JPS62248117A - Thin film magnetic head and its manufacture - Google Patents

Abstract

PURPOSE:To prevent disconnection due to a thin MR film overriding the end of a lower magnetic pole by connecting the MR film and a lead pattern electrically on a tilted end face of the lower magnetic pole. CONSTITUTION:The 1st insulation film 9 and the MR film 10 are laminated on the lower magnetic pole 6 of a base 5 by vacuum deposition. The photo resist is applied on the MR film 10, a register film corresponding to the lead pattern 11 is removed by exposing, the MR film 10 is used as an electrode so as to attach gold by electric plating. Then in removing others while leaving the resist film on the lower magnetic pole, the MR film 10 remains on the lower magnetic pole 6 and the MR film 10 and the lead pattern 11 are connected electrically on the ends 7, 8 of the lower magnetic pole 6. Thus, the disconnection due to the thin MR film 10 overriding the lower magnetic pole end is prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic head having a magnetoresistive element and a method for manufacturing the same.

[Conventional technology]

A magnetoresistive film (hereinafter referred to as MR film) serving as a magnetoresistive element (hereinafter referred to as MR element) is generally placed between two magnetic poles together with other bias means. The MR film is patterned into a stripe, and both ends of the stripe are electrically connected to conductive lead patterns to form an MR element. The length of the striped MR film pattern corresponds to the reproduction track width of the magnetic head, and is exactly two times above and below.
A force matching the width of one magnetic pole is preferred.

For this purpose, conventionally, after forming the lower magnetic pole, an insulating film is deposited, and then the MR film is arranged in a striped manner to cover the lower magnetic pole, and the MR film and the MR film are drawn out at a place slightly away from the lower magnetic pole tip. I was measuring the electrical connection with the pattern.

[Problem that the invention seeks to solve]

In this conventional method, since the lower magnetic pole end portion is sharply cut, the MR film is not continuously attached, and electrical connection may be impaired.

As a method for solving the above drawbacks, the Japanese Patent Laid-Open Publication No. 59 (1983) shown in FIG.
The method of No.-30223 has been proposed. In FIG. 8, an MR film 2 and an extraction pattern 3 are placed on the bottom magnetic pole 1.
, 4, the above-mentioned M at the lower pole tip
This prevents the R membrane from being cut.

However, in a portion of the extraction pattern, the MR film cannot exhibit its original magnetic flux sensing function. Therefore, in the method shown in FIG. 8, the effective reproduction track width becomes smaller than the width of the lower magnetic pole. Furthermore, since the insulating film sandwiched between the MR film and the bottom magnetic pole is extremely thin, if the bottom magnetic pole is large and the MR film is present over its entire surface, as shown in Figure 8, pinholes in the insulating film may occur. Please be aware that this may easily cause a short circuit between the lower magnetic pole and the MR film.

[Means for solving problems]

According to the present invention, 7t is sandwiched between the first insulating film and the second insulating film.
A magnetic head having an MR film between a lower magnetic pole and an upper magnetic pole, which has at least two conductive films electrically connected to the MR film on the inclined end of the lower magnetic pole, and the conductive film and the upper magnetic pole. a thin-film magnetic head in which the end portion of the magnetic head is disposed with the second insulating film interposed therebetween; The magnetic head has at least two conductive films electrically connected to the magnetoresistive film on the inclined end of the lower magnetic pole between the conductive film and the end of the upper magnetic pole. A second insulating film is interposed therebetween, and an @3 insulating film, a coil, and a third magnetic pole are layered on top of the upper magnetic pole, and the third magnetic pole and the upper magnetic pole are magnetically connected. After a magnetic film is deposited on a non-magnetic substrate, the shape of a lower magnetic pole is formed by dry etching, and a first magnetic film is formed on the lower magnetic pole.
A magnetoresistive film including an insulating film and a biasing means is laminated by vacuum evaporation or sputtering, and then at least the magnetoresistive film on the end of the lower magnetic pole is exposed and most of the magnetoresistive film including the upper part of the lower magnetic pole is layered. 1. Apply photoresist as thick as possible. Now the tin plating is completed. First, remove the photoresist other than the photoresist covering the magnetoresistive film on the bottom plate, and remove the exposed magnetoresistive film by dry etching. , manufacturing a thin film magnetic head characterized by forming an upper magnetic pole after depositing a second insulating film, and further laminating a third insulating film, a coil made of a conductive film, and a third magnetic pole on the upper magnetic pole. It's a method.

〔Example〕

Next, an embodiment of the present invention will be described first according to the manufacturing procedure with reference to the drawings. 2 to 7 show a thin film magnetic head in the process of being manufactured, and (α) is a cross-sectional view taken along a virtual line υ where it will be finally mechanically cut. The imaginary line is typically shown as AA' in FIG.

In FIGS. 2(α) and (b), a magnetic film is deposited on a non-magnetic ceramic substrate 5 by electroplating or sputtering, and then dry etching as typified by ion milling is performed using a photoresist or metal mask as a protective film. The pattern of the lower magnetic pole 6 is thus formed. The inclination of the ends 7 and 8 of the lower magnetic pole 6 can be set to about 4 by selecting the incident angle of argon ions to 45° during ion milling, for example.
It can be set to 5°.

Next, in FIGS. 3(α) and 3(b), a first insulating film 9 and an MR film 10 are laminated on the lower magnetic pole 6 by vacuum evaporation or sputtering. At this time, a bias means for the MR film 10, for example, a W film or the like is applied in the case of a shunt bias method, but this is omitted in FIG. 3 because a number of methods are possible. Thereafter, as shown in FIG. 4 (ω, (b)), a drawing pattern 11 is formed by gold plating.

First, a photoresist is applied on the MR film 10, and a portion of the photoresist corresponding to the extraction pattern 11 is removed by exposure and development. Next, gold is deposited by electroplating using the MR film 10 as an electrode.

Thereafter, the photoresist on the lower magnetic pole 6 is subjected to t-fi to remove the photoresist on other parts. The exposed MR film is etched by dry etching, as shown in Figure 5 (α
), as shown in (b), the MR film 10 remains on the bottom magnetic pole 6, and the MR film 10 remains on the ends 7, 8 of the bottom magnetic pole 6.
and the extraction pattern 11 are electrically connected.

Next, as shown in FIGS. 6(α) and 6(b), after forming the second insulating layer 12 on the entire substrate by vacuum evaporation or sputtering, a second insulating layer 12 is formed directly above the lower magnetic pole 6 and with the lead pattern 1
1. An upper magnetic pole 13 is created in the portion sandwiched between the two.

The upper magnetic pole 13 can be formed by sputtering or electroplating, but it is preferable to deposit the metal arm base layer 15 in advance, cover the extraction pattern 11 with photoresist, and then electroplat the upper magnetic pole 13. This is preferable because it can be made more planar.

By the above manufacturing method, a thin film magnetic head shown in FIGS. 6(d and 6b) in which the MR film 10 is sandwiched between the lower magnetic pole 6 and the upper magnetic pole 13 is completed. This is a read-only magnetic head called a shielded type, and in order to provide a write function, it is necessary to add an element called an inductive type element having a coil.A method for additionally manufacturing an inducted type element will be described below.

As shown in FIGS. 7(d) and (b), the third insulating layer 14
is formed on the upper magnetic pole 13 by vacuum evaporation or sputtering, and in order to eliminate the overall unevenness, a first organic insulating layer 15 mainly composed of novolac is covered over the upper magnetic pole 13 and the extraction pattern 11. Next, a coil 16 made of a thin film of copper or gold is formed on the organic insulating layer 15, and the coil 16 is further covered with a second organic insulating layer 17. Thereafter, a magnetic film is deposited by sputtering or electroplating, and further formed into a shape substantially the same as the upper magnetic pole 13, and the third magnetic pole 18 is formed.
By creating this, the thin film magnetic head shown in FIG. 1 is obtained.

By the above manufacturing method, the lower magnetic pole 6 is produced as shown in FIG. 1 (α).
The MR film 10 and the extraction pattern 11 are electrically connected on the ends 7 and 8 of the upper magnetic pole 13 and the extraction pattern 11 are arranged with the second insulating layer 12 in between. A thin film magnetic head is obtained in which a shield type read head is combined with an induct tape type write head in which the upper magnetic pole 13 is one magnetic pole and the other magnetic pole is the third magnetic pole 18.

〔Effect of the invention〕

As explained above, according to the present invention, by electrically connecting the MR film and the lead pattern on the inclined end of the lower magnetic pole, disconnection due to the thin MR film climbing over the end of the lower magnetic pole is achieved. can reduce the possibility of Furthermore, since it is not necessary to arrange the MR film over a wide area on the lower magnetic pole, it is possible to prevent short circuits due to pinholes in the insulating layer between the MR film and the lower magnetic pole.

Furthermore, in combination with an inductive type write head that uses the upper magnetic pole as a common magnetic pole, by making the width of the third magnetic pole the same as the upper magnetic pole, it is possible to write with a track width wider than the effective reproduction track width of the MR film. This has the effect of easily preventing a decrease in the S/N ratio due to track misalignment in high track storage density recording that requires a narrow track width.

[Brief explanation of drawings]

FIG. 1 (α) is a sectional view of the thin film magnetic head of the present invention.
Figure (b) is a plan view of the thin film magnetic head of the present invention, and Figure 2 (
Chrysanthemum is a cross-sectional view showing the lower magnetic pole of the thin film magnetic head of the present invention;
(b) is the same plan view, FIG. 3 (α) is a cross-sectional view showing the MR film of the thin film magnetic head of the present invention, (b) is the same plan view, and FIG. 4 (α) is a cross-sectional view showing the extraction pattern. , (b) is a plan view of the same, FIG. 5 (α) is a cross-sectional view showing the MR film after etching, FIG. 6 (α) is a cross-sectional view showing the upper magnetic pole, 7(a) is a sectional view showing the third insulating layer, FIG. 7(b) is a plan view thereof, and FIG. 8 is a plan view showing a conventional example. 6... Lower magnetic pole, 10... MR film, 11... Leading pattern, 13... Upper magnetic pole, 14... Third insulating layer, 18... Third magnetic pole

Claims (3)

[Claims] (1) A magnetoresistive film sandwiched between both sides by a first insulating film and a second insulating film is placed between the bottom magnetic pole and the top magnetic pole in a magnetic head, and a magnetoresistive film is placed on the oblique end of the bottom magnetic pole. 1. A thin film magnetic head comprising at least two conductive films electrically connected to a resistance effect film, the conductive films and an end of an upper magnetic pole being disposed with the second insulating film interposed therebetween. (2) A magnetoresistive film sandwiched between both sides by a first insulating film and a second insulating film is placed between the bottom magnetic pole and the top magnetic pole in a magnetic head, and a magnetoresistive film is placed on the inclined end of the bottom magnetic pole. at least two conductive films electrically connected to the effect film, the conductive film and the end of the upper magnetic pole are disposed via the second insulating film, and a third insulating film is provided on the upper magnetic pole. film,
A thin film magnetic head characterized in that a coil and a third magnetic pole are laminated, and the third magnetic pole and the upper magnetic pole are magnetically connected. (3) After depositing the magnetic film on the non-magnetic substrate, the shape of the lower magnetic pole is formed by dry etching, and a magnetoresistive film including the first insulating film and biasing means is vacuum evaporated or The layers are laminated by sputtering, and then a photoresist is applied so that at least the magnetoresistive film on the end of the bottom pole is exposed and the magnetoresistive film including the top of the bottom pole is covered, and then gold plating is applied, and then the bottom layer is coated with a photoresist. After removing the photoresist other than the photoresist covering the magnetoresistive film on the magnetic pole and removing the exposed magnetoresistive film by dry etching, and depositing the second insulating film, the upper magnetic pole is formed. A method of manufacturing a thin film magnetic head, further comprising laminating a third insulating film, a coil made of a conductive film, and a third magnetic pole on the upper magnetic pole.