JPS6223365B2 - - Google Patents

Info

Publication number

JPS6223365B2

JPS6223365B2 JP11336580A JP11336580A JPS6223365B2 JP S6223365 B2 JPS6223365 B2 JP S6223365B2 JP 11336580 A JP11336580 A JP 11336580A JP 11336580 A JP11336580 A JP 11336580A JP S6223365 B2 JPS6223365 B2 JP S6223365B2

Authority

JP

Japan

Prior art keywords

film

thickness

layer

parts

metal oxide

Prior art date

1980-08-20

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

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• 229910044991 metal oxide Inorganic materials 0.000 claims description 20
• 150000004706 metal oxides Chemical class 0.000 claims description 20
• 150000003377 silicon compounds Chemical class 0.000 claims description 6
• 239000010410 layer Substances 0.000 description 51
• 238000000034 method Methods 0.000 description 23
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 21
• -1 polyethylene terephthalate Polymers 0.000 description 19
• 239000000463 material Substances 0.000 description 15
• 239000000203 mixture Substances 0.000 description 14
• 238000000576 coating method Methods 0.000 description 13
• 229910021331 inorganic silicon compound Inorganic materials 0.000 description 13
• 150000003961 organosilicon compounds Chemical class 0.000 description 13
• LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
• 238000010438 heat treatment Methods 0.000 description 12
• 239000000843 powder Substances 0.000 description 12
• 229920000139 polyethylene terephthalate Polymers 0.000 description 11
• 239000005020 polyethylene terephthalate Substances 0.000 description 11
• 239000011248 coating agent Substances 0.000 description 10
• 229920005989 resin Polymers 0.000 description 10
• 239000011347 resin Substances 0.000 description 10
• OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
• 238000005299 abrasion Methods 0.000 description 9
• 238000004544 sputter deposition Methods 0.000 description 9
• 238000002834 transmittance Methods 0.000 description 8
• 229910004298 SiO 2 Inorganic materials 0.000 description 7
• 238000000151 deposition Methods 0.000 description 7
• 238000007733 ion plating Methods 0.000 description 7
• 239000000126 substance Substances 0.000 description 7
• KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
• 230000008021 deposition Effects 0.000 description 6
• 238000005488 sandblasting Methods 0.000 description 6
• 239000000377 silicon dioxide Substances 0.000 description 6
• 229910052814 silicon oxide Inorganic materials 0.000 description 6
• 229910006404 SnO 2 Inorganic materials 0.000 description 5
• 239000002216 antistatic agent Substances 0.000 description 5
• 239000012298 atmosphere Substances 0.000 description 5
• 150000001875 compounds Chemical class 0.000 description 5
• 229920001577 copolymer Polymers 0.000 description 5
• 229920006254 polymer film Polymers 0.000 description 5
• 239000000243 solution Substances 0.000 description 5
• 239000002904 solvent Substances 0.000 description 5
• 230000003746 surface roughness Effects 0.000 description 5
• 238000001771 vacuum deposition Methods 0.000 description 5
• 238000007740 vapor deposition Methods 0.000 description 5
• QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
• 230000000052 comparative effect Effects 0.000 description 4
• 238000007796 conventional method Methods 0.000 description 4
• 238000001035 drying Methods 0.000 description 4
• 230000000694 effects Effects 0.000 description 4
• 229910052751 metal Inorganic materials 0.000 description 4
• 239000002184 metal Substances 0.000 description 4
• 239000001301 oxygen Substances 0.000 description 4
• 229910052760 oxygen Inorganic materials 0.000 description 4
• 238000007788 roughening Methods 0.000 description 4
• 239000004065 semiconductor Substances 0.000 description 4
• LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
• YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
• XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
• YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
• 230000005611 electricity Effects 0.000 description 3
• 239000007788 liquid Substances 0.000 description 3
• 239000000049 pigment Substances 0.000 description 3
• XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
• XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
• VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
• LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
• GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
• BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
• XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
• PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
• 238000000137 annealing Methods 0.000 description 2
• 239000003963 antioxidant agent Substances 0.000 description 2
• TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
• 239000011230 binding agent Substances 0.000 description 2
• 230000015572 biosynthetic process Effects 0.000 description 2
• 230000005684 electric field Effects 0.000 description 2
• 150000002739 metals Chemical class 0.000 description 2
• TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
• 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
• 238000000053 physical method Methods 0.000 description 2
• 239000004014 plasticizer Substances 0.000 description 2
• 239000004800 polyvinyl chloride Substances 0.000 description 2
• 229920000915 polyvinyl chloride Polymers 0.000 description 2
• 239000004576 sand Substances 0.000 description 2
• 229910052710 silicon Inorganic materials 0.000 description 2
• 239000010703 silicon Substances 0.000 description 2
• 230000003068 static effect Effects 0.000 description 2
• 239000000758 substrate Substances 0.000 description 2
• 239000002562 thickening agent Substances 0.000 description 2
• XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
• 229910001887 tin oxide Inorganic materials 0.000 description 2
• 238000007738 vacuum evaporation Methods 0.000 description 2
• XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
• 229910052984 zinc sulfide Inorganic materials 0.000 description 2
• WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
• 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
• 229910002012 Aerosil® Inorganic materials 0.000 description 1
• 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
• 229910018626 Al(OH) Inorganic materials 0.000 description 1
• 229920001747 Cellulose diacetate Polymers 0.000 description 1
• 229920002284 Cellulose triacetate Polymers 0.000 description 1
• 229920001634 Copolyester Polymers 0.000 description 1
• MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
• 229920000877 Melamine resin Polymers 0.000 description 1
• 229910017625 MgSiO Inorganic materials 0.000 description 1
• 229910020282 Pb(OH) Inorganic materials 0.000 description 1
• 239000004952 Polyamide Substances 0.000 description 1
• 239000004743 Polypropylene Substances 0.000 description 1
• 239000004793 Polystyrene Substances 0.000 description 1
• 229920002472 Starch Polymers 0.000 description 1
• PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
• ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
• RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
• XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
• 239000005083 Zinc sulfide Substances 0.000 description 1
• QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
• NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
• 125000002252 acyl group Chemical group 0.000 description 1
• 239000000654 additive Substances 0.000 description 1
• 239000000853 adhesive Substances 0.000 description 1
• 230000001070 adhesive effect Effects 0.000 description 1
• 125000003545 alkoxy group Chemical group 0.000 description 1
• 125000000217 alkyl group Chemical group 0.000 description 1
• 150000001412 amines Chemical class 0.000 description 1
• 239000002518 antifoaming agent Substances 0.000 description 1
• GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
• 239000007864 aqueous solution Substances 0.000 description 1
• 229910052786 argon Inorganic materials 0.000 description 1
• 238000000149 argon plasma sintering Methods 0.000 description 1
• AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
• 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
• 229910052793 cadmium Inorganic materials 0.000 description 1
• BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
• BEQNOZDXPONEMR-UHFFFAOYSA-N cadmium;oxotin Chemical compound [Cd].[Sn]=O BEQNOZDXPONEMR-UHFFFAOYSA-N 0.000 description 1
• 229910000019 calcium carbonate Inorganic materials 0.000 description 1
• 125000004432 carbon atom Chemical group C* 0.000 description 1
• 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
• 229920002301 cellulose acetate Polymers 0.000 description 1
• 239000012461 cellulose resin Substances 0.000 description 1
• 239000003795 chemical substances by application Substances 0.000 description 1
• 239000004927 clay Substances 0.000 description 1
• 238000005336 cracking Methods 0.000 description 1
• 238000002425 crystallisation Methods 0.000 description 1
• 230000008025 crystallization Effects 0.000 description 1
• 230000003247 decreasing effect Effects 0.000 description 1
• 230000002950 deficient Effects 0.000 description 1
• IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
• FSBVERYRVPGNGG-UHFFFAOYSA-N dimagnesium dioxido-bis[[oxido(oxo)silyl]oxy]silane hydrate Chemical compound O.[Mg+2].[Mg+2].[O-][Si](=O)O[Si]([O-])([O-])O[Si]([O-])=O FSBVERYRVPGNGG-UHFFFAOYSA-N 0.000 description 1
• 229910001882 dioxygen Inorganic materials 0.000 description 1
• 238000007598 dipping method Methods 0.000 description 1
• 239000006185 dispersion Substances 0.000 description 1
• 239000000428 dust Substances 0.000 description 1
• 238000010894 electron beam technology Methods 0.000 description 1
• 238000004049 embossing Methods 0.000 description 1
• 239000003822 epoxy resin Substances 0.000 description 1
• 238000005530 etching Methods 0.000 description 1
• WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
• 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
• 239000010433 feldspar Substances 0.000 description 1
• 239000003063 flame retardant Substances 0.000 description 1
• 125000005843 halogen group Chemical group 0.000 description 1
• LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
• 229920001519 homopolymer Polymers 0.000 description 1
• 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
• 230000003301 hydrolyzing effect Effects 0.000 description 1
• 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
• 239000012535 impurity Substances 0.000 description 1
• 229910052738 indium Inorganic materials 0.000 description 1
• APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
• 229910003437 indium oxide Inorganic materials 0.000 description 1
• PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
• 230000006698 induction Effects 0.000 description 1
• 238000010849 ion bombardment Methods 0.000 description 1
• 150000002500 ions Chemical class 0.000 description 1
• PIJPYDMVFNTHIP-UHFFFAOYSA-L lead sulfate Chemical compound [PbH4+2].[O-]S([O-])(=O)=O PIJPYDMVFNTHIP-UHFFFAOYSA-L 0.000 description 1
• 238000011068 loading method Methods 0.000 description 1
• 239000000314 lubricant Substances 0.000 description 1
• 239000000391 magnesium silicate Substances 0.000 description 1
• 229910052919 magnesium silicate Inorganic materials 0.000 description 1
• 235000019792 magnesium silicate Nutrition 0.000 description 1
• 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
• 239000012046 mixed solvent Substances 0.000 description 1
• 238000002156 mixing Methods 0.000 description 1
• 239000003607 modifier Substances 0.000 description 1
• 239000000615 nonconductor Substances 0.000 description 1
• 230000003287 optical effect Effects 0.000 description 1
• 125000000962 organic group Chemical group 0.000 description 1
• 229920000620 organic polymer Polymers 0.000 description 1
• 150000002902 organometallic compounds Chemical class 0.000 description 1
• 230000003647 oxidation Effects 0.000 description 1
• 238000007254 oxidation reaction Methods 0.000 description 1
• 230000001590 oxidative effect Effects 0.000 description 1
• RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
• 239000002245 particle Substances 0.000 description 1
• 239000005011 phenolic resin Substances 0.000 description 1
• 229920002647 polyamide Polymers 0.000 description 1
• 229920006122 polyamide resin Polymers 0.000 description 1
• 229920000515 polycarbonate Polymers 0.000 description 1
• 239000004417 polycarbonate Substances 0.000 description 1
• 229920000647 polyepoxide Polymers 0.000 description 1
• 229920001225 polyester resin Polymers 0.000 description 1
• 239000004645 polyester resin Substances 0.000 description 1
• 229920000642 polymer Polymers 0.000 description 1
• 229920001155 polypropylene Polymers 0.000 description 1
• 229920002223 polystyrene Polymers 0.000 description 1
• 229920005749 polyurethane resin Polymers 0.000 description 1
• 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
• 239000011241 protective layer Substances 0.000 description 1
• 230000005855 radiation Effects 0.000 description 1
• 238000007790 scraping Methods 0.000 description 1
• 239000007921 spray Substances 0.000 description 1
• 239000003381 stabilizer Substances 0.000 description 1
• 239000008107 starch Substances 0.000 description 1
• 235000019698 starch Nutrition 0.000 description 1
• 239000000454 talc Substances 0.000 description 1
• 229910052623 talc Inorganic materials 0.000 description 1
• 229920005992 thermoplastic resin Polymers 0.000 description 1
• 229920001187 thermosetting polymer Polymers 0.000 description 1
• 229910052718 tin Inorganic materials 0.000 description 1
• 229910052719 titanium Inorganic materials 0.000 description 1
• 239000010936 titanium Substances 0.000 description 1
• OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
• 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
• 229920002554 vinyl polymer Polymers 0.000 description 1
• 239000011787 zinc oxide Substances 0.000 description 1
• DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
• 229910052726 zirconium Inorganic materials 0.000 description 1
• 229910001928 zirconium oxide Inorganic materials 0.000 description 1