JPS62176129A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS62176129A
JPS62176129A JP61017072A JP1707286A JPS62176129A JP S62176129 A JPS62176129 A JP S62176129A JP 61017072 A JP61017072 A JP 61017072A JP 1707286 A JP1707286 A JP 1707286A JP S62176129 A JPS62176129 A JP S62176129A
Authority
JP
Japan
Prior art keywords
light
wafer
detecting means
amount
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61017072A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0546694B2 (enExample
Inventor
Makoto Torigoe
真 鳥越
Terumasa Sakai
酒井　照正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61017072A priority Critical patent/JPS62176129A/ja
Publication of JPS62176129A publication Critical patent/JPS62176129A/ja
Publication of JPH0546694B2 publication Critical patent/JPH0546694B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61017072A 1986-01-29 1986-01-29 露光装置 Granted JPS62176129A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61017072A JPS62176129A (ja) 1986-01-29 1986-01-29 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61017072A JPS62176129A (ja) 1986-01-29 1986-01-29 露光装置

Publications (2)

Publication Number Publication Date
JPS62176129A true JPS62176129A (ja) 1987-08-01
JPH0546694B2 JPH0546694B2 (enExample) 1993-07-14

Family

ID=11933779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61017072A Granted JPS62176129A (ja) 1986-01-29 1986-01-29 露光装置

Country Status (1)

Country Link
JP (1) JPS62176129A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01111321A (ja) * 1987-10-26 1989-04-28 Matsushita Electric Ind Co Ltd エキシマレーザ縮小投影露光方法
US6736928B2 (en) 2001-08-24 2004-05-18 Canon Kabushiki Kaisha Exposure apparatus and semiconductor device manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60169136A (ja) * 1984-02-14 1985-09-02 Canon Inc 露光装置
JPS61111529A (ja) * 1984-11-06 1986-05-29 Canon Inc 露光量制御装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60169136A (ja) * 1984-02-14 1985-09-02 Canon Inc 露光装置
JPS61111529A (ja) * 1984-11-06 1986-05-29 Canon Inc 露光量制御装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01111321A (ja) * 1987-10-26 1989-04-28 Matsushita Electric Ind Co Ltd エキシマレーザ縮小投影露光方法
US6736928B2 (en) 2001-08-24 2004-05-18 Canon Kabushiki Kaisha Exposure apparatus and semiconductor device manufacturing method

Also Published As

Publication number Publication date
JPH0546694B2 (enExample) 1993-07-14

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Legal Events

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