JPS62247523A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS62247523A
JPS62247523A JP9028386A JP9028386A JPS62247523A JP S62247523 A JPS62247523 A JP S62247523A JP 9028386 A JP9028386 A JP 9028386A JP 9028386 A JP9028386 A JP 9028386A JP S62247523 A JPS62247523 A JP S62247523A
Authority
JP
Japan
Prior art keywords
film
resist film
pattern
sog
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9028386A
Other languages
English (en)
Japanese (ja)
Other versions
JPH058856B2 (enExample
Inventor
Eiichi Kawamura
栄一 河村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9028386A priority Critical patent/JPS62247523A/ja
Publication of JPS62247523A publication Critical patent/JPS62247523A/ja
Publication of JPH058856B2 publication Critical patent/JPH058856B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9028386A 1986-04-18 1986-04-18 半導体装置の製造方法 Granted JPS62247523A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9028386A JPS62247523A (ja) 1986-04-18 1986-04-18 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9028386A JPS62247523A (ja) 1986-04-18 1986-04-18 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS62247523A true JPS62247523A (ja) 1987-10-28
JPH058856B2 JPH058856B2 (enExample) 1993-02-03

Family

ID=13994187

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9028386A Granted JPS62247523A (ja) 1986-04-18 1986-04-18 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS62247523A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005005602A (ja) * 2003-06-13 2005-01-06 Semiconductor Energy Lab Co Ltd 表面処理方法及び半導体装置の作製方法
JP2012059924A (ja) * 2010-09-09 2012-03-22 Lapis Semiconductor Co Ltd 感光性レジストパターンの形成方法、及び半導体装置の製造方法
JP2017194588A (ja) * 2016-04-21 2017-10-26 Hoya株式会社 表面処理方法、マスクブランクの製造方法、および転写用マスクの製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005005602A (ja) * 2003-06-13 2005-01-06 Semiconductor Energy Lab Co Ltd 表面処理方法及び半導体装置の作製方法
US7449408B2 (en) * 2003-06-13 2008-11-11 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
JP2012059924A (ja) * 2010-09-09 2012-03-22 Lapis Semiconductor Co Ltd 感光性レジストパターンの形成方法、及び半導体装置の製造方法
JP2017194588A (ja) * 2016-04-21 2017-10-26 Hoya株式会社 表面処理方法、マスクブランクの製造方法、および転写用マスクの製造方法

Also Published As

Publication number Publication date
JPH058856B2 (enExample) 1993-02-03

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