JPS622309B2 - - Google Patents

Info

Publication number
JPS622309B2
JPS622309B2 JP16101578A JP16101578A JPS622309B2 JP S622309 B2 JPS622309 B2 JP S622309B2 JP 16101578 A JP16101578 A JP 16101578A JP 16101578 A JP16101578 A JP 16101578A JP S622309 B2 JPS622309 B2 JP S622309B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin plate
vertical axis
holding device
brush
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16101578A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5589839A (en
Inventor
Kensuke Yokota
Akira Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Artience Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Priority to JP16101578A priority Critical patent/JPS5589839A/ja
Publication of JPS5589839A publication Critical patent/JPS5589839A/ja
Publication of JPS622309B2 publication Critical patent/JPS622309B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP16101578A 1978-12-28 1978-12-28 Unpolymerized part washing-out device of exposed photosensitive resin plate Granted JPS5589839A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16101578A JPS5589839A (en) 1978-12-28 1978-12-28 Unpolymerized part washing-out device of exposed photosensitive resin plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16101578A JPS5589839A (en) 1978-12-28 1978-12-28 Unpolymerized part washing-out device of exposed photosensitive resin plate

Publications (2)

Publication Number Publication Date
JPS5589839A JPS5589839A (en) 1980-07-07
JPS622309B2 true JPS622309B2 (enrdf_load_stackoverflow) 1987-01-19

Family

ID=15726951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16101578A Granted JPS5589839A (en) 1978-12-28 1978-12-28 Unpolymerized part washing-out device of exposed photosensitive resin plate

Country Status (1)

Country Link
JP (1) JPS5589839A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5589839A (en) 1980-07-07

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