JPS62218574A - 化学蒸着装置 - Google Patents
化学蒸着装置Info
- Publication number
- JPS62218574A JPS62218574A JP6073086A JP6073086A JPS62218574A JP S62218574 A JPS62218574 A JP S62218574A JP 6073086 A JP6073086 A JP 6073086A JP 6073086 A JP6073086 A JP 6073086A JP S62218574 A JPS62218574 A JP S62218574A
- Authority
- JP
- Japan
- Prior art keywords
- deposited
- vapor
- reaction
- vaporized
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005229 chemical vapour deposition Methods 0.000 title claims description 13
- 238000000034 method Methods 0.000 title claims description 13
- 238000006243 chemical reaction Methods 0.000 claims abstract description 36
- 239000007789 gas Substances 0.000 claims abstract description 14
- 239000012159 carrier gas Substances 0.000 claims abstract description 13
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 239000010409 thin film Substances 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 12
- 150000002736 metal compounds Chemical class 0.000 claims description 8
- 229910001507 metal halide Inorganic materials 0.000 claims description 6
- 150000005309 metal halides Chemical class 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 6
- 238000009835 boiling Methods 0.000 claims description 3
- 150000002902 organometallic compounds Chemical class 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 10
- 239000002994 raw material Substances 0.000 abstract description 9
- 150000004820 halides Chemical class 0.000 abstract description 6
- 238000000151 deposition Methods 0.000 abstract description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 2
- VCZQFJFZMMALHB-UHFFFAOYSA-N tetraethylsilane Chemical compound CC[Si](CC)(CC)CC VCZQFJFZMMALHB-UHFFFAOYSA-N 0.000 abstract description 2
- 230000008016 vaporization Effects 0.000 abstract 5
- 238000009834 vaporization Methods 0.000 abstract 4
- 229910015221 MoCl5 Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- GICWIDZXWJGTCI-UHFFFAOYSA-I molybdenum pentachloride Chemical compound Cl[Mo](Cl)(Cl)(Cl)Cl GICWIDZXWJGTCI-UHFFFAOYSA-I 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 description 18
- 238000001704 evaporation Methods 0.000 description 18
- 239000012535 impurity Substances 0.000 description 9
- 230000008021 deposition Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910020968 MoSi2 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6073086A JPS62218574A (ja) | 1986-03-20 | 1986-03-20 | 化学蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6073086A JPS62218574A (ja) | 1986-03-20 | 1986-03-20 | 化学蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62218574A true JPS62218574A (ja) | 1987-09-25 |
| JPH0535223B2 JPH0535223B2 (https=) | 1993-05-26 |
Family
ID=13150687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6073086A Granted JPS62218574A (ja) | 1986-03-20 | 1986-03-20 | 化学蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62218574A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2738017A1 (fr) * | 1995-08-25 | 1997-02-28 | M3D | Procede de revetement d'un carbure ou d'un carbonitrure mixte de ti et de zr par depot chimique en phase vapeur (cvd) et dispositif destine a former un revetement ceramique a partir d'au moins deux precurseurs metalliques |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4910590A (https=) * | 1972-05-08 | 1974-01-30 | ||
| JPS61194838A (ja) * | 1985-02-25 | 1986-08-29 | Hitachi Electronics Eng Co Ltd | Ｃｖｄ法による薄膜形成方法 |
-
1986
- 1986-03-20 JP JP6073086A patent/JPS62218574A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4910590A (https=) * | 1972-05-08 | 1974-01-30 | ||
| JPS61194838A (ja) * | 1985-02-25 | 1986-08-29 | Hitachi Electronics Eng Co Ltd | Ｃｖｄ法による薄膜形成方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2738017A1 (fr) * | 1995-08-25 | 1997-02-28 | M3D | Procede de revetement d'un carbure ou d'un carbonitrure mixte de ti et de zr par depot chimique en phase vapeur (cvd) et dispositif destine a former un revetement ceramique a partir d'au moins deux precurseurs metalliques |
| WO1997008360A1 (fr) * | 1995-08-25 | 1997-03-06 | M3D Societe Anonyme | Procede de formation d'un depot metallique ou ceramique |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0535223B2 (https=) | 1993-05-26 |
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