JPS62150352A - Glass mask - Google Patents

Glass mask

Info

Publication number
JPS62150352A
JPS62150352A JP60290726A JP29072685A JPS62150352A JP S62150352 A JPS62150352 A JP S62150352A JP 60290726 A JP60290726 A JP 60290726A JP 29072685 A JP29072685 A JP 29072685A JP S62150352 A JPS62150352 A JP S62150352A
Authority
JP
Japan
Prior art keywords
glass mask
contact
sample
pattern
remains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60290726A
Other languages
Japanese (ja)
Inventor
Mamoru Kanazawa
金澤　守
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60290726A priority Critical patent/JPS62150352A/en
Publication of JPS62150352A publication Critical patent/JPS62150352A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Abstract

PURPOSE:To realize a fine pattern by a contact exposing method by etching the surface of a glass mask except in a light shield pattern to desired depth and forming recess parts. CONSTITUTION:Recess parts 3 of about 1mum which match themselves with a light shield film 2 in the specific pattern and are inverted are provided on a glass mask substrate 1. Gas such as air even if remains between the glass mask 1 and a sample 4 is discharged, so when the sample 4 and glass mask 1 are placed in a vacuum state while brought into contact with each other, no air remains and gas produced during exposure never remains. Thus, the degree of contact is improved to realize the fine pattern.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、密着露光方式により微細なパターンを形成す
るに有用なガラスマスクに関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a glass mask useful for forming fine patterns by a contact exposure method.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

密着露光方式によるパターン形成方法では、ガラスマス
クとウェファを密着させて露光する。このとき、ガラス
マスクとウェファの間に空気層が残留したり、露光時に
生成したＮ２などのガスが滞留し、密着度を損ねる原因
となっていた。密着度が悪くなると微細なパターン形成
を行なうことは困難となり、滞留したガスを排出するこ
とが必要となる。改善する手法として、試料基板のスク
ライプライン部に溝を設ける方法（特開昭５４−１１５
８２４）が示されているが、光機能素子を集積した素子
などでは１基板１素子となる為、この方法は適用できな
い。In a pattern forming method using a contact exposure method, a glass mask and a wafer are exposed in close contact with each other. At this time, an air layer remains between the glass mask and the wafer, and gases such as N2 generated during exposure remain, causing a loss of adhesion. If the degree of adhesion deteriorates, it becomes difficult to form a fine pattern, and it becomes necessary to discharge the stagnant gas. As an improvement method, a method of forming grooves in the scribe line part of the sample substrate (Japanese Patent Application Laid-Open No. 115-1983)
824), however, this method cannot be applied to devices in which optical functional devices are integrated, because one device is required on one substrate.

更にガラスマスクに溝部を設ける事も考えられるが、微
細パターン部に溝部を接せしめる為には精細な位１合わ
せが必要であり、工程が複雑になシネ具合である。Furthermore, it is conceivable to provide grooves in the glass mask, but fine alignment is required to bring the grooves into contact with the fine pattern, making the process complicated and cine-like.

〔発明の目的〕[Purpose of the invention]

本発明は上述した如く、従来のガラスマスクの欠点に鑑
み、なされたものであり、密着蕗光法て於て微細パター
ンを実現する事のできるガラスマスクを提供することを
目的とする。As mentioned above, the present invention has been made in view of the drawbacks of conventional glass masks, and an object of the present invention is to provide a glass mask that can realize fine patterns using a contact photolithography method.

〔発明の概要〕[Summary of the invention]

本発明は、所定の遮光膜、様ヲ配置したガラスマスクに
於て、遮光模様以外のガラスマスク表面全所望の深さ蝕
刻除去し、凹部とすることによυ。In the present invention, in a glass mask in which a predetermined light-shielding film is arranged in various ways, the entire surface of the glass mask other than the light-shielding pattern is etched and removed to a desired depth to form concave portions.

上記目的を達するものである。This aims to achieve the above objectives.

〔発明の効果〕〔Effect of the invention〕

本発明に依れば、遮光模様以外のガラスマスり表面を凹
部とする為、試料基板とガラスマスクを密着させその全
体を真空にした時、空気が残留することはなく、また％
罐光時発生のガスも滞留することはなく、従って、密着
度を向上させることができ、微細パターンの実現を可能
ならしむる。According to the present invention, since the surface of the glass mask other than the light-shielding pattern is made into a concave portion, when the sample substrate and the glass mask are brought into close contact with each other and the entire surface is evacuated, no air remains.
The gas generated during canning does not remain, and therefore the degree of adhesion can be improved, making it possible to realize fine patterns.

また、ガラスマスクにガス排出用凹部がある為。Also, the glass mask has a recess for gas exhaust.

マスクと試料を密着させる複雑な機構を要しない。No complicated mechanism for bringing the mask and sample into close contact is required.

〔発明の実施例〕[Embodiments of the invention]

以下に図面を参照して本発明の詳細な説明する。第１図
に示す如く、ガラスマスク基板（１）上に、所定模様の
遮光膜（２）と自己整合的に且つ反転した１μｍ程度の
凹部（３）を設ける。第２図に被露光試料（４）と本発
明によるガラスマスク（１）全密着した状態を示す。ガ
ラスマスク（１）、試料（４）間に空気等のガスが残留
しても凹部（３）を介して排出されるので。The present invention will be described in detail below with reference to the drawings. As shown in FIG. 1, a recess (3) of about 1 μm is provided on a glass mask substrate (1) in a predetermined pattern in self-alignment with the light-shielding film (2) and inverted. FIG. 2 shows a state in which the sample to be exposed (4) and the glass mask (1) according to the present invention are completely in close contact with each other. Even if gas such as air remains between the glass mask (1) and the sample (4), it will be exhausted through the recess (3).

良好な密着状態を実現することができ、微細なパターン
を得ることができる。Good adhesion can be achieved and a fine pattern can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本発明のガラスマスクの断面図。 第２図は試料とマスクを密着した状態の要部断面図を示
す。 １・・・ガラスマスク基板　　　２・・・遮光膜３・・
・凹部　　　　　　　　　４・・・試料代理人　弁理士
　則　近　憲　佑 同　　竹　花　喜久男FIG. 1 is a sectional view of the glass mask of the present invention. FIG. 2 shows a sectional view of the main part in a state where the sample and mask are in close contact with each other. 1... Glass mask substrate 2... Light shielding film 3...
・Concavity 4...Sample agent Patent attorney Nori Chika Ken Yudo Kikuo Takehana

Claims (1)

【特許請求の範囲】[Claims] 基板上に所定の遮光模様を配置し、前記所定の遮光模様
以外の領域の前記基板表面部を所望の深さの凹部にした
ことを特徴とするガラスマスク。A glass mask characterized in that a predetermined light-shielding pattern is arranged on a substrate, and a surface portion of the substrate in an area other than the predetermined light-shielding pattern is formed into a recessed portion of a desired depth.
JP60290726A 1985-12-25 1985-12-25 Glass mask Pending JPS62150352A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60290726A JPS62150352A (en) 1985-12-25 1985-12-25 Glass mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60290726A JPS62150352A (en) 1985-12-25 1985-12-25 Glass mask

Publications (1)

Publication Number Publication Date
JPS62150352A true JPS62150352A (en) 1987-07-04

Family

ID=17759728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60290726A Pending JPS62150352A (en) 1985-12-25 1985-12-25 Glass mask

Country Status (1)

Country Link
JP (1) JPS62150352A (en)

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