JPS62200724A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS62200724A
JPS62200724A JP61041426A JP4142686A JPS62200724A JP S62200724 A JPS62200724 A JP S62200724A JP 61041426 A JP61041426 A JP 61041426A JP 4142686 A JP4142686 A JP 4142686A JP S62200724 A JPS62200724 A JP S62200724A
Authority
JP
Japan
Prior art keywords
mask
substrate
positioning
exposed
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61041426A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0584664B2 (enrdf_load_stackoverflow
Inventor
Junji Isohata
磯端　純二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61041426A priority Critical patent/JPS62200724A/ja
Publication of JPS62200724A publication Critical patent/JPS62200724A/ja
Publication of JPH0584664B2 publication Critical patent/JPH0584664B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP61041426A 1986-02-28 1986-02-28 投影露光装置 Granted JPS62200724A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61041426A JPS62200724A (ja) 1986-02-28 1986-02-28 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61041426A JPS62200724A (ja) 1986-02-28 1986-02-28 投影露光装置

Publications (2)

Publication Number Publication Date
JPS62200724A true JPS62200724A (ja) 1987-09-04
JPH0584664B2 JPH0584664B2 (enrdf_load_stackoverflow) 1993-12-02

Family

ID=12608033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61041426A Granted JPS62200724A (ja) 1986-02-28 1986-02-28 投影露光装置

Country Status (1)

Country Link
JP (1) JPS62200724A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191493A (ja) * 1988-01-27 1989-08-01 Ushio Inc プリント基板製作の露光方法
US6018384A (en) * 1994-09-07 2000-01-25 Nikon Corporation Projection exposure system
US6525817B1 (en) 1995-02-21 2003-02-25 Nikon Corporation Inspection method and apparatus for projection optical systems

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191493A (ja) * 1988-01-27 1989-08-01 Ushio Inc プリント基板製作の露光方法
US6018384A (en) * 1994-09-07 2000-01-25 Nikon Corporation Projection exposure system
US6236448B1 (en) 1994-09-07 2001-05-22 Nikon Corporation Projection exposure system
US6249336B1 (en) 1994-09-07 2001-06-19 Nikon Corporation Projection exposure system
US6388735B1 (en) 1994-09-07 2002-05-14 Nikon Corporation Projection exposure system
US6525817B1 (en) 1995-02-21 2003-02-25 Nikon Corporation Inspection method and apparatus for projection optical systems
US6850327B2 (en) 1995-02-21 2005-02-01 Nikon Corporation Inspection method and apparatus for projection optical systems

Also Published As

Publication number Publication date
JPH0584664B2 (enrdf_load_stackoverflow) 1993-12-02

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees