JPS62156505A - アライメント方法 - Google Patents

アライメント方法

Info

Publication number
JPS62156505A
JPS62156505A JP61222701A JP22270186A JPS62156505A JP S62156505 A JPS62156505 A JP S62156505A JP 61222701 A JP61222701 A JP 61222701A JP 22270186 A JP22270186 A JP 22270186A JP S62156505 A JPS62156505 A JP S62156505A
Authority
JP
Japan
Prior art keywords
wafer
light
alignment
alignment mark
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61222701A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6410761B2 (enrdf_load_stackoverflow
Inventor
Akiyoshi Suzuki
章義 鈴木
Ryozo Hiraga
平賀　亮三
Ichiro Kano
一郎 加納
Hideki Yoshinari
吉成　秀樹
Masao Totsuka
戸塚　正雄
Yuzo Kato
雄三 加藤
Yasuo Ogino
荻野　泰男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61222701A priority Critical patent/JPS62156505A/ja
Publication of JPS62156505A publication Critical patent/JPS62156505A/ja
Publication of JPS6410761B2 publication Critical patent/JPS6410761B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61222701A 1986-09-20 1986-09-20 アライメント方法 Granted JPS62156505A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61222701A JPS62156505A (ja) 1986-09-20 1986-09-20 アライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61222701A JPS62156505A (ja) 1986-09-20 1986-09-20 アライメント方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2630477A Division JPS53111280A (en) 1977-03-10 1977-03-10 Mask or wafer for production of semiconductor elements and device for aligning these

Publications (2)

Publication Number Publication Date
JPS62156505A true JPS62156505A (ja) 1987-07-11
JPS6410761B2 JPS6410761B2 (enrdf_load_stackoverflow) 1989-02-22

Family

ID=16786555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61222701A Granted JPS62156505A (ja) 1986-09-20 1986-09-20 アライメント方法

Country Status (1)

Country Link
JP (1) JPS62156505A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008033186A (ja) * 2006-07-31 2008-02-14 Optrex Corp マザー基板の切断方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3404134B2 (ja) * 1994-06-21 2003-05-06 株式会社ニュークリエイション 検査装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607764A (ja) * 1983-06-13 1985-01-16 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン 半導体装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607764A (ja) * 1983-06-13 1985-01-16 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン 半導体装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008033186A (ja) * 2006-07-31 2008-02-14 Optrex Corp マザー基板の切断方法

Also Published As

Publication number Publication date
JPS6410761B2 (enrdf_load_stackoverflow) 1989-02-22

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