JPS6216502B2 - - Google Patents
Info
- Publication number
- JPS6216502B2 JPS6216502B2 JP53164367A JP16436778A JPS6216502B2 JP S6216502 B2 JPS6216502 B2 JP S6216502B2 JP 53164367 A JP53164367 A JP 53164367A JP 16436778 A JP16436778 A JP 16436778A JP S6216502 B2 JPS6216502 B2 JP S6216502B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- lens axis
- lens
- coil
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 19
- 238000002347 injection Methods 0.000 claims description 14
- 239000007924 injection Substances 0.000 claims description 14
- 230000004075 alteration Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910000737 Duralumin Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1475—Scanning means magnetic
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Electron Beam Exposure (AREA)
- Lenses (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7800049A FR2413776A1 (fr) | 1978-01-03 | 1978-01-03 | Objectif d'optique electronique |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54101276A JPS54101276A (en) | 1979-08-09 |
| JPS6216502B2 true JPS6216502B2 (US20100012521A1-20100121-C00001.png) | 1987-04-13 |
Family
ID=9203081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16436778A Granted JPS54101276A (en) | 1978-01-03 | 1978-12-31 | Electrooptical objective lens and microlithoraphic system |
Country Status (5)
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5738544A (en) * | 1980-08-19 | 1982-03-03 | Matsushita Electronics Corp | Electromagnetic deflection system picture tube system equipment |
| JPS5788659A (en) * | 1980-11-21 | 1982-06-02 | Jeol Ltd | Electron ray device |
| JPS57206173A (en) * | 1981-06-15 | 1982-12-17 | Nippon Telegr & Teleph Corp <Ntt> | Focusing deflecting device for charged corpuscule beam |
| NL8301712A (nl) * | 1983-05-13 | 1984-12-03 | Philips Nv | Kleurenbeeldbuis. |
| US4544846A (en) * | 1983-06-28 | 1985-10-01 | International Business Machines Corporation | Variable axis immersion lens electron beam projection system |
| NL8801208A (nl) * | 1988-05-09 | 1989-12-01 | Philips Nv | Geladen deeltjes bundel apparaat. |
| DE69633505T2 (de) * | 1996-07-25 | 2005-03-03 | Advantest Corp. | Ablenksystem |
| FR2837931B1 (fr) * | 2002-03-29 | 2004-12-10 | Cameca | Dispositif de mesure de l'emission de rayons x produite par un objet soumis a un faisceau d'electrons |
| US8642959B2 (en) | 2007-10-29 | 2014-02-04 | Micron Technology, Inc. | Method and system of performing three-dimensional imaging using an electron microscope |
| US10008360B2 (en) * | 2015-01-26 | 2018-06-26 | Hermes Microvision Inc. | Objective lens system for fast scanning large FOV |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5022568A (US20100012521A1-20100121-C00001.png) * | 1973-06-26 | 1975-03-11 | ||
| JPS5169327A (en) * | 1974-12-03 | 1976-06-15 | Canon Kk | Ekishoku dosochi |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1325540A (en) * | 1969-10-10 | 1973-08-01 | Texas Instruments Ltd | Electron beam apparatus |
| JPS4929089B1 (US20100012521A1-20100121-C00001.png) * | 1970-05-13 | 1974-08-01 | ||
| US3801792A (en) * | 1973-05-23 | 1974-04-02 | Bell Telephone Labor Inc | Electron beam apparatus |
| JPS5944743B2 (ja) * | 1974-04-16 | 1984-10-31 | 日本電子株式会社 | 走査電子顕微鏡等用照射電子レンズ系 |
| US4162403A (en) * | 1978-07-26 | 1979-07-24 | Advanced Metals Research Corp. | Method and means for compensating for charge carrier beam astigmatism |
-
1978
- 1978-01-03 FR FR7800049A patent/FR2413776A1/fr active Granted
- 1978-12-29 DE DE19782856782 patent/DE2856782A1/de active Granted
- 1978-12-31 JP JP16436778A patent/JPS54101276A/ja active Granted
-
1979
- 1979-01-02 GB GB7968A patent/GB2012105B/en not_active Expired
-
1980
- 1980-05-30 US US06/154,911 patent/US4330709A/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5022568A (US20100012521A1-20100121-C00001.png) * | 1973-06-26 | 1975-03-11 | ||
| JPS5169327A (en) * | 1974-12-03 | 1976-06-15 | Canon Kk | Ekishoku dosochi |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2856782A1 (de) | 1979-07-12 |
| US4330709A (en) | 1982-05-18 |
| DE2856782C2 (US20100012521A1-20100121-C00001.png) | 1991-03-07 |
| JPS54101276A (en) | 1979-08-09 |
| FR2413776B1 (US20100012521A1-20100121-C00001.png) | 1980-09-19 |
| GB2012105B (en) | 1982-09-15 |
| GB2012105A (en) | 1979-07-18 |
| FR2413776A1 (fr) | 1979-07-27 |
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