JPS54101276A - Electrooptical objective lens and microlithoraphic system - Google Patents

Electrooptical objective lens and microlithoraphic system

Info

Publication number
JPS54101276A
JPS54101276A JP16436778A JP16436778A JPS54101276A JP S54101276 A JPS54101276 A JP S54101276A JP 16436778 A JP16436778 A JP 16436778A JP 16436778 A JP16436778 A JP 16436778A JP S54101276 A JPS54101276 A JP S54101276A
Authority
JP
Japan
Prior art keywords
microlithoraphic
electrooptical
objective lens
objective
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16436778A
Other languages
English (en)
Other versions
JPS6216502B2 (ja
Inventor
Dou Shiyanbo Emaniyueru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of JPS54101276A publication Critical patent/JPS54101276A/ja
Publication of JPS6216502B2 publication Critical patent/JPS6216502B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Electron Beam Exposure (AREA)
  • Lenses (AREA)
JP16436778A 1978-01-03 1978-12-31 Electrooptical objective lens and microlithoraphic system Granted JPS54101276A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7800049A FR2413776A1 (fr) 1978-01-03 1978-01-03 Objectif d'optique electronique

Publications (2)

Publication Number Publication Date
JPS54101276A true JPS54101276A (en) 1979-08-09
JPS6216502B2 JPS6216502B2 (ja) 1987-04-13

Family

ID=9203081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16436778A Granted JPS54101276A (en) 1978-01-03 1978-12-31 Electrooptical objective lens and microlithoraphic system

Country Status (5)

Country Link
US (1) US4330709A (ja)
JP (1) JPS54101276A (ja)
DE (1) DE2856782A1 (ja)
FR (1) FR2413776A1 (ja)
GB (1) GB2012105B (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5738544A (en) * 1980-08-19 1982-03-03 Matsushita Electronics Corp Electromagnetic deflection system picture tube system equipment
JPS5788659A (en) * 1980-11-21 1982-06-02 Jeol Ltd Electron ray device
JPS57206173A (en) * 1981-06-15 1982-12-17 Nippon Telegr & Teleph Corp <Ntt> Focusing deflecting device for charged corpuscule beam
NL8301712A (nl) * 1983-05-13 1984-12-03 Philips Nv Kleurenbeeldbuis.
US4544846A (en) * 1983-06-28 1985-10-01 International Business Machines Corporation Variable axis immersion lens electron beam projection system
NL8801208A (nl) * 1988-05-09 1989-12-01 Philips Nv Geladen deeltjes bundel apparaat.
EP0821392B1 (en) * 1996-07-25 2004-09-29 Advantest Corporation Deflection system
FR2837931B1 (fr) * 2002-03-29 2004-12-10 Cameca Dispositif de mesure de l'emission de rayons x produite par un objet soumis a un faisceau d'electrons
US8642959B2 (en) 2007-10-29 2014-02-04 Micron Technology, Inc. Method and system of performing three-dimensional imaging using an electron microscope
US10008360B2 (en) * 2015-01-26 2018-06-26 Hermes Microvision Inc. Objective lens system for fast scanning large FOV

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5022568A (ja) * 1973-06-26 1975-03-11
JPS5169327A (en) * 1974-12-03 1976-06-15 Canon Kk Ekishoku dosochi

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1325540A (en) * 1969-10-10 1973-08-01 Texas Instruments Ltd Electron beam apparatus
JPS4929089B1 (ja) * 1970-05-13 1974-08-01
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5944743B2 (ja) * 1974-04-16 1984-10-31 日本電子株式会社 走査電子顕微鏡等用照射電子レンズ系
US4162403A (en) * 1978-07-26 1979-07-24 Advanced Metals Research Corp. Method and means for compensating for charge carrier beam astigmatism

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5022568A (ja) * 1973-06-26 1975-03-11
JPS5169327A (en) * 1974-12-03 1976-06-15 Canon Kk Ekishoku dosochi

Also Published As

Publication number Publication date
DE2856782C2 (ja) 1991-03-07
FR2413776B1 (ja) 1980-09-19
GB2012105A (en) 1979-07-18
DE2856782A1 (de) 1979-07-12
FR2413776A1 (fr) 1979-07-27
GB2012105B (en) 1982-09-15
US4330709A (en) 1982-05-18
JPS6216502B2 (ja) 1987-04-13

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