間に溜っている吸収液の落下液と接触し、吸収が
行われ、次いで多孔板7と8の間に形成された液層と激
しく接触し、吸収されながら上昇する。
The gas introduced from the gas introduction part 1 first passes through the perforated plate 7.
It comes into contact with the falling absorption liquid accumulated between the porous plates 7 and 8, and is absorbed, and then comes into intense contact with the liquid layer formed between the porous plates 7 and 8, and rises while being absorbed.

多孔板7と8の間に形成された液層を通過したガスは更
に多孔板5と6の間に溜まっている吸収液の落下液と接
触し、吸収が行われ、多孔板5と6の間に形成された液
層を上昇して、スプレー機構12からスプレーされたガ
ス吸収液と接触し、吸収されながら排気導管13へ送ら
れる。
The gas that has passed through the liquid layer formed between the perforated plates 7 and 8 further comes into contact with the falling absorption liquid that has accumulated between the perforated plates 5 and 6, and absorption occurs. The liquid layer formed in between rises and comes into contact with the gas absorption liquid sprayed from the spray mechanism 12, and is sent to the exhaust conduit 13 while being absorbed.

この間、多孔板5と6の間では多孔[7と8の間で行わ
れる気液接触機構がくり返されることになる。
During this time, the gas-liquid contact mechanism that occurs between the porous plates 5 and 6 is repeated between the porous plates 7 and 8.

排気導管13へ送られたガスは次いで気液分離器14に
てガス吸収液の飛沫が分離され気体はアアンFを通りガ
ス出口16から系外へ排気される。
The gas sent to the exhaust conduit 13 is then separated from droplets of gas absorption liquid in a gas-liquid separator 14, and the gas passes through the air vent F and is exhausted out of the system from the gas outlet 16.

気液分離器で分離されたガス吸収液の飛沫は捕集されて
吸収液溜槽2に戻される。
The gas absorption liquid droplets separated by the gas-liquid separator are collected and returned to the absorption liquid storage tank 2.

吸収液2は定量的に又は定期的に更新し、常にガス吸収
の効率が劣化しないようにする〔実施例〕 第1図に示した装置にラジェーターのコアーはんだ付け
から発生するガスを導入しガス濃度として、はんだ付は
フラフクスの主成分であるアミンをガス出口にて測定し
た。
The absorption liquid 2 is refreshed quantitatively or periodically to ensure that the efficiency of gas absorption does not deteriorate at all times. [Example] The gas generated from the core soldering of the radiator is introduced into the device shown in Figure 1. The concentration of amine, which is the main component of soldering flux, was measured at the gas outlet.

基l東豆 ガス中のアミン濃度 −・−50ppmガス風速   
   −・ 1.5m/秒ファンの動圧    −20
0mmA q多孔板の孔径    −5mm 多孔板の開孔率   −・−33,5%多孔板の液層厚
み  ・−・・・ 39mm  2層ガス吸収液   
  ・−水 ※測定されたアミン濃度は0.2ρρ−であった。
Amine concentration in base 1 Dongdou gas -・-50ppm Gas wind speed
-・Dynamic pressure of 1.5m/sec fan -20
0mmA q Pore diameter of perforated plate -5mm Porosity of perforated plate -・-33.5% Liquid layer thickness of perforated plate ・・・39mm Two-layer gas absorption liquid
-Water *The measured amine concentration was 0.2ρρ-.

〔比較例〕[Comparative example]

実施例の多孔板の間隔を離し、多孔板の間の液層の形成
ができない状態で試験を行った以外は実施例と同一条件
で試験を行い、アミン濃度を測定した。
The test was conducted under the same conditions as in the example except that the perforated plates of the example were spaced apart and the test was conducted in a state where no liquid layer could be formed between the perforated plates, and the amine concentration was measured.

※測定されたアミン濃度は2.01)り一であった。*The measured amine concentration was 2.01).

〔発明の効果〕〔Effect of the invention〕

以上説明した本発明による湿式ガス吸収処理装置により
ガス吸収を行ったときは、圧力損失の極めて低い水層が
2枚の多孔板の間に形成できるので特別の装置を付は加
えることなく効率良く気液接触でき、ガス吸収装置の向
上ができる。
When gas is absorbed by the wet gas absorption treatment apparatus according to the present invention as described above, a water layer with extremely low pressure loss can be formed between two perforated plates, so that gas and liquid can be efficiently absorbed without adding any special equipment. It can be used to improve gas absorption equipment.

このため安価な装置で大気汚染防止、悪臭防止、作業環
境の改善などの対策として優れた効果が得られる。
Therefore, with an inexpensive device, excellent effects can be obtained as a measure for preventing air pollution, preventing bad odors, and improving the working environment.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の湿式ガス吸収装置の概要を示す断面図
の1例で第2図は多孔板の1例を示す部分拡大平面図で
ある。 1−一−−−ガス導入部  2−・吸収液溜槽3−一一
一一ガス吸収液  4−・−・ガス吸収塔内5〜8・・
−・−多孔板  9・−ガス吸収塔10・−循環バイブ
  11・−・送液管12・・−スプレー機構 13−
四排気導管14・・−気液分離器  15・・−分離液
戻し菅16−−−−・ガス出口   P −吸収液循環
ポンプF・−・−排気ファン
FIG. 1 is an example of a sectional view showing an outline of the wet gas absorption device of the present invention, and FIG. 2 is a partially enlarged plan view showing an example of a perforated plate. 1-1---Gas introduction part 2-・Absorption liquid storage tank 3-111 Gas absorption liquid 4-・・・Gas absorption tower interior 5-8・・
-・-Perforated plate 9・-Gas absorption tower 10・−Circulation vibrator 11・−・Liquid sending pipe 12・・・−Spray mechanism 13−
Four exhaust pipes 14... - Gas-liquid separator 15...- Separated liquid return tube 16 - Gas outlet P - Absorbent circulation pump F... - Exhaust fan

Claims (1)

【特許請求の範囲】[Claims] 1、ガス吸収塔内に200mm間隔以内に保持した2枚
の多孔板を対として、1対以上の対を形成させ、処理ガ
スと吸収液とを向流接触させることを特徴とする湿式ガ
ス吸収処理装置および処理方法。
1. Wet gas absorption characterized by forming one or more pairs of two perforated plates held at a distance of 200 mm or less in a gas absorption tower to bring the processing gas and absorption liquid into countercurrent contact. Processing equipment and processing method.
JP61095521A 1986-04-24 1986-04-24 Wet gas absorbing treatment device and method Pending JPS62250928A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61095521A JPS62250928A (en) 1986-04-24 1986-04-24 Wet gas absorbing treatment device and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61095521A JPS62250928A (en) 1986-04-24 1986-04-24 Wet gas absorbing treatment device and method

Publications (1)

Publication Number Publication Date
JPS62250928A true JPS62250928A (en) 1987-10-31

Family

ID=14139867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61095521A Pending JPS62250928A (en) 1986-04-24 1986-04-24 Wet gas absorbing treatment device and method

Country Status (1)

Country Link
JP (1) JPS62250928A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002177727A (en) * 2000-12-07 2002-06-25 Kurita Water Ind Ltd Deodorizing device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5281069A (en) * 1975-12-29 1977-07-07 Riyouichi Kurumaya Exhaust gas purification column
JPS59196715A (en) * 1983-04-21 1984-11-08 Seiko Kakoki Kk Exhaust gas scrubbing apparatus and method therefor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5281069A (en) * 1975-12-29 1977-07-07 Riyouichi Kurumaya Exhaust gas purification column
JPS59196715A (en) * 1983-04-21 1984-11-08 Seiko Kakoki Kk Exhaust gas scrubbing apparatus and method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002177727A (en) * 2000-12-07 2002-06-25 Kurita Water Ind Ltd Deodorizing device

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