JPS62206501A - 回折格子の製造方法 - Google Patents

回折格子の製造方法

Info

Publication number
JPS62206501A
JPS62206501A JP4850086A JP4850086A JPS62206501A JP S62206501 A JPS62206501 A JP S62206501A JP 4850086 A JP4850086 A JP 4850086A JP 4850086 A JP4850086 A JP 4850086A JP S62206501 A JPS62206501 A JP S62206501A
Authority
JP
Japan
Prior art keywords
film
diffraction grating
region
photoresist
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4850086A
Other languages
English (en)
Japanese (ja)
Other versions
JPH052201B2 (enrdf_load_stackoverflow
Inventor
Shigeyuki Akiba
重幸 秋葉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KDDI Corp
Original Assignee
Kokusai Denshin Denwa KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Denshin Denwa KK filed Critical Kokusai Denshin Denwa KK
Priority to JP4850086A priority Critical patent/JPS62206501A/ja
Priority to US06/882,588 priority patent/US4826291A/en
Priority to GB8617156A priority patent/GB2178192B/en
Publication of JPS62206501A publication Critical patent/JPS62206501A/ja
Publication of JPH052201B2 publication Critical patent/JPH052201B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Integrated Circuits (AREA)
JP4850086A 1985-07-16 1986-03-07 回折格子の製造方法 Granted JPS62206501A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP4850086A JPS62206501A (ja) 1986-03-07 1986-03-07 回折格子の製造方法
US06/882,588 US4826291A (en) 1985-07-16 1986-07-07 Method for manufacturing diffraction grating
GB8617156A GB2178192B (en) 1985-07-16 1986-07-15 Method for manufacturing diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4850086A JPS62206501A (ja) 1986-03-07 1986-03-07 回折格子の製造方法

Publications (2)

Publication Number Publication Date
JPS62206501A true JPS62206501A (ja) 1987-09-11
JPH052201B2 JPH052201B2 (enrdf_load_stackoverflow) 1993-01-12

Family

ID=12805101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4850086A Granted JPS62206501A (ja) 1985-07-16 1986-03-07 回折格子の製造方法

Country Status (1)

Country Link
JP (1) JPS62206501A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH052201B2 (enrdf_load_stackoverflow) 1993-01-12

Similar Documents

Publication Publication Date Title
US6015650A (en) Method for forming micro patterns of semiconductor devices
US4885231A (en) Phase-shifted gratings by selective image reversal of photoresist
EP0513755A2 (en) A method for producing a diffraction grating
US4826291A (en) Method for manufacturing diffraction grating
US5300190A (en) Process of producing diffraction grating
JPS62206501A (ja) 回折格子の製造方法
US5221429A (en) Method of manufacturing phase-shifted diffraction grating
JPS6217702A (ja) 回折格子の製造方法
JP2624351B2 (ja) ホトマスクの製造方法
EP0490320B1 (en) A method for producing a diffraction grating
JPS61138202A (ja) 回折格子の製造方法
JPH0461331B2 (enrdf_load_stackoverflow)
JPS627001A (ja) 回折格子の製造方法
JPH0361901A (ja) λ/4シフト回折格子の製造方法
JPH06250007A (ja) ブレーズド型回折格子の製造方法
JP2527833B2 (ja) 回折格子の製造方法
JPH07198922A (ja) 回折格子の作製方法
JPH0413140A (ja) ホトマスクおよびその製造方法
JPH0374804B2 (enrdf_load_stackoverflow)
KR100190115B1 (ko) 위상 시프트 마스크 및 그 제조방법
JPH0588353A (ja) 露光マスクの製造方法
JPS61189503A (ja) 回折格子の製造方法
JPH05343806A (ja) 位相シフト型回折格子の製造方法
JPS62139503A (ja) 回折格子の製造方法
JPH0812287B2 (ja) グレーティング作製方法