JPS62174930A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS62174930A
JPS62174930A JP61017349A JP1734986A JPS62174930A JP S62174930 A JPS62174930 A JP S62174930A JP 61017349 A JP61017349 A JP 61017349A JP 1734986 A JP1734986 A JP 1734986A JP S62174930 A JPS62174930 A JP S62174930A
Authority
JP
Japan
Prior art keywords
electrode
semiconductor chip
quality
wire
ball
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61017349A
Other languages
English (en)
Inventor
Saneyasu Hirota
弘田 実保
Kazumichi Machida
一道 町田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP61017349A priority Critical patent/JPS62174930A/ja
Priority to DE19863641689 priority patent/DE3641689A1/de
Publication of JPS62174930A publication Critical patent/JPS62174930A/ja
Priority to US07/223,980 priority patent/US5302550A/en
Pending legal-status Critical Current

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    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、半導体装置に関し、特にICやトランジス
タなど、半導体装ノブ上の電極とリードとを金属ワイヤ
を用いて結線して構成される半導体装置に関するもので
ある。
〔従来の技術〕
第4図は従来のこの種の半導体装置におけるワイヤボン
ディング方法を模式的に示したものである。図において
、1は金ワイヤ、2は半導体チップ、3は半導体チップ
2上に形成されたアルミ電極、4は銀めっき等の表面処
理が施された銅合金リード、5はボンディングツールで
あるキャピラリチップである。
従来のワイヤボンディング方法では、金ワイヤ1の先端
をアーク入熱で溶融させ、これを凝固させてボール部1
aを形成し、このボール部1aをアルミ電極3にボール
ボンディングした後(第4図(21)、 (b>参照)
、金ワイヤ1の他端側をリード4にステッチボンディン
グするようにしており(第4図(C1,(dl参照)、
又ワイヤlの接合には主として超音波併用熱圧着方式が
用いられている。
〔発明が解決しようとする問題点〕
以上のように従来のこの種の半導体装置においては、ボ
ンディング用金虜ワイヤとして金ワイヤが使用されてい
るが、この場合コストが高くつくことと、半導体チップ
上のアルミ電極との接合部の長期信転性が低いという欠
点があるため、金に代わる材料及びそのボンディング技
術が種に検討されている。
しかるにここで材料原価低減及び素子の長期信頼性向上
という観点から、金属ワイヤを金から銅に代える場合に
ついて考えると、従来の半導体装置において、銅ワイヤ
をそのままアルミ電極に接合しようとすると、ボンディ
ング性が悪いという問題が生じ、この問題を解消するた
め超音波出力を増大させると、第5図に示されるように
、アルミ電極3aが接合部周囲に排斥されて銅ワイヤ1
0のボールloaが半導体チップ2に当り、電極3及び
半導体チップ2が損傷を受けるおそれがある。
この発明は、以上のような問題点に鑑み、電極及び半導
体チップがt員傷を受けることなく、金属ワイヤと電極
とを良好に接合できる半導体装置を堤供することを目的
としている。
そして本件発明者は、上述の問題点を解消すべく鋭意研
究した結果、次のようなことを見い出した。
■ まず条件を変えて電極の膜質をtl!質し、これに
銅ワイヤをボールボンディングしたところ、調質条件に
よっては低い超音波出力でもって良好な接合状態が得ら
れた。従って調質条件をうまく設定してやれば、電極及
び半導体チップに損傷を与えることなく、銅ワイヤと電
極とを良好に接合できるものと考えられるが、この場合
この種の半導体装置における大量生産性を考慮すると、
調質条件を評価してボンディング性に対する電極の膜質
を保証してやる必要がある。
■ またボンディング用キャビラリチンプを用いて超音
波を印加しなから純銅ボールを電極に押圧し、その際の
電極の変形量、即ちくぼみ深さと接合状態との関係につ
いて調べたところ、両者の間には強い相関関係が見られ
、直径70〜75μmの純銅ボールを、温度350℃、
荷重1508f、超音波振動の周波数60K)lz、片
振幅0.07〜0.14μmの条件で加圧した際に、く
ぼみ深さが0.1〜0.6μmの範囲となるような膜質
の電極を用いた時に低い超音波出力でもって良好な接合
状態が得られた(第6図参照)。従って直径70〜75
μmの純銅ボールを、上述の条件で加圧し、くぼみ深さ
が0.1〜0.6μrnの範囲内にあるか否かを判断す
ることによって上述の調質条件の評価を行なえるものと
考えられる。
〔問題点を解決するための手段〕
そこでこの発明に係る半導体装置は、半導体チップ上の
電極として、直径70〜75μmの純銅ボールを、温度
350°C1荷重150gf、超音波振動の周波数60
KHz、片振幅0.07〜0.14.17 mの条件で
加圧した時にくぼみ深さが0.1〜0.6 μmの範囲
になるように調質した薄膜を用いるようにしたものであ
る。
〔作用〕
この発明においては、直径70〜75μmの純銅ボール
を、温度350℃、荷重150gf、@音波振動の周波
数60K)lz、片振幅0.07〜0.14 u mの
条件で加圧した時のくぼみ深さが0.1〜0.6μmの
範囲になるように調質した電極を用いるようにしたこと
から、電極は良好な接合状態の得られる膜質に調質され
ており、低い超音波出力でもって良好な接合状態が安定
に得られる。
〔実施例〕
以下、本発明の実施例を図について説明する。
第1図ないし第3図は本発明の一実施例による半導体装
置を示す。図において、第4図及び第5図と同一符号は
同図と同一のものを示し、10は銅ワイヤ、10aはボ
ール、13は半導体チップ2上の電極で、該電極13は
直径70〜75μmの純銅ボール14を、温度350°
C3荷重1508f、超音波振動の周波数6011z、
片振幅0.07〜0.14μmの条件で加圧した時に変
形量、即ちくぼみ深さDが0.1〜0.6μmの範囲内
になるように調質した薄膜を用いて形成されている。
次に作用効果について説明する。
本装置を製造する場合、まず条件を種々変えて半導体チ
ップ2上の電極13を調質し、これに直径70〜75μ
mの隼屯銅ポール14をキャピラリチップ5を用いて、
温度350°C1荷重150gf 、超音波振動の周波
数60KHz、片振幅0.0T〜0114.tznの条
件で押圧しく第3図(al参照)、そのときの電極13
の変形量、即ちくぼみ深さDを測定しく第3図(bl参
照)、このくぼみ深さDが0.1〜0.6μmの範囲内
にあるか否かの判断から、ボンディング性に対する改質
の評価を行ない、調質条件を設定する。
こうして調質条件が設定されると、半導体チップ2上の
電極13を上記設定調質条件でもって調質し、後は従来
と同様のワイヤボンディング方法によって、即ちキャピ
ラリチップ5を用いかつ超音波振動によって半導体チッ
プ2上の電極13に銅ワイヤ10のボール10aをボー
ルボンディングするとともに、リード4に銅ワイヤ10
の他端側をステッチボンディングする。
以上のような本実施例の装置では、半導体チップ上の電
極を所定の条件でもって調質するようにしたので、低い
超音波出力によって銅ワイヤを電極に良好かつ安定に接
合でき、その結果電極が接合部周囲に排斥されず、電極
及び半導体チップの損傷を防止でき、これにより現在ワ
イヤボンディングに用いられている金ワイヤに代えて、
低廉な銅ワイヤの使用が可能となり、大幅な材料原価低
減及び接合部の長期信頼性の向上を実現できる。
なお上記実施例では金属ワイヤとして銅ワイヤを用いた
場合について説明したが、この金属ワイヤは銅合金ワイ
ヤであってもよい。
〔発明の効果〕
以上のように本発明によれば、半導体チップ上の電極と
リードとを金属ワイヤを用いて結線してなる半導体装置
において、半導体チップ上の電極として直径70〜75
μmの純銅ボールを、温度350℃、荷重150gf、
超音波振動の周波数60にHz、片振幅0.07〜0.
14μmの条件で加圧した時にくぼみ深さが0.1〜0
.6μmの範囲になるように調質した薄膜を用いるよう
にしたので、電極及び半導体チップが損傷を受けること
なく、金属ワイヤと電極とを良好に接合でき、金ワイヤ
に代えて低廉な金属ワイヤの使用が可能になるという効
果がある。
【図面の簡単な説明】
第1図は本発明の一実施例による半導体装置の構成図、
第2図は上記装置の要部構成図、第3図ta)、 tb
)はともに膜質の評価方法を説明するための図、第4図
(&)〜(d)は各々ワイヤボンディング方法を示す模
式図、第5図及び第6図は各々発明が解決しようとする
問題点を説明するための図である。 2・・・半導体チップ、4・・・リード、10・・・銅
ワ1”ヤ、LOa・・・ボール、13・・・電極、14
・・・純銅ボール。 なお図中同一符号は同−又は相当部分を示す。

Claims (2)

    【特許請求の範囲】
  1. (1)半導体チップ上の電極とリードとを金属ワイヤを
    用いて結線して構成される半導体装置において、 上記電極として、直径70〜75μmの純銅ボールを温
    度350℃、荷重150gf、超音波振動の周波数60
    KHz、片振幅0.07〜0.14μmの条件で加圧し
    た時にくぼみ深さが0.1〜0.6μmの範囲になるよ
    うに調質した薄膜を用いることを特徴とする半導体装置
  2. (2)上記金属ワイヤが、銅ワイヤ又は銅合金ワイヤで
    あることを特徴とする特許請求の範囲第1項記載の半導
    体装置。
JP61017349A 1985-12-24 1986-01-28 半導体装置 Pending JPS62174930A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP61017349A JPS62174930A (ja) 1986-01-28 1986-01-28 半導体装置
DE19863641689 DE3641689A1 (de) 1985-12-24 1986-12-06 Verfahren zur herstellung eines halbleiterbauelements und eines darin verwendeten halbleiterchips
US07/223,980 US5302550A (en) 1985-12-24 1988-04-13 Method of bonding a microelectronic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61017349A JPS62174930A (ja) 1986-01-28 1986-01-28 半導体装置

Publications (1)

Publication Number Publication Date
JPS62174930A true JPS62174930A (ja) 1987-07-31

Family

ID=11941567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61017349A Pending JPS62174930A (ja) 1985-12-24 1986-01-28 半導体装置

Country Status (1)

Country Link
JP (1) JPS62174930A (ja)

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