JPS62150251A - Data base type photomask inspecting device - Google Patents
Data base type photomask inspecting deviceInfo
- Publication number
- JPS62150251A JPS62150251A JP60295105A JP29510585A JPS62150251A JP S62150251 A JPS62150251 A JP S62150251A JP 60295105 A JP60295105 A JP 60295105A JP 29510585 A JP29510585 A JP 29510585A JP S62150251 A JPS62150251 A JP S62150251A
- Authority
- JP
- Japan
- Prior art keywords
- inspection
- data
- data base
- photomask
- computer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明に、半導体集積回路の製造に使用するフォトマス
クの検査装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an inspection apparatus for photomasks used in the manufacture of semiconductor integrated circuits.
概してフォトマスク検査装置には次の工うなものがある
。In general, photomask inspection equipment has the following features.
げ）フォトマスクの欠陥を検査する装置幹）フォトマス
クのバタン素子の寸法を検査する装置
（ハ）フォトマスク間の重ね合わせ精度を検査する装置
に）フォトマスクの名称や製造ＮＯＩ検査する装置〔従
来分野〕
従来、フォトマスク検査装置に、メカニカル−スイッチ
やキーボードにニジ検査に必要となる稀々のデータを設
定し、検査終了後、そのデータを印字したり、磁気媒体
に出力したりしていた。g) Equipment for inspecting defects in photomasks Main) Equipment for inspecting the dimensions of the button elements of photomasks (c) Equipment for inspecting overlay accuracy between photomasks) Equipment for inspecting photomask names and manufacturing NOI [ Conventional field] Traditionally, photomask inspection equipment has been equipped with mechanical switches and keyboards to set rare data necessary for inspection, and after the inspection is completed, the data is printed or output to magnetic media. Ta.
次に得られた検査データを解析する場合は印字されたも
の全集計したり磁気媒体を計算機に入力してデータ処理
上していた。Next, when analyzing the obtained inspection data, all printed data must be totaled or the magnetic media must be input into a computer for data processing.
この工うに従来の検査におけるデータの流れ。This process involves the flow of data in conventional inspection.
取扱いＫｉ、個々の工程単位において、人手？介す、入
力・出力を伴うので間違い易く、また検査に必要なデー
タと、検査の結果、得られたデータを統合的に取扱って
いないため、データ解析において、同じく人手を介す要
素が多くなり、データ解析に多大なる時間を要するとい
う欠点があった。Handling Ki, manual labor in each process unit? It is easy to make mistakes because it involves input and output through the computer, and because the data required for the test and the data obtained as a result of the test are not handled in an integrated manner, there are many elements that require human intervention in data analysis. However, the disadvantage is that data analysis requires a large amount of time.
本発明の目的に、フォトマスクの検査に必要なデータと
検査の結果、得られたデータを統合的にデータベースと
して取扱う、ソフトウェアを有したフォトマスク検査装
置を提供するものである。An object of the present invention is to provide a photomask inspection apparatus having software that handles data necessary for photomask inspection and data obtained as a result of the inspection in an integrated manner as a database.
本発明の構ＩＲは実施例の第１図に示すように大きく分
けて検査系とデータベース系からなる。As shown in FIG. 1 of the embodiment, the IR structure of the present invention is broadly divided into an inspection system and a database system.
検査系はコントローラ１．検査機２．ＶＤＴ（ビデオデ
ィスプレイターミナル）３からなり、データベース系は
計算機４．設計・仕様データベース５、検査データベー
ス６、ｖＩＪＴ７．プリンタ８工りなっている。The inspection system is controller 1. Inspection machine 2. It consists of VDT (Video Display Terminal) 3, and the database system is a computer 4. Design/specification database 5, inspection database 6, vIJT7. There are 8 printers.
従来技術の場合は、検査系のみで使用されたり、または
第２囚のように検査系にデータ保存用の磁気媒体１１や
プリンタ１２を使用したｖ７ｃｒ！ｔ、が使用されてい
た。In the case of the conventional technology, v7cr! is used only in the inspection system, or as in the case of the second prisoner, the magnetic medium 11 for data storage and the printer 12 are used in the inspection system. t was used.
本発明の装置でフォトマスクの検査ｔする際は。 When inspecting a photomask using the apparatus of the present invention.
第１図において、ＶＤＴ３でデータベースのキーとなる
情報を指定すればコントローラｌ、侶号線Ｐを通り計算
機４のソフトウェアにエリ、検査に必要なデータを、設
計・仕様データベース５から読出し、信号線Ｐを通シ、
コントローラ１に設定される。In Fig. 1, when the VDT 3 specifies the key information of the database, the data necessary for inspection is read out from the design/specification database 5, passed through the controller 1 and the signal line P, and sent to the computer 4 software. Through,
Set to controller 1.
検査機２によるフォトマスクの検査が終了すると、検査
データはコントローラ１．信号線Ｐｉ通クシ計算機のソ
フトウェアに工や、検査データベース６に書込まれる。When the inspection of the photomask by the inspection machine 2 is completed, the inspection data is transferred to the controller 1. The signal line Pi passes through the computer software and is written into the inspection database 6.
検査データが検査データベース６に蓄積しであるので、
データ解析を行なう場合は、ＶＤＴ７より、計算機４に
あるソフトウェアを指定することにより検査データの集
計、グラフ化１表作成、製品履歴一覧等の処理結果ｔ、
ＶＬ）Ｔ７やプリンタ８に出力することができる。Since the test data is accumulated in the test database 6,
When performing data analysis, by specifying the software in the computer 4 from the VDT 7, the processing results such as aggregation of inspection data, creation of a graph table, product history list, etc.
VL) It is possible to output to T7 or printer 8.
本発明は、フォトマスクの検査に必要となる。 The present invention is necessary for inspecting photomasks.
設計番仕様データと検査にニジ得られた検査データを統
合的にデータベース化し、さらに検査データを活用する
ソフトウェアをもった検査装置を提供するものである。This system provides an inspection device that integrates design number specification data and inspection data obtained during inspection into a database, and has software that utilizes the inspection data.
本発明の装置によれば、従来の装置に要した検査毎に人
手による種々の設計書仕様データの設定が不要になるば
かりか、間違った設定が避けられ検査の信頼性が向上し
、かつ省力化、迅速化につながる。The device of the present invention not only eliminates the need to manually set various design specification data for each inspection, which was required with conventional devices, but also avoids incorrect settings, improves inspection reliability, and saves labor. This leads to speeding up and speeding up the process.
従来、データの収集、集計、整理、処理に何段階も人手
勿介さなければならなかったデータ解析も検査データベ
ースと計算機４のソフトウェアを使用することにより、
必要なときに必要なデータ解析が迅速かつ正確に行なう
ことができる。Data analysis, which conventionally required manual intervention in multiple stages of data collection, aggregation, organization, and processing, can now be done by using the inspection database and computer 4 software.
Necessary data analysis can be performed quickly and accurately when necessary.
本発明の装置ヲ活用することに！＃）、７オトマスク検
査の信頼性が同上し、検査業務、検査データ解析の迅速
化を促すことができる。ひいては、フォトマスクの品質
管理、品質保証の向上に寄与することになる。さらに本
発明の装置は、データベース系の計算機４に複数台の検
査系を連結して検査装置として検査系の規模拡大を図る
こともできるし、計算機９と他の計算機を連結し、その
計算機のもつデータベースやソフトウェアを応用すると
いう検査装置としてデータベース系の規模拡大を図るこ
ともできる。I decided to utilize the device of the present invention! #), 7 The reliability of the Otomask test is the same as above, and it is possible to speed up inspection work and analysis of test data. In turn, this will contribute to improving the quality control and quality assurance of photomasks. Furthermore, the device of the present invention can be used as an inspection device to expand the scale of the inspection system by connecting a plurality of inspection systems to the database computer 4, or by connecting the computer 9 to another computer to increase the scale of the inspection system. It is also possible to expand the scale of the database system as an inspection device by applying the existing database and software.
第１ｒｌ！ＪＨ本発明のデータベース型フォトマスク検
査装置の一実施例の構成を示す。第２囚は従来技術にお
けるフォトマスク検査装置の構成を示す。
図中の英数字は、１・・・・・・コントローラ、２・・
・・・・検査機、３．７・・・・・・ＶＤＴ、４・・・
・・・計算機、５・・・・・・設計・仕様データベース
、６・・・・・・検査データベース、８．１２・・・・
・・プリンタ、１１・・・・・・磁気媒体、Ｐ・・・・
・・信号線金示す。
＼、−・1st rl! JH The configuration of an embodiment of the database type photomask inspection apparatus of the present invention is shown. The second column shows the configuration of a conventional photomask inspection device. The alphanumeric characters in the diagram are 1...controller, 2...
...Inspection machine, 3.7...VDT, 4...
... Computer, 5 ... Design and specification database, 6 ... Inspection database, 8.12 ...
...Printer, 11...Magnetic medium, P...
...Signal wire is shown. \、-・
Claims (3)
ォトマスクの検査装置。(1) A photomask inspection device that has an inspection system and a database system independently.
を行なう特許請求の範囲第（１）項記載のフォトマスク
検査装置。(2) The photomask inspection apparatus according to claim (1), wherein data is exchanged between the inspection and the database system.
アを有する特許請求の範囲第（１）項記載のフォトマス
ク検査装置。(3) A photomask inspection apparatus according to claim (1), which includes software for constructing and processing an inspection database.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60295105A JPS62150251A (en) | 1985-12-24 | 1985-12-24 | Data base type photomask inspecting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60295105A JPS62150251A (en) | 1985-12-24 | 1985-12-24 | Data base type photomask inspecting device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62150251A true JPS62150251A (en) | 1987-07-04 |
Family
ID=17816359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60295105A Pending JPS62150251A (en) | 1985-12-24 | 1985-12-24 | Data base type photomask inspecting device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62150251A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997035337A1 (en) * | 1996-03-19 | 1997-09-25 | Hitachi, Ltd. | Process control system |
| KR100526648B1 (en) * | 2001-11-28 | 2005-11-08 | 미츠비시 후소 트럭 앤드 버스 코포레이션 | Apparatus for determining failure of control circuit of power transmission device for a vehicle |
| US7859659B2 (en) | 1998-03-06 | 2010-12-28 | Kla-Tencor Corporation | Spectroscopic scatterometer system |
-
1985
- 1985-12-24 JP JP60295105A patent/JPS62150251A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997035337A1 (en) * | 1996-03-19 | 1997-09-25 | Hitachi, Ltd. | Process control system |
| US7859659B2 (en) | 1998-03-06 | 2010-12-28 | Kla-Tencor Corporation | Spectroscopic scatterometer system |
| US7898661B2 (en) | 1998-03-06 | 2011-03-01 | Kla-Tencor Corporation | Spectroscopic scatterometer system |
| KR100526648B1 (en) * | 2001-11-28 | 2005-11-08 | 미츠비시 후소 트럭 앤드 버스 코포레이션 | Apparatus for determining failure of control circuit of power transmission device for a vehicle |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62150251A (en) | Data base type photomask inspecting device | |
| JPH10156673A (en) | Simulation device for production line | |
| JPH0540820A (en) | Mounting inspection data preparation device | |
| JPH0730298A (en) | Tabulation analysis | |
| JPH05203466A (en) | Cad measured data displaying device | |
| JPH05313870A (en) | Preparation system for program structure diagram | |
| JPH0573578A (en) | Lot managing device | |
| JPH05334456A (en) | Method for processing measuring data | |
| JP3165772B2 (en) | Sequence program processing device | |
| JPH0540052A (en) | Experiment data collection device | |
| JPH02226338A (en) | Parameter input processing system | |
| JPS6336407A (en) | Numerical controller | |
| JP2804026B2 (en) | Plant data display device | |
| JPS6336387A (en) | Graph display system | |
| JPS62274339A (en) | Simple system for parameter generation | |
| JPH04273330A (en) | Calculation processor for column position of layout item | |
| JPH04354035A (en) | Trace method and its device | |
| JPH03263103A (en) | Preparation system for parts constitution table | |
| JPS63253430A (en) | Write control system | |
| JPS62135958A (en) | Simulation system | |
| JPH05120083A (en) | Computer system actual operation results totalizing device | |
| JPH01120754A (en) | Spectrum display device for mass spectrometer | |
| JPH05314275A (en) | Instrumental data managing device | |
| JPH02195448A (en) | Device for tracing instruction | |
| JPH04336326A (en) | Display system for data area assignment state |