JPH0535223B2 - - Google Patents
Info
- Publication number
- JPH0535223B2 JPH0535223B2 JP61060730A JP6073086A JPH0535223B2 JP H0535223 B2 JPH0535223 B2 JP H0535223B2 JP 61060730 A JP61060730 A JP 61060730A JP 6073086 A JP6073086 A JP 6073086A JP H0535223 B2 JPH0535223 B2 JP H0535223B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- vapor deposition
- deposited
- reaction chamber
- chemical vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6073086A JPS62218574A (ja) | 1986-03-20 | 1986-03-20 | 化学蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6073086A JPS62218574A (ja) | 1986-03-20 | 1986-03-20 | 化学蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62218574A JPS62218574A (ja) | 1987-09-25 |
| JPH0535223B2 true JPH0535223B2 (https=) | 1993-05-26 |
Family
ID=13150687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6073086A Granted JPS62218574A (ja) | 1986-03-20 | 1986-03-20 | 化学蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62218574A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2738017A1 (fr) * | 1995-08-25 | 1997-02-28 | M3D | Procede de revetement d'un carbure ou d'un carbonitrure mixte de ti et de zr par depot chimique en phase vapeur (cvd) et dispositif destine a former un revetement ceramique a partir d'au moins deux precurseurs metalliques |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4910590A (https=) * | 1972-05-08 | 1974-01-30 | ||
| JPS61194838A (ja) * | 1985-02-25 | 1986-08-29 | Hitachi Electronics Eng Co Ltd | Ｃｖｄ法による薄膜形成方法 |
-
1986
- 1986-03-20 JP JP6073086A patent/JPS62218574A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62218574A (ja) | 1987-09-25 |
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