JPS62228364A - Line system continuous feeding specular face polishing device - Google Patents

Abstract

PURPOSE:To enable a uniform specular face polishing by providing the liquid reservoir of a polishing liquid on the surface board of a tool base, providing a number of flow- out ports on the peripheral edge of said surface board, and arranging and reciprocating said tool bases on each of which an abrasive grain holdable visco-elastic polishing body is installed, in a direction perpendicular to the feeding direction of a workpiece. CONSTITUTION:A number of liquid flow-out ports 30 are opened on the peripheral edge of the disk-form surface board 24 of a tool base 21 installed on a motor driven shaft 14. And, a liquid reservoir 26 is formed on the back of the surface board 24 and is feed with a liquid from a liquid feeding opening 31. A liquid-penetrating visco- elastic polishing body 22 of an urethane form, etc. is installed on the surfaces of the tool base 21. Accordingly, a polishing liquid is fed to the contact part between the polishing body 22 and a workpiece by means of a centrifugal force due to the rotation of a tool. Many of the tools are multiply arranged in the direction perpendicular to the feeding direction as well as the feeding direction of the workpiece, and are reciprocated in the perpendicular direction at a speed higher than the feeding speed of the workpiece. Accordingly, a uniform specular face polishing can be carried out.

Description

[Detailed description of the invention]

[Industrial Application Field] The present invention is applicable to polishing objects having a relatively wide flat surface such as stainless steel regular plates or coil materials, or large-area workpieces or small objects having relatively small irregularities on the surface. The present invention relates to a polishing apparatus for polishing an object formed by an array of parts to a complete mirror finish by continuous line feeding. [Prior art] Mirror-finished stainless steel sheets are used not only for the interior and exterior of buildings, but also for use in substrates for silicon solar cells, etc. However, recently, users' awareness of the degree of mirror-finishing has changed. is becoming increasingly strict, and items with noticeable abrasive grain lines that are finished with conventional puff polishing are
While it is treated as a quasi-mirror surface, the demand for a completely mirror surface is increasing. Another problem with conventional puff polishing is that the powder layer is so large that it is extremely difficult to suppress it and improve the working environment. In this current situation, there is an increasing demand for mirror polishing of relatively large polishing objects all at once.
Conventional polishing methods such as puff polishing or lapping have difficulty meeting such demands. That is, like a stainless steel standard plate or coil material,
When mirror polishing an object with a relatively large area 1
There are the following problems, but conventional polishing means cannot be expected to solve these problems. First, rather than using a single polishing tool that comes into contact with the object over a large area and polishes it, it is better to arrange a number of polishing tools and use them to polish the object. is considered to be effective and appropriate in various aspects,
Even in this case, unless the force used to press each tool against the object to be polished is sufficiently small, the overall contact pressure between the object and the tool will increase, making it difficult to feed them relative to each other. Not only that, but the object also needs to be supported by extremely strong support means, which increases the size of the apparatus. In addition, when polishing, it is necessary to supply polishing liquid, but if the amount of polishing liquid increases overall, there is a problem that the working environment deteriorates, and if it is not supplied evenly, You cannot expect mirror polishing. Furthermore, in order to obtain a perfect mirror surface without abrasive grain lines, it is impossible to use polishing methods such as puff polishing, in which abrasive grains repeatedly cut the same position, and the Sufficient consideration must be given to the relative movement of tools. [Problems to be Solved by the Invention] An object of the present invention is to press a tool against the polishing object with a sufficiently small force when mirror-polishing an object having a relatively large area as described above. To provide a mirror polishing device that avoids increasing the size of the device, is configured to uniformly supply as little polishing liquid as possible for polishing, and is designed to obtain a perfect mirror surface without abrasive grain lines. It is in. c. Means for Solving Problems] In order to achieve the above object, the line type continuous feed mirror polishing device of the present invention has a tool base attached to the tip of the rotating shaft of the rotary drive machine, which is attached to a disc-shaped surface plate. It is constructed by providing a liquid reservoir at the back to which polishing liquid is supplied, and opening a large number of liquid outlet ports around the surface plate.This tool base has liquid permeability and holds abrasive grains. A viscoelastic abrasive body made of a suitable viscoelastic material and whose surface can be deformed to follow the surface of the workpiece is attached to this. Therefore, a large number of polishing units are arranged in a direction perpendicular to the feed direction of the flat workpiece, and each polishing unit applies a constant force to the viscoelastic polishing body against the workpiece. While pressed, the polishing units are supported so as to be movable in the direction, and the polishing units are reciprocated in a direction perpendicular to the relative feed direction of the workpiece at a speed sufficiently faster than the feed rate. It is characterized by being connected to a reciprocating mechanism. [Function] In each polishing unit, when the polishing tool is rotated by the rotary drive machine while supplying polishing liquid to the liquid reservoir in the tool base, the centrifugal force accompanying the rotation causes damage around the surface plate of the tool base. A polishing liquid is supplied to the surface of the workpiece from a large number of liquid outlets provided in the part through a viscoelastic polishing body having liquid permeability. Therefore, it is not necessary to feed the polishing liquid under pressure, and the pressing force of the polishing tool against the surface of the workpiece may be very small, for example, about the weight of the polishing unit itself. Since the above-mentioned polishing units act in this way, if a large number of them are arranged and reciprocated in a direction perpendicular to the relative feed direction of the workpiece at a speed sufficiently faster than the feed rate, each polishing unit) Since the proper amount of polishing liquid is supplied to the surface, the liquid does not deteriorate the environment overall, and the abrasive grains do not repeatedly grind the same position, so the finished surface is not abrasive. There are no grain lines. Furthermore, the viscoelastic abrasive body is formed of a viscoelastic material,
The surface is a machined surface that can be deformed to follow the surface of the workpiece, and the viscoelastic abrasive body is pressed against the workpiece with a constant force, and the pressing is supported so that it can move freely in the direction. Therefore, not only workpieces with flat surfaces such as stainless steel regular plates or coil materials, but also large-area workpieces with relatively small irregularities on the surface and objects formed by arrays of small parts can be polished. It can also be applied to [Example] Figures 1 to 3 show an example of the line-type continuous feed mirror polishing apparatus of the present invention, which is a conveyor device on which a workpiece W such as a stainless steel plate of fixed length is placed and transferred. M1, a plurality of machine frames 2 installed above the workpieces W to be transferred by the conveyor device l, a reciprocating mechanism 3 provided above each machine frame 2, and a conveyor device l by the reciprocating mechanism 3; The main components include a sliding frame 4 that reciprocates in a direction perpendicular to the direction in which the workpiece W is transferred, and a number of polishing units 5 that are supported by the sliding frame 4 so as to be vertically slidable. There is. FIG. 4 and FIG. 5 illustrate the details of the polishing unit 5, in which the polishing unit 5 is constructed as an apparatus for performing electrolytic abrasive composite polishing. This polishing unit 5 includes a rotary drive machine 12 consisting of a motor and a speed reduction device 1 provided on the output side of the machine body 11.
3, a rotating shaft 14 rotated by them is led out from the device main body 11, and a tool 20 is attached to the tip thereof. The tool 20 mainly includes a substantially disk-shaped tool base 5121 made of conductive copper or other material to function as an electrode for electrolytic polishing, and a viscoelastic polishing body 22 attached to the surface of the tool base 5121. It is configured as. The tool base fi21 has a liquid reservoir 26 formed behind a disc-shaped surface plate 24 attached to the tip of the rotating shaft 14, and the center of the surface plate 24 is attached to the rotating shaft H, and the peripheral part A large number of liquid outlet ports 30 are opened, and a liquid reservoir 26 at the back is opened.
is opened by a liquid supply opening 31, and a power supply sliding contact 33 for supplying an electrolytic current (described later) around the opening 31.
A Jl contact surface 32 is formed for contacting. The viscoelastic abrasive body 22 attached to the surface of the tool base 21 is made of a sponge-like member such as foamed polyurethane or other synthetic resin foam, or a viscoelastic body with liquid permeability such as nylon nonwoven fabric. It is designed to be attached to the surface of the tool base. In addition, the viscoelastic polishing body 22 can have abrasive grains dispersed throughout its surface or inside, and in that case, a synthetic resin pad mixed with abrasive grains such as alumina is used to coat a nylon nonwoven fabric or the like. The abrasive grains can be held in an adhesive state, or the abrasive grains in a free state can be supported by the mesh of the nonwoven fabric without fixing the abrasive grains. A large number of liquid outlet ports 30 opened in the surface plate 24 are provided at the periphery of the tool base 1121, more specifically, slightly inward from the periphery, and the periphery inside the tool base 5121 is provided with polishing liquid or electrolyte. A liquid reservoir 26 is formed, and the liquids are temporarily stored in the liquid reservoir 26, so that the liquid can be stably supplied from a large number of liquid outlet ports 30. Therefore, while the tool A 20 rotates, the polishing liquid or the electrolytic solution sequentially flows out from the liquid outlet 30, and the liquid mainly contacts the viscoelastic polishing body 22 around the tool 20 and the workpiece due to the centrifugal force accompanying the rotation of the tool. Supplied to parts that come into contact with objects. Moreover, since the tool 20 has excellent liquid retention properties, polishing can be performed with a relatively small amount of liquid. The liquid supply pipe 38 is for supplying a polishing liquid or an electrolytic solution to the polishing portion, and has a supply port 40 opened at one end of the device main body 11, and is connected to the tool base through the device main body. A delivery port 41 at the other end is exposed in an open state within the liquid supply opening 31 around the rotating shaft 14 provided behind the rotary shaft 21 . In this way, the polishing liquid or electrolyte is simply injected into a reservoir open to the atmosphere, and the equipment for pumping these liquids can therefore be very simple; for example, B A simple submersible pump or the like may also be used. Instead of or in addition to holding abrasive grains in the viscoelastic polishing body 22, free abrasive grains may be mixed into the polishing liquid or electrolyte that is fed through the liquid supply pipe 38, and especially fine particles. It is advantageous to use these free abrasive grains when polishing with viscoelastic polishing body 22.
It is possible to uniformly supply abrasive grains to the entire area. When polishing is performed using only abrasive grains without supplying electric current for electrolysis, the liquid supplied through the supply pipe 38 functions to cool the polishing part, discharge fine powder removed by polishing, etc. Therefore, the desired function can be achieved with a relatively small amount of liquid. The electrolytic current supplied to the electrode tool 20 through the power feeding sliding contact 33 and the sliding contact surface 32 in contact with it is for polishing by electrolysis, with the workpiece as a positive pole and the electrode tool 20 as a negative pole. As shown in FIGS. 1 to 3, the polishing unit 5 having such a configuration has a large number of sliding frames 4 perpendicular to the feeding direction of the workpiece W in a line type continuous feed mirror polishing device. They are arranged in the same direction, and are arranged in multiple directions in the feeding direction of the workpiece W. In addition, each polishing unit 5 presses the viscoelastic polishing body 22 against the workpiece W with a constant small force (for example, several tens of kPa) due to the gravity of the polishing unit itself, and presses the viscoelastic polishing body 22 against the sliding frame 4. It is supported slidably in the vertical direction. If the force of the viscoelastic polishing body is insufficient due to the gravity of the polishing unit 5, the force of a spring may be added. Therefore, in combination with the fact that the polishing body 22 is made of a viscoelastic material, the viscoelastic polishing body 22 can be used not only for workpieces such as a stainless steel plate with a flat surface, but also for a relatively flat surface. It is also possible to imitate a polished object formed by a large precision workpiece having small irregularities or an arrangement of small parts (for example, a watch band). Furthermore, when a large number of polishing units 5 are arranged in parallel as described above, each polishing unit constitutes an independent vibration system, resulting in a complex vibration system as a whole. Since the A-thread is not constituted, it is very advantageous in that the control of the entire device becomes extremely simple. When polishing includes a pressing step, the roughness can be improved very efficiently by arranging the abrasives held by the viscoelastic polishing body 22 in the line direction in order from the roughest to the roughest. This kind of arrangement. As described above, this can only be realized by arranging a large number of polishing units 5 in parallel in multiple rows. The sliding frame 4 to which the polishing unit 5 is attached is supported by rollers 40 provided on the machine frame 2 so as to be able to reciprocate in a direction perpendicular to the conveyance direction of the conveyor device 1, and by the reciprocating mechanism 3, That is, the eccentric wheel 45 driven by the motor 42 via the decelerator 43 and the sliding frame 4 are connected by a connecting rod 46, and are configured to reciprocate under the drive of the motor 42. The reciprocating speed of the sliding frame 4 by the reciprocating mechanism 3 is set so that the reciprocating speed is sufficiently faster than the feeding speed of the workpiece W, for example, about one order of magnitude faster. The conveyor device 1 for conveying the workpiece at a constant speed in the line direction may be not only an endless conveyor as shown in the figure, but also a roller conveyor or other various conveyors. In addition, if the workpiece is a plate, prepare a container-shaped holder that matches the dimensions of the plate, and if the workpiece is a small part, arrange a large number of them. It is also possible to prepare container-shaped pedestals suitable for accommodating the container and to adopt a configuration in which these pedestals are fed at a constant speed. Furthermore, when the workpiece is a coiled material, line feeding may be provided using a winding device for the coiled material without using a conveyor.In the mirror polishing apparatus having the above configuration, When the polishing tool is rotated by the rotary drive machine while supplying the polishing liquid to the liquid reservoir 26 in the tool base 21 in each polishing unit 5, the centrifugal force accompanying the rotation causes the peripheral part of the surface plate of the tool base fi21 to A polishing liquid is supplied from a large number of liquid outlet ports 30 to the surface of the workpiece through a viscoelastic polishing body 22 that allows liquid permeability. In addition, the pressing force of the polishing tool against the surface of the workpiece may be very small, for example, the weight of the polishing unit itself.If the pressing force of the polishing body is reduced in this way, the support mechanism of the workpiece and the The frame 2 does not require great strength, and its configuration can be significantly simplified.
Furthermore, since the number of polishing units arranged can be increased, polishing efficiency can be improved. When performing electrolytic abrasive composite polishing, while supplying an electrolytic solution to the tool 20 through the liquid supply pipe 38, a current of several amperes at a voltage of several to ten-odd volts is applied between the tool 20 and the workpiece W. The tool 20 is rotated by the rotary drive machine 12.
Composite polishing can be done while rotating. When the diameter of the tool 20 is approximately 12 cm,
At the rotational speed of the rotary drive l112 of several tens of Orpm or less, even if the surface of the workpiece having some irregularities is pressed against it, the peripheral portion of the viscoelastic polishing body 22 deforms to follow the shape of the surface of the workpiece, and the surface By fitting it to the surface, it can be mirror polished.

【Effect of the invention】

According to the mirror polishing apparatus of the present invention described in detail above, it is possible to polish an object having a flat surface with a relatively large area, such as a stainless steel regular plate or a coil material, or a large area with relatively small irregularities on the surface. For polishing objects formed by workpieces or arrays of small parts, line-type IS feeding allows extremely efficient complete mirror finishing, with a final finish of 1/100. Roughness improvements can be made to the order of layer Rmax.

[Brief explanation of drawings]

Fig. 1 is a plan view of a line type continuous feed mirror polishing apparatus according to the present invention, Fig. 2 is a front view thereof, Fig. 3 is a side view thereof, Fig. 4 is a front view of the polishing unit, and Fig. 5 is a polishing unit. FIG. 3 is a partially cutaway front view of the tool. 3. Reciprocating mechanism, 5. Polishing unit, 12.
・Rotary drive machine, 14. Rotating shaft, 21. Tool base,
22... Viscoelastic polishing body, 24... Surface plate,
26...Liquid reservoir, 30φ, liquid outlet, W...Workpiece.

Claims (1)

[Claims] 1. The tool base to be attached to the tip of the rotating shaft of the rotary drive machine,
The tool base is constructed by providing a liquid reservoir behind the disk-shaped surface plate to which polishing liquid is supplied, and opening a large number of liquid outlet ports around the surface plate. A large number of polishing units are constructed by attaching a viscoelastic polishing body, which is made of a viscoelastic material capable of holding abrasive grains and whose surface can be deformed to follow the surface of the workpiece. are arranged in a direction perpendicular to the feeding direction of the flat workpiece, and each polishing unit is moved in the pressing direction while pressing the viscoelastic polishing body against the workpiece with a constant force. The polishing unit is movably supported by the polishing unit, and is connected to a reciprocating mechanism that reciprocates the polishing unit in a direction orthogonal to the relative feed direction of the workpiece at a speed sufficiently faster than the feed rate. Line type continuous feed mirror polishing equipment.